KR20220061910A - 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 - Google Patents

화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 Download PDF

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Publication number
KR20220061910A
KR20220061910A KR1020217033344A KR20217033344A KR20220061910A KR 20220061910 A KR20220061910 A KR 20220061910A KR 1020217033344 A KR1020217033344 A KR 1020217033344A KR 20217033344 A KR20217033344 A KR 20217033344A KR 20220061910 A KR20220061910 A KR 20220061910A
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South Korea
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substituted
carbon atoms
compound
unsubstituted
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Korean (ko)
Inventor
이즈미 마츠이
테츠유키 나카야시키
토모유키 아리요시
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가부시키가이샤 아데카
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Publication of KR20220061910A publication Critical patent/KR20220061910A/ko
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • C07D209/10Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020217033344A 2019-09-10 2020-09-08 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법 Pending KR20220061910A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-164900 2019-09-10
JP2019164900 2019-09-10
PCT/JP2020/033955 WO2021049489A1 (ja) 2019-09-10 2020-09-08 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法

Publications (1)

Publication Number Publication Date
KR20220061910A true KR20220061910A (ko) 2022-05-13

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KR1020217033344A Pending KR20220061910A (ko) 2019-09-10 2020-09-08 화합물, 산 발생제, 조성물, 경화물 및 패턴, 그리고 경화물 및 패턴의 제조 방법

Country Status (5)

Country Link
JP (1) JP7631208B2 (enrdf_load_stackoverflow)
KR (1) KR20220061910A (enrdf_load_stackoverflow)
CN (1) CN113727971A (enrdf_load_stackoverflow)
TW (1) TW202116731A (enrdf_load_stackoverflow)
WO (1) WO2021049489A1 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022224835A1 (enrdf_load_stackoverflow) * 2021-04-22 2022-10-27
WO2024195504A1 (ja) * 2023-03-23 2024-09-26 株式会社Adeka 化合物、組成物、硬化物及びパターン
CN119954696A (zh) * 2023-11-08 2025-05-09 湖北三峡实验室 光产酸剂

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016169173A (ja) 2015-03-11 2016-09-23 株式会社Adeka オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
US20200183271A1 (en) 2016-01-26 2020-06-11 Adeka Corporation Thermal acid generator and resist composition using same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1751269A (zh) * 2003-02-19 2006-03-22 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
MXPA05008118A (es) * 2003-02-19 2005-09-30 Ciba Sc Holding Ag Derivados de oxima halogenados y el uso de los mismos como acidos latentes.
JP2008506749A (ja) * 2004-07-20 2008-03-06 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド オキシム誘導体および潜在酸としてのそれらの使用
US8088868B2 (en) * 2006-12-19 2012-01-03 Bridgestone Corporation Polymers functionalized with protected oxime compounds
TW201039061A (en) * 2008-12-19 2010-11-01 Fujifilm Corp Photosensitive composition, and color filter and display device using the same
WO2013008652A1 (ja) * 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621B (zh) * 2013-07-26 2016-03-16 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
CN106132929B (zh) * 2014-04-04 2020-06-19 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
US10030083B2 (en) * 2014-05-15 2018-07-24 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
KR102669269B1 (ko) * 2017-12-13 2024-05-24 가부시키가이샤 아데카 화합물, 잠재성 염기 발생제, 상기 화합물을 함유하는 감광성 수지 조성물, 및 경화물
CN110806677A (zh) * 2018-08-06 2020-02-18 常州强力先端电子材料有限公司 光致抗蚀剂组合物、其图案形成方法及应用
CN111324009A (zh) * 2018-12-13 2020-06-23 常州强力先端电子材料有限公司 光固化组合物及其应用

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016169173A (ja) 2015-03-11 2016-09-23 株式会社Adeka オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
US20200183271A1 (en) 2016-01-26 2020-06-11 Adeka Corporation Thermal acid generator and resist composition using same

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JPWO2021049489A1 (enrdf_load_stackoverflow) 2021-03-18
JP7631208B2 (ja) 2025-02-18
CN113727971A (zh) 2021-11-30
WO2021049489A1 (ja) 2021-03-18
TW202116731A (zh) 2021-05-01

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