KR20230074476A - 촬상 장치 및 전자 기기 - Google Patents

촬상 장치 및 전자 기기 Download PDF

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Publication number
KR20230074476A
KR20230074476A KR1020237008317A KR20237008317A KR20230074476A KR 20230074476 A KR20230074476 A KR 20230074476A KR 1020237008317 A KR1020237008317 A KR 1020237008317A KR 20237008317 A KR20237008317 A KR 20237008317A KR 20230074476 A KR20230074476 A KR 20230074476A
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KR
South Korea
Prior art keywords
layer
transistor
circuit
wiring
potential
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Pending
Application number
KR1020237008317A
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English (en)
Korean (ko)
Inventor
유스케 네고로
히데아키 시시도
Original Assignee
가부시키가이샤 한도오따이 에네루기 켄큐쇼
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Publication of KR20230074476A publication Critical patent/KR20230074476A/ko
Pending legal-status Critical Current

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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/79Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
    • H01L27/14609
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • H01L27/14643
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/78Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/30Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors

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  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Thin Film Transistor (AREA)
KR1020237008317A 2020-09-25 2021-09-13 촬상 장치 및 전자 기기 Pending KR20230074476A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020160663 2020-09-25
JPJP-P-2020-160663 2020-09-25
PCT/IB2021/058290 WO2022064317A1 (ja) 2020-09-25 2021-09-13 撮像装置および電子機器

Publications (1)

Publication Number Publication Date
KR20230074476A true KR20230074476A (ko) 2023-05-30

Family

ID=80846289

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237008317A Pending KR20230074476A (ko) 2020-09-25 2021-09-13 촬상 장치 및 전자 기기

Country Status (5)

Country Link
US (1) US12212873B2 (https=)
JP (1) JPWO2022064317A1 (https=)
KR (1) KR20230074476A (https=)
CN (1) CN116075943A (https=)
WO (1) WO2022064317A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7834102B2 (ja) * 2021-06-17 2026-03-23 株式会社半導体エネルギー研究所 撮像装置および電子機器

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119711A (ja) 2009-11-06 2011-06-16 Semiconductor Energy Lab Co Ltd 半導体装置

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US8049293B2 (en) 2005-03-07 2011-11-01 Sony Corporation Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device
CN101228631A (zh) 2005-06-02 2008-07-23 索尼株式会社 半导体图像传感器模块及其制造方法
TW201101476A (en) 2005-06-02 2011-01-01 Sony Corp Semiconductor image sensor module and method of manufacturing the same
JP5791571B2 (ja) * 2011-08-02 2015-10-07 キヤノン株式会社 撮像素子及び撮像装置
US9607971B2 (en) * 2012-06-04 2017-03-28 Sony Corporation Semiconductor device and sensing system
TWI595637B (zh) 2012-09-28 2017-08-11 新力股份有限公司 半導體裝置及電子機器
WO2014141663A1 (ja) * 2013-03-14 2014-09-18 株式会社ニコン 撮像ユニット、撮像装置および撮像制御プログラム
JP2015041677A (ja) * 2013-08-21 2015-03-02 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
KR102450562B1 (ko) * 2014-03-13 2022-10-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
KR102380829B1 (ko) * 2014-04-23 2022-03-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
WO2016046685A1 (en) * 2014-09-26 2016-03-31 Semiconductor Energy Laboratory Co., Ltd. Imaging device
JP6499006B2 (ja) * 2015-05-07 2019-04-10 株式会社半導体エネルギー研究所 撮像装置
US9876946B2 (en) * 2015-08-03 2018-01-23 Semiconductor Energy Laboratory Co., Ltd. Imaging device and electronic device
KR102653044B1 (ko) * 2015-09-01 2024-04-01 소니그룹주식회사 적층체
JP6758124B2 (ja) * 2016-08-29 2020-09-23 富士通セミコンダクターメモリソリューション株式会社 3次元積層チェーン型メモリ装置の製造方法
JP2018117102A (ja) 2017-01-20 2018-07-26 ソニーセミコンダクタソリューションズ株式会社 半導体装置
WO2018186197A1 (ja) * 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
US12119359B2 (en) * 2018-12-20 2024-10-15 Sony Semiconductor Solutions Corporation Imaging device
JP2020123612A (ja) 2019-01-29 2020-08-13 株式会社半導体エネルギー研究所 半導体装置の製造方法、半導体装置の製造装置
KR102661820B1 (ko) * 2019-02-11 2024-05-02 삼성전자주식회사 이미지 센서 및 그것의 구동 방법
US12376410B2 (en) * 2019-07-04 2025-07-29 Semiconductor Energy Laboratory Co., Ltd. Imaging device with embedded conductive layers
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JP2011119711A (ja) 2009-11-06 2011-06-16 Semiconductor Energy Lab Co Ltd 半導体装置

Also Published As

Publication number Publication date
CN116075943A (zh) 2023-05-05
US20230396899A1 (en) 2023-12-07
US12212873B2 (en) 2025-01-28
JPWO2022064317A1 (https=) 2022-03-31
TW202220227A (zh) 2022-05-16
WO2022064317A1 (ja) 2022-03-31

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Patent event date: 20230309

Patent event code: PA01051R01D

Comment text: International Patent Application

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