KR20180002912A - 증발 유닛 및 진공 코팅 장치 - Google Patents

증발 유닛 및 진공 코팅 장치 Download PDF

Info

Publication number
KR20180002912A
KR20180002912A KR1020177037777A KR20177037777A KR20180002912A KR 20180002912 A KR20180002912 A KR 20180002912A KR 1020177037777 A KR1020177037777 A KR 1020177037777A KR 20177037777 A KR20177037777 A KR 20177037777A KR 20180002912 A KR20180002912 A KR 20180002912A
Authority
KR
South Korea
Prior art keywords
coating
evaporation
evaporator
drum
evaporators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020177037777A
Other languages
English (en)
Korean (ko)
Inventor
슈테판 하인
게르트 호프만
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20180002912A publication Critical patent/KR20180002912A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020177037777A 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치 Ceased KR20180002912A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/068661 WO2012072132A1 (en) 2010-12-01 2010-12-01 Evaporation unit and vacuum coating apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020137016997A Division KR20130121905A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Publications (1)

Publication Number Publication Date
KR20180002912A true KR20180002912A (ko) 2018-01-08

Family

ID=44310090

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020177037777A Ceased KR20180002912A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치
KR1020137016997A Ceased KR20130121905A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020137016997A Ceased KR20130121905A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Country Status (6)

Country Link
US (1) US20140030435A1 (https=)
EP (1) EP2646594A1 (https=)
JP (1) JP2013544322A (https=)
KR (2) KR20180002912A (https=)
CN (1) CN103249861B (https=)
WO (1) WO2012072132A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105849310B (zh) * 2013-12-23 2018-11-27 应用材料公司 用于在真空工艺期间保持基板的保持设备、用于在基板上沉积层的设备及用于输送保持设备的方法
CN105917019A (zh) * 2014-02-04 2016-08-31 应用材料公司 用于有机材料的蒸发源、具有用于有机材料的蒸发源的设备、具有带有用于有机材料的蒸发源的蒸发沉积设备的系统以及用于操作用于有机材料的蒸发源的方法
US12454750B2 (en) 2021-08-12 2025-10-28 Elevated Materials Us Llc Evaporator for effective surface area evaporation
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US2969448A (en) * 1959-03-03 1961-01-24 Continental Can Co Heater vaporizer element support
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
JPH01264632A (ja) * 1988-04-15 1989-10-20 Konica Corp 磁気記録媒体の製造方法および製造装置
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
IT1269042B (it) * 1994-03-18 1997-03-18 Galileo Vacuum Tec Spa Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
US7291185B2 (en) * 2001-06-08 2007-11-06 Matsushita Electric Industrial Co., Ltd. Method of manufacturing both-side metallized film with reduced blocking of metallized film and metallized film capacitor using the same
JP3608529B2 (ja) * 2001-06-08 2005-01-12 松下電器産業株式会社 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
CN2910966Y (zh) * 2006-03-24 2007-06-13 潘旭祥 高速卷绕多层电容薄膜镀膜机

Also Published As

Publication number Publication date
CN103249861A (zh) 2013-08-14
CN103249861B (zh) 2017-03-15
KR20130121905A (ko) 2013-11-06
US20140030435A1 (en) 2014-01-30
EP2646594A1 (en) 2013-10-09
WO2012072132A1 (en) 2012-06-07
JP2013544322A (ja) 2013-12-12

Similar Documents

Publication Publication Date Title
JP7483883B2 (ja) スパッタ堆積装置及び方法
US9732412B2 (en) Gas system for reactive deposition process
JP7499327B2 (ja) スパッタ堆積装置及び方法
KR20180002912A (ko) 증발 유닛 및 진공 코팅 장치
JP2012510568A (ja) トップダウン式の材料堆積用システム及び方法
TWI567216B (zh) 供濺鍍沉積的微型可旋轉式濺鍍裝置
KR20180005129A (ko) 증착 장치 및 증발원
KR100797447B1 (ko) 마그네트론 스퍼터링 장치, 원통형 캐소드 및 기재상의다성분 필름 코팅 방법
KR102680574B1 (ko) 증발 재료를 증착하기 위한 증기 소스, 증기 소스를 위한 노즐, 진공 증착 시스템, 및 증발 재료를 증착하기 위한 방법
TW201814771A (zh) 真空蒸鍍裝置
JP2026004381A (ja) スパッタ堆積
EP0714996B1 (en) A method for minimising thermal gradients in an object
JP6283332B2 (ja) 蒸着ユニット及び真空コーティング装置
US20080245300A1 (en) Apparatus and method for continuously coating strip substrates
EP4189134A1 (en) Evaporation source, vapor deposition apparatus, and method for coating a substrate in a vacuum chamber
JP2023528467A (ja) 蒸発源用の温度制御されたシールド、材料堆積装置、及び基材の上に材料を堆積させるための方法
WO2025026361A1 (zh) 蒸镀机构、蒸镀设备及电池制造系统
US8778082B2 (en) Point source assembly for thin film deposition devices and thin film deposition devices employing the same
JP2018537586A (ja) フレキシブル基板用のキャリア
US12410510B2 (en) Coating plant for coating a planar object and a method for coating a planar object
TW201925499A (zh) 蒸鍍裝置、蒸鍍方法和控制板
KR20180005133A (ko) 증착 장치 및 증발원
CN215163072U (zh) 沉积设备和沉积系统
KR20230030645A (ko) 노즐 조립체, 증발 소스, 및 증발된 재료를 기판 상에 증착하기 위한 방법
CN116635566A (zh) 用于沉积蒸镀材料的沉积源、沉积设备及其方法

Legal Events

Date Code Title Description
A107 Divisional application of patent
PA0104 Divisional application for international application

Comment text: Divisional Application for International Patent

Patent event code: PA01041R01D

Patent event date: 20171228

Application number text: 1020137016997

Filing date: 20130628

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20180126

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20180308

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20190411

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20180308

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I