KR20210135993A - 마스크 블랭크용 기판, 도전막 부착 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 및 반도체 장치의 제조 방법 - Google Patents

마스크 블랭크용 기판, 도전막 부착 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 및 반도체 장치의 제조 방법 Download PDF

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Publication number
KR20210135993A
KR20210135993A KR1020217023666A KR20217023666A KR20210135993A KR 20210135993 A KR20210135993 A KR 20210135993A KR 1020217023666 A KR1020217023666 A KR 1020217023666A KR 20217023666 A KR20217023666 A KR 20217023666A KR 20210135993 A KR20210135993 A KR 20210135993A
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KR
South Korea
Prior art keywords
substrate
region
film
mask blank
mask
Prior art date
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Pending
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KR1020217023666A
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English (en)
Korean (ko)
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히데아키 나라하라
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호야 가부시키가이샤
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Publication of KR20210135993A publication Critical patent/KR20210135993A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020217023666A 2019-03-28 2020-03-24 마스크 블랭크용 기판, 도전막 부착 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 및 반도체 장치의 제조 방법 Pending KR20210135993A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2019-063692 2019-03-28
JP2019063692 2019-03-28
PCT/JP2020/013139 WO2020196555A1 (ja) 2019-03-28 2020-03-24 マスクブランク用基板、導電膜付き基板、多層反射膜付き基板、反射型マスクブランク、反射型マスク、及び半導体装置の製造方法

Publications (1)

Publication Number Publication Date
KR20210135993A true KR20210135993A (ko) 2021-11-16

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KR1020217023666A Pending KR20210135993A (ko) 2019-03-28 2020-03-24 마스크 블랭크용 기판, 도전막 부착 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 및 반도체 장치의 제조 방법

Country Status (6)

Country Link
US (1) US20220121109A1 (enExample)
JP (1) JP7662511B2 (enExample)
KR (1) KR20210135993A (enExample)
SG (1) SG11202109244UA (enExample)
TW (1) TWI834853B (enExample)
WO (1) WO2020196555A1 (enExample)

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JP7574766B2 (ja) * 2020-10-30 2024-10-29 Ａｇｃ株式会社 Ｅｕｖｌ用ガラス基板、及びｅｕｖｌ用マスクブランク
JP7574767B2 (ja) * 2020-10-30 2024-10-29 Ａｇｃ株式会社 Ｅｕｖｌ用ガラス基板、及びｅｕｖｌ用マスクブランク
KR20220058424A (ko) * 2020-10-30 2022-05-09 에이지씨 가부시키가이샤 Euvl용 유리 기판, 및 euvl용 마스크 블랭크
KR102292282B1 (ko) * 2021-01-13 2021-08-20 성균관대학교산학협력단 비등방성 기계적 팽창 기판 및 이를 이용한 크랙 기반 압력 센서
JP7694469B2 (ja) * 2021-07-21 2025-06-18 信越化学工業株式会社 マスクブランクス用基板及びその製造方法

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JP2005301304A (ja) * 2002-03-29 2005-10-27 Hoya Corp マスクブランク用基板、マスクブランク、および転写用マスク
JP2004029735A (ja) * 2002-03-29 2004-01-29 Hoya Corp 電子デバイス用基板、該基板を用いたマスクブランクおよび転写用マスク、並びにこれらの製造方法、研磨装置および研磨方法
JP3895651B2 (ja) * 2002-08-12 2007-03-22 Ｈｏｙａ株式会社 不要膜除去装置および不要膜除去方法、並びにフォトマスクブランク製造方法
JP2004302280A (ja) * 2003-03-31 2004-10-28 Hoya Corp マスクブランクス用基板の製造方法、及びマスクブランクスの製造方法、並びに転写マスクの製造方法
JP5231918B2 (ja) * 2008-09-26 2013-07-10 Ｈｏｙａ株式会社 マスクブランク用基板の製造方法、及び両面研磨装置
JP4728414B2 (ja) * 2009-03-25 2011-07-20 Ｈｏｙａ株式会社 マスクブランク用基板、マスクブランク、フォトマスクおよび半導体デバイスの製造方法
KR20110056209A (ko) * 2009-11-20 2011-05-26 주식회사 에스앤에스텍 블랭크 마스크용 기판, 이를 사용하여 제조된 블랭크 마스크 및 그 제조방법
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MY155168A (en) * 2009-12-11 2015-09-15 Shinetsu Chemical Co Photomask-forming glass substrate and making method
JP5637062B2 (ja) * 2010-05-24 2014-12-10 信越化学工業株式会社 合成石英ガラス基板及びその製造方法
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JP6161913B2 (ja) * 2013-01-31 2017-07-12 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、および転写用マスクの製造方法
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JP6256422B2 (ja) * 2014-08-07 2018-01-10 旭硝子株式会社 マスクブランク用ガラス基板
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US10606166B2 (en) * 2015-06-17 2020-03-31 Hoya Corporation Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device
JP6613858B2 (ja) * 2015-12-08 2019-12-04 Ａｇｃ株式会社 Ｅｕｖ用マスクブランク用のガラス基板、ｅｕｖ用マスクブランクの製造方法、およびｅｕｖ用フォトマスクの製造方法
US10948814B2 (en) * 2016-03-23 2021-03-16 AGC Inc. Substrate for use as mask blank, and mask blank
JP6873758B2 (ja) * 2016-03-28 2021-05-19 Hoya株式会社 基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
JP6727879B2 (ja) * 2016-03-30 2020-07-22 Hoya株式会社 マスクブランク用基板の製造方法、多層膜付き基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法
KR102393311B1 (ko) 2016-03-31 2022-05-02 호야 가부시키가이샤 반사형 마스크 블랭크의 제조 방법, 반사형 마스크 블랭크, 반사형 마스크의 제조 방법, 반사형 마스크, 및 반도체 장치의 제조 방법
JP6803186B2 (ja) * 2016-09-30 2020-12-23 Hoya株式会社 マスクブランク用基板、多層反射膜付き基板、マスクブランク、転写用マスク及び半導体デバイスの製造方法

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US20220121109A1 (en) 2022-04-21
WO2020196555A1 (ja) 2020-10-01
TWI834853B (zh) 2024-03-11
JP7662511B2 (ja) 2025-04-15
TW202101534A (zh) 2021-01-01
SG11202109244UA (en) 2021-10-28
JPWO2020196555A1 (enExample) 2020-10-01

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