JPWO2022064317A1 - - Google Patents

Info

Publication number
JPWO2022064317A1
JPWO2022064317A1 JP2022551445A JP2022551445A JPWO2022064317A1 JP WO2022064317 A1 JPWO2022064317 A1 JP WO2022064317A1 JP 2022551445 A JP2022551445 A JP 2022551445A JP 2022551445 A JP2022551445 A JP 2022551445A JP WO2022064317 A1 JPWO2022064317 A1 JP WO2022064317A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022551445A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022064317A1 publication Critical patent/JPWO2022064317A1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/79Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/76Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/78Readout circuits for addressed sensors, e.g. output amplifiers or A/D converters
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B53/00Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H10B53/30Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10Integrated devices
    • H10F39/12Image sensors
    • H10F39/18Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Thin Film Transistor (AREA)
JP2022551445A 2020-09-25 2021-09-13 Pending JPWO2022064317A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020160663 2020-09-25
PCT/IB2021/058290 WO2022064317A1 (ja) 2020-09-25 2021-09-13 撮像装置および電子機器

Publications (1)

Publication Number Publication Date
JPWO2022064317A1 true JPWO2022064317A1 (https=) 2022-03-31

Family

ID=80846289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022551445A Pending JPWO2022064317A1 (https=) 2020-09-25 2021-09-13

Country Status (5)

Country Link
US (1) US12212873B2 (https=)
JP (1) JPWO2022064317A1 (https=)
KR (1) KR20230074476A (https=)
CN (1) CN116075943A (https=)
WO (1) WO2022064317A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7834102B2 (ja) * 2021-06-17 2026-03-23 株式会社半導体エネルギー研究所 撮像装置および電子機器

Citations (8)

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WO2006129762A1 (ja) * 2005-06-02 2006-12-07 Sony Corporation 半導体イメージセンサ・モジュール及びその製造方法
WO2014050694A1 (ja) * 2012-09-28 2014-04-03 ソニー株式会社 半導体装置および電子機器
JP2016213298A (ja) * 2015-05-07 2016-12-15 株式会社半導体エネルギー研究所 撮像装置および電子機器
JP2018037441A (ja) * 2016-08-29 2018-03-08 富士通セミコンダクター株式会社 3次元積層チェーン型メモリ装置及びその製造方法
JP2018117102A (ja) * 2017-01-20 2018-07-26 ソニーセミコンダクタソリューションズ株式会社 半導体装置
WO2018186197A1 (ja) * 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
WO2020129712A1 (ja) * 2018-12-20 2020-06-25 ソニーセミコンダクタソリューションズ株式会社 撮像装置
JP2020123612A (ja) * 2019-01-29 2020-08-13 株式会社半導体エネルギー研究所 半導体装置の製造方法、半導体装置の製造装置

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KR100610481B1 (ko) * 2004-12-30 2006-08-08 매그나칩 반도체 유한회사 수광영역을 넓힌 이미지센서 및 그 제조 방법
US8049293B2 (en) 2005-03-07 2011-11-01 Sony Corporation Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device
CN101228631A (zh) 2005-06-02 2008-07-23 索尼株式会社 半导体图像传感器模块及其制造方法
CN104393007A (zh) 2009-11-06 2015-03-04 株式会社半导体能源研究所 半导体装置
JP5791571B2 (ja) * 2011-08-02 2015-10-07 キヤノン株式会社 撮像素子及び撮像装置
US9607971B2 (en) * 2012-06-04 2017-03-28 Sony Corporation Semiconductor device and sensing system
WO2014141663A1 (ja) * 2013-03-14 2014-09-18 株式会社ニコン 撮像ユニット、撮像装置および撮像制御プログラム
JP2015041677A (ja) * 2013-08-21 2015-03-02 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
KR102450562B1 (ko) * 2014-03-13 2022-10-07 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
KR102380829B1 (ko) * 2014-04-23 2022-03-31 가부시키가이샤 한도오따이 에네루기 켄큐쇼 촬상 장치
WO2016046685A1 (en) * 2014-09-26 2016-03-31 Semiconductor Energy Laboratory Co., Ltd. Imaging device
US9876946B2 (en) * 2015-08-03 2018-01-23 Semiconductor Energy Laboratory Co., Ltd. Imaging device and electronic device
KR102653044B1 (ko) * 2015-09-01 2024-04-01 소니그룹주식회사 적층체
KR102661820B1 (ko) * 2019-02-11 2024-05-02 삼성전자주식회사 이미지 센서 및 그것의 구동 방법
US12376410B2 (en) * 2019-07-04 2025-07-29 Semiconductor Energy Laboratory Co., Ltd. Imaging device with embedded conductive layers
US11302736B2 (en) * 2019-08-08 2022-04-12 Semiconductor Energy Laboratory Co., Ltd. Imaging device and electronic device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006129762A1 (ja) * 2005-06-02 2006-12-07 Sony Corporation 半導体イメージセンサ・モジュール及びその製造方法
WO2014050694A1 (ja) * 2012-09-28 2014-04-03 ソニー株式会社 半導体装置および電子機器
JP2016213298A (ja) * 2015-05-07 2016-12-15 株式会社半導体エネルギー研究所 撮像装置および電子機器
JP2018037441A (ja) * 2016-08-29 2018-03-08 富士通セミコンダクター株式会社 3次元積層チェーン型メモリ装置及びその製造方法
JP2018117102A (ja) * 2017-01-20 2018-07-26 ソニーセミコンダクタソリューションズ株式会社 半導体装置
WO2018186197A1 (ja) * 2017-04-04 2018-10-11 ソニーセミコンダクタソリューションズ株式会社 固体撮像装置、及び電子機器
WO2020129712A1 (ja) * 2018-12-20 2020-06-25 ソニーセミコンダクタソリューションズ株式会社 撮像装置
JP2020123612A (ja) * 2019-01-29 2020-08-13 株式会社半導体エネルギー研究所 半導体装置の製造方法、半導体装置の製造装置

Also Published As

Publication number Publication date
CN116075943A (zh) 2023-05-05
KR20230074476A (ko) 2023-05-30
US20230396899A1 (en) 2023-12-07
US12212873B2 (en) 2025-01-28
TW202220227A (zh) 2022-05-16
WO2022064317A1 (ja) 2022-03-31

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