KR20230088475A - 공급 어레인지먼트, 진공 프로세싱 시스템, 및 진공 프로세싱 시스템에서 이동하는 디바이스를 공급하는 방법 - Google Patents
공급 어레인지먼트, 진공 프로세싱 시스템, 및 진공 프로세싱 시스템에서 이동하는 디바이스를 공급하는 방법 Download PDFInfo
- Publication number
- KR20230088475A KR20230088475A KR1020237016683A KR20237016683A KR20230088475A KR 20230088475 A KR20230088475 A KR 20230088475A KR 1020237016683 A KR1020237016683 A KR 1020237016683A KR 20237016683 A KR20237016683 A KR 20237016683A KR 20230088475 A KR20230088475 A KR 20230088475A
- Authority
- KR
- South Korea
- Prior art keywords
- arm
- vacuum processing
- joint
- supply arrangement
- feedthrough
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000000758 substrate Substances 0.000 claims description 57
- 238000000151 deposition Methods 0.000 claims description 26
- 230000008021 deposition Effects 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 19
- 238000004804 winding Methods 0.000 claims description 16
- 230000005484 gravity Effects 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims 1
- 230000005291 magnetic effect Effects 0.000 description 52
- 230000008569 process Effects 0.000 description 11
- 239000000969 carrier Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 238000005339 levitation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- -1 oxides Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 235000015067 sauces Nutrition 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000003351 stiffener Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optics & Photonics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/IB2020/059813 WO2022084712A1 (en) | 2020-10-19 | 2020-10-19 | Supply arrangement, vacuum processing system and method of supplying a moving device in a vacuum processing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230088475A true KR20230088475A (ko) | 2023-06-19 |
Family
ID=81290145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237016683A KR20230088475A (ko) | 2020-10-19 | 2020-10-19 | 공급 어레인지먼트, 진공 프로세싱 시스템, 및 진공 프로세싱 시스템에서 이동하는 디바이스를 공급하는 방법 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR20230088475A (zh) |
| CN (1) | CN116324011A (zh) |
| WO (1) | WO2022084712A1 (zh) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB329991A (en) * | 1928-12-22 | 1930-05-22 | Walter Shaw | Compensator stop-motion for use in winding, reeling, twisting, doubling, knitting orother textile machines |
| KR100261532B1 (ko) * | 1993-03-14 | 2000-07-15 | 야마시타 히데나리 | 피처리체 반송장치를 가지는 멀티챔버 시스템 |
| DE19851743A1 (de) * | 1998-11-10 | 2000-05-11 | Schuler Pressen Gmbh & Co | Positioniereinrichtung mit Gewichtsausgleich |
| US8419341B2 (en) * | 2006-09-19 | 2013-04-16 | Brooks Automation, Inc. | Linear vacuum robot with Z motion and articulated arm |
| TWI458612B (zh) * | 2009-11-10 | 2014-11-01 | Intevac Inc | 可作ｚ軸運動並具多關節手臂之線性真空機械手 |
| KR20120086865A (ko) * | 2011-01-27 | 2012-08-06 | 엘아이지에이디피 주식회사 | 증착물질 공급장치 및 이것을 포함하는 유기발광소자 제조용 증착장비 |
| JP2015517031A (ja) * | 2012-03-29 | 2015-06-18 | ビーコ・エーエルディー インコーポレイテッド | 基板処理用走査噴射装置アセンブリモジュール |
| KR101839224B1 (ko) * | 2016-09-01 | 2018-03-15 | 성균관대학교산학협력단 | 보행로봇용 관절 완충장치 |
| KR101903904B1 (ko) * | 2017-02-23 | 2018-11-13 | 고려대학교 산학협력단 | 중력보상에 기반한 수동식 자세유지장치 |
| DE102017111687A1 (de) * | 2017-05-30 | 2018-12-06 | VON ARDENNE Asset GmbH & Co. KG | Bandsubstrat-Vakuumbeschichtungsanlage |
| US11508595B2 (en) * | 2017-08-24 | 2022-11-22 | Applied Materials, Inc. | Apparatus and method for contactless transportation of a device in a vacuum processing system |
| DE102017129603B4 (de) * | 2017-09-27 | 2021-07-01 | VON ARDENNE Asset GmbH & Co. KG | Vakuumkammeranordnung und Verfahren zum Prozessieren eines Substrats |
-
2020
- 2020-10-19 WO PCT/IB2020/059813 patent/WO2022084712A1/en active Application Filing
- 2020-10-19 CN CN202080106409.5A patent/CN116324011A/zh active Pending
- 2020-10-19 KR KR1020237016683A patent/KR20230088475A/ko active Search and Examination
Also Published As
| Publication number | Publication date |
|---|---|
| CN116324011A (zh) | 2023-06-23 |
| WO2022084712A1 (en) | 2022-04-28 |
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