KR20180107146A - 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 - Google Patents

착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 Download PDF

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KR20180107146A
KR20180107146A KR1020187023049A KR20187023049A KR20180107146A KR 20180107146 A KR20180107146 A KR 20180107146A KR 1020187023049 A KR1020187023049 A KR 1020187023049A KR 20187023049 A KR20187023049 A KR 20187023049A KR 20180107146 A KR20180107146 A KR 20180107146A
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South Korea
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group
pigment
mass
acid
coloring composition
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KR1020187023049A
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English (en)
Korean (ko)
Inventor
사토시 이와타
아츠야 이토
요시히데 오가와
리화 페이
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미쯔비시 케미컬 주식회사
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Publication of KR20180107146A publication Critical patent/KR20180107146A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020187023049A 2016-02-12 2017-02-09 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 KR20180107146A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2016-024975 2016-02-12
JP2016024975 2016-02-12
JP2016172027 2016-09-02
JPJP-P-2016-172027 2016-09-02
PCT/JP2017/004720 WO2017138605A1 (ja) 2016-02-12 2017-02-09 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置

Publications (1)

Publication Number Publication Date
KR20180107146A true KR20180107146A (ko) 2018-10-01

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KR1020187023049A KR20180107146A (ko) 2016-02-12 2017-02-09 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치

Country Status (5)

Country Link
JP (2) JP7184518B2 (ja)
KR (1) KR20180107146A (ja)
CN (2) CN114545737A (ja)
TW (1) TWI794156B (ja)
WO (1) WO2017138605A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022182151A1 (ko) * 2021-02-25 2022-09-01 동우 화인켐 주식회사 화상표시장치용 격벽, 이를 제조하는 방법 및 상기 격벽을 포함하는 화상표시장치

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6374595B1 (ja) * 2017-09-26 2018-08-15 東京応化工業株式会社 感光性樹脂組成物、硬化膜、表示装置、及びパターン形成方法
TWI741223B (zh) * 2017-10-20 2021-10-01 南韓商東友精細化工有限公司 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置
KR101933940B1 (ko) * 2018-01-31 2018-12-31 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 블랙 매트릭스 및/또는 컬럼 스페이서를 포함하는 컬러필터 및 컬러필터를 포함하는 화상표시장치
KR20210032320A (ko) * 2018-07-20 2021-03-24 미쯔비시 케미컬 주식회사 감광성 착색 수지 조성물, 경화물, 화상 표시 장치 및 조명
US20200201180A1 (en) * 2018-12-21 2020-06-25 Rohm And Haas Electronic Materials Korea Ltd. Colored photosensitive resin composition and black matrix prepared therefrom
JP6843949B2 (ja) * 2018-12-27 2021-03-17 株式会社タムラ製作所 黒色感光性樹脂組成物
JP7360798B2 (ja) * 2019-02-21 2023-10-13 サカタインクス株式会社 着色組成物、及び、それを含有する着色レジスト組成物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5489621A (en) * 1993-05-12 1996-02-06 Fuji Photo Film Co., Ltd. Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor
JP3346647B2 (ja) * 1993-05-12 2002-11-18 富士写真フイルム株式会社 遮光性感光性樹脂組成物および遮光性画像の形成方法
JP4234844B2 (ja) * 1999-04-28 2009-03-04 富士フイルム株式会社 カラーフィルター及びその製造方法
JP5380034B2 (ja) * 2008-10-09 2014-01-08 太陽ホールディングス株式会社 黒色ソルダーレジスト組成物及びその硬化物
TWI512397B (zh) * 2009-06-24 2015-12-11 Sumitomo Chemical Co Coloring the photosensitive composition
CN110262189A (zh) * 2011-10-25 2019-09-20 三菱化学株式会社 着色感光性组合物、着色间隔物、滤色片及液晶显示装置
KR102112041B1 (ko) * 2012-06-01 2020-05-18 바스프 에스이 흑색 착색제 혼합물
KR101658374B1 (ko) * 2013-01-25 2016-09-22 롬엔드하스전자재료코리아유한회사 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물
JP6365118B2 (ja) * 2013-09-20 2018-08-01 三菱ケミカル株式会社 感光性樹脂組成物、それを硬化させてなる硬化物、ブラックマトリックス及び画像表示装置
KR102356749B1 (ko) * 2013-09-25 2022-01-27 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 블랙 매트릭스, 착색 스페이서, 화상 표시 장치 및 안료 분산액
JP6620743B2 (ja) * 2014-07-04 2019-12-18 三菱ケミカル株式会社 樹脂、感光性樹脂組成物、硬化物、カラーフィルタ及び画像表示装置
JP2022099579A (ja) * 2020-12-23 2022-07-05 三菱瓦斯化学株式会社 多層プリント配線板の絶縁層用樹脂組成物、樹脂シート、多層プリント配線板、半導体装置、及び硬化物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022182151A1 (ko) * 2021-02-25 2022-09-01 동우 화인켐 주식회사 화상표시장치용 격벽, 이를 제조하는 방법 및 상기 격벽을 포함하는 화상표시장치

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Publication number Publication date
JPWO2017138605A1 (ja) 2018-12-06
JP2021192120A (ja) 2021-12-16
CN114545737A (zh) 2022-05-27
TWI794156B (zh) 2023-03-01
TW201800844A (zh) 2018-01-01
WO2017138605A1 (ja) 2017-08-17
CN108700685A (zh) 2018-10-23
JP7184518B2 (ja) 2022-12-06

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