KR20190042597A - 광 흡수층을 제조하기 위한 스퍼터링 타겟 - Google Patents

광 흡수층을 제조하기 위한 스퍼터링 타겟 Download PDF

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Publication number
KR20190042597A
KR20190042597A KR1020197006432A KR20197006432A KR20190042597A KR 20190042597 A KR20190042597 A KR 20190042597A KR 1020197006432 A KR1020197006432 A KR 1020197006432A KR 20197006432 A KR20197006432 A KR 20197006432A KR 20190042597 A KR20190042597 A KR 20190042597A
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KR
South Korea
Prior art keywords
phase
sputtering target
target material
target
zno
Prior art date
Application number
KR1020197006432A
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English (en)
Korean (ko)
Inventor
마르틴 슈로트
마르쿠스 슐타이스
안드레아스 헤르조그
Original Assignee
마테리온 어드벤스드 머티리얼즈 저머니 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 마테리온 어드벤스드 머티리얼즈 저머니 게엠베하 filed Critical 마테리온 어드벤스드 머티리얼즈 저머니 게엠베하
Publication of KR20190042597A publication Critical patent/KR20190042597A/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
KR1020197006432A 2016-09-12 2017-09-06 광 흡수층을 제조하기 위한 스퍼터링 타겟 KR20190042597A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102016117048.8A DE102016117048A1 (de) 2016-09-12 2016-09-12 Sputtertarget zur Herstellung einer Licht absorbierenden Schicht
DE102016117048.8 2016-09-12
PCT/EP2017/072372 WO2018046552A1 (de) 2016-09-12 2017-09-06 Sputtertarget zur herstellung einer licht absorbierenden schicht

Publications (1)

Publication Number Publication Date
KR20190042597A true KR20190042597A (ko) 2019-04-24

Family

ID=59799380

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197006432A KR20190042597A (ko) 2016-09-12 2017-09-06 광 흡수층을 제조하기 위한 스퍼터링 타겟

Country Status (6)

Country Link
JP (1) JP2019529705A (de)
KR (1) KR20190042597A (de)
CN (1) CN109689923A (de)
DE (1) DE102016117048A1 (de)
TW (1) TW201827627A (de)
WO (1) WO2018046552A1 (de)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997008359A1 (fr) 1995-08-23 1997-03-06 Asahi Glass Company Ltd. Cible, son procede de production et procede de formation d'une couche tres refringente
JP2012106880A (ja) * 2010-11-16 2012-06-07 Sumitomo Chemical Co Ltd 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法
JP2012148937A (ja) * 2011-01-20 2012-08-09 Sumitomo Chemical Co Ltd 導電性複合酸化物、酸化亜鉛系焼結体、その製造方法およびターゲット
JP5958822B2 (ja) * 2011-12-22 2016-08-02 日立金属株式会社 Ｍｏ合金スパッタリングターゲット材の製造方法およびＭｏ合金スパッタリングターゲット材
DE102012112739A1 (de) 2012-10-23 2014-04-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Licht absorbierendes Schichtsystem und dessen Herstellung sowie dafür geeignetes Sputtertarget
US9279910B2 (en) * 2013-03-13 2016-03-08 Intermolecular, Inc. Color shift of high LSG low emissivity coating after heat treatment
DE102013103679A1 (de) 2013-04-11 2014-10-30 Heraeus Materials Technology Gmbh & Co. Kg Licht absorbierende Schicht und die Schicht enthaltendes Schichtsystem, Verfahren zur dessen Herstellung und dafür geeignetes Sputtertarget
DE102014111935A1 (de) 2014-08-20 2016-02-25 Heraeus Deutschland GmbH & Co. KG Zweilagiges Schichtsystem mit teilabsorbierender Schicht sowie Verfahren und Sputtertarget zur Herstellung dieser Schicht

Also Published As

Publication number Publication date
DE102016117048A1 (de) 2018-03-15
TW201827627A (zh) 2018-08-01
CN109689923A (zh) 2019-04-26
JP2019529705A (ja) 2019-10-17
WO2018046552A1 (de) 2018-03-15

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