KR20200001956A - 가열 장치, 증발원 및 증착 장치 - Google Patents

가열 장치, 증발원 및 증착 장치 Download PDF

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Publication number
KR20200001956A
KR20200001956A KR1020180125582A KR20180125582A KR20200001956A KR 20200001956 A KR20200001956 A KR 20200001956A KR 1020180125582 A KR1020180125582 A KR 1020180125582A KR 20180125582 A KR20180125582 A KR 20180125582A KR 20200001956 A KR20200001956 A KR 20200001956A
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KR
South Korea
Prior art keywords
reflector
heater
crucible
thermal emissivity
case
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020180125582A
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English (en)
Korean (ko)
Inventor
유키 스가와라
Original Assignee
캐논 톡키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 톡키 가부시키가이샤 filed Critical 캐논 톡키 가부시키가이샤
Publication of KR20200001956A publication Critical patent/KR20200001956A/ko
Priority to KR1020240032014A priority Critical patent/KR102661888B1/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Control Of Resistance Heating (AREA)
KR1020180125582A 2018-06-28 2018-10-19 가열 장치, 증발원 및 증착 장치 Ceased KR20200001956A (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020240032014A KR102661888B1 (ko) 2018-06-28 2024-03-06 가열 장치, 증발원 및 증착 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2018-123555 2018-06-28
JP2018123555A JP7092577B2 (ja) 2018-06-28 2018-06-28 蒸発源及び蒸着装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020240032014A Division KR102661888B1 (ko) 2018-06-28 2024-03-06 가열 장치, 증발원 및 증착 장치

Publications (1)

Publication Number Publication Date
KR20200001956A true KR20200001956A (ko) 2020-01-07

Family

ID=69028562

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020180125582A Ceased KR20200001956A (ko) 2018-06-28 2018-10-19 가열 장치, 증발원 및 증착 장치
KR1020240032014A Active KR102661888B1 (ko) 2018-06-28 2024-03-06 가열 장치, 증발원 및 증착 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020240032014A Active KR102661888B1 (ko) 2018-06-28 2024-03-06 가열 장치, 증발원 및 증착 장치

Country Status (3)

Country Link
JP (2) JP7092577B2 (enrdf_load_stackoverflow)
KR (2) KR20200001956A (enrdf_load_stackoverflow)
CN (1) CN110656309B (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7092577B2 (ja) * 2018-06-28 2022-06-28 キヤノントッキ株式会社 蒸発源及び蒸着装置
JP7520515B2 (ja) 2020-01-09 2024-07-23 キヤノン株式会社 通信装置、制御方法、及びプログラム
JP2022107982A (ja) * 2021-01-12 2022-07-25 キヤノントッキ株式会社 蒸発源装置、成膜装置、成膜方法及び電子デバイスの製造方法
JP7394242B1 (ja) 2023-01-13 2023-12-07 日本碍子株式会社 乾燥装置
CN117403186A (zh) * 2023-11-09 2024-01-16 苏州迈为科技股份有限公司 一种真空镀膜设备的加热装置、方法及镀膜设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006075755A1 (ja) 2005-01-17 2006-07-20 Youtec Co., Ltd. 蒸発源及び蒸着装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943871A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器
JPS6467518A (en) * 1987-09-07 1989-03-14 Matsushita Electric Ind Co Ltd Catalytic combustion equipment
JPH0626926A (ja) * 1992-05-12 1994-02-04 Fujitsu Ltd 赤外線検知器
JPH06108236A (ja) * 1992-09-25 1994-04-19 Mitsubishi Electric Corp 薄膜形成装置
JP2006274336A (ja) * 2005-03-29 2006-10-12 Jfe Steel Kk 直火式の連続加熱炉による鋼板の加熱方法
JP2009093933A (ja) * 2007-10-10 2009-04-30 Negishi Seisakusho:Kk 赤外線ヒーター装置およびこれを備える加熱装置
JP2011162867A (ja) * 2010-02-15 2011-08-25 Mitsubishi Heavy Ind Ltd 真空蒸発装置
JP2012234909A (ja) * 2011-04-28 2012-11-29 Nissan Motor Co Ltd ヒートシンク、ヒートシンクの製造方法及び灯具
KR102124588B1 (ko) * 2012-10-22 2020-06-22 삼성디스플레이 주식회사 선형 증착원 및 이를 포함하는 진공 증착 장치
JP2015067850A (ja) * 2013-09-27 2015-04-13 株式会社日立ハイテクファインシステムズ 真空蒸着装置
JP3203978U (ja) * 2016-02-18 2016-04-28 根岸　敏夫 有機材料蒸発源
KR20160094347A (ko) * 2016-03-30 2016-08-09 한국표준과학연구원 유도 가열 선형 증발 증착 장치
JP7092577B2 (ja) * 2018-06-28 2022-06-28 キヤノントッキ株式会社 蒸発源及び蒸着装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006075755A1 (ja) 2005-01-17 2006-07-20 Youtec Co., Ltd. 蒸発源及び蒸着装置

Also Published As

Publication number Publication date
KR20240035975A (ko) 2024-03-19
KR102661888B1 (ko) 2024-04-26
JP2020002436A (ja) 2020-01-09
CN110656309B (zh) 2024-03-15
CN110656309A (zh) 2020-01-07
JP2022113863A (ja) 2022-08-04
JP7092577B2 (ja) 2022-06-28

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