CN103249861B - 蒸发单元和真空涂布装置 - Google Patents

蒸发单元和真空涂布装置 Download PDF

Info

Publication number
CN103249861B
CN103249861B CN201080070574.6A CN201080070574A CN103249861B CN 103249861 B CN103249861 B CN 103249861B CN 201080070574 A CN201080070574 A CN 201080070574A CN 103249861 B CN103249861 B CN 103249861B
Authority
CN
China
Prior art keywords
coating
evaporator
evaporation
drum
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080070574.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN103249861A (zh
Inventor
S·海恩
G·霍夫曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN103249861A publication Critical patent/CN103249861A/zh
Application granted granted Critical
Publication of CN103249861B publication Critical patent/CN103249861B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN201080070574.6A 2010-12-01 2010-12-01 蒸发单元和真空涂布装置 Expired - Fee Related CN103249861B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/068661 WO2012072132A1 (en) 2010-12-01 2010-12-01 Evaporation unit and vacuum coating apparatus

Publications (2)

Publication Number Publication Date
CN103249861A CN103249861A (zh) 2013-08-14
CN103249861B true CN103249861B (zh) 2017-03-15

Family

ID=44310090

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080070574.6A Expired - Fee Related CN103249861B (zh) 2010-12-01 2010-12-01 蒸发单元和真空涂布装置

Country Status (6)

Country Link
US (1) US20140030435A1 (https=)
EP (1) EP2646594A1 (https=)
JP (1) JP2013544322A (https=)
KR (2) KR20180002912A (https=)
CN (1) CN103249861B (https=)
WO (1) WO2012072132A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105849310B (zh) * 2013-12-23 2018-11-27 应用材料公司 用于在真空工艺期间保持基板的保持设备、用于在基板上沉积层的设备及用于输送保持设备的方法
CN105917019A (zh) * 2014-02-04 2016-08-31 应用材料公司 用于有机材料的蒸发源、具有用于有机材料的蒸发源的设备、具有带有用于有机材料的蒸发源的蒸发沉积设备的系统以及用于操作用于有机材料的蒸发源的方法
US12454750B2 (en) 2021-08-12 2025-10-28 Elevated Materials Us Llc Evaporator for effective surface area evaporation
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US2969448A (en) * 1959-03-03 1961-01-24 Continental Can Co Heater vaporizer element support
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
JPH01264632A (ja) * 1988-04-15 1989-10-20 Konica Corp 磁気記録媒体の製造方法および製造装置
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
IT1269042B (it) * 1994-03-18 1997-03-18 Galileo Vacuum Tec Spa Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
US7291185B2 (en) * 2001-06-08 2007-11-06 Matsushita Electric Industrial Co., Ltd. Method of manufacturing both-side metallized film with reduced blocking of metallized film and metallized film capacitor using the same
JP3608529B2 (ja) * 2001-06-08 2005-01-12 松下電器産業株式会社 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
CN2910966Y (zh) * 2006-03-24 2007-06-13 潘旭祥 高速卷绕多层电容薄膜镀膜机

Also Published As

Publication number Publication date
CN103249861A (zh) 2013-08-14
KR20130121905A (ko) 2013-11-06
US20140030435A1 (en) 2014-01-30
EP2646594A1 (en) 2013-10-09
WO2012072132A1 (en) 2012-06-07
KR20180002912A (ko) 2018-01-08
JP2013544322A (ja) 2013-12-12

Similar Documents

Publication Publication Date Title
JP7483883B2 (ja) スパッタ堆積装置及び方法
US9863034B2 (en) Vacuum vapor deposition method
CN103249861B (zh) 蒸发单元和真空涂布装置
JP6277277B2 (ja) 真空処理装置用の基板スプレッディングデバイス、基板スプレッディングデバイスを有する真空処理装置、及びそれを動作させる方法
CN107406969B (zh) 卷取式成膜装置、蒸发源单元和卷取式成膜方法
US20160340776A1 (en) Roller for spreading of a flexible substrate, apparatus for processing a flexible substrate and method of operating thereof
JP7499327B2 (ja) スパッタ堆積装置及び方法
TWI567216B (zh) 供濺鍍沉積的微型可旋轉式濺鍍裝置
WO2019181126A1 (ja) 塗布装置
JP2014184364A (ja) 乾燥ユニット、乾燥装置、および塗膜形成システム
WO2013132794A1 (ja) 蒸着装置
WO2013024707A1 (ja) 有機ｅｌ素子の製造方法及び製造装置
JP2026004381A (ja) スパッタ堆積
JP2016537504A (ja) 真空堆積装置のためのローラデバイス、ローラを有する真空堆積装置、及びローラを操作するための方法
US20080245300A1 (en) Apparatus and method for continuously coating strip substrates
CN115698370B (zh) 用于蒸发源的温度控制遮蔽件、用于在基板上沉积材料的材料沉积设备及方法
JP6283332B2 (ja) 蒸着ユニット及び真空コーティング装置
JP2011503344A (ja) 連続式のコーティング
JP2013544322A5 (https=)
US20190203342A1 (en) Cooling system and evaporation machine
JP2018537586A (ja) フレキシブル基板用のキャリア
KR20180005133A (ko) 증착 장치 및 증발원
CN116635566A (zh) 用于沉积蒸镀材料的沉积源、沉积设备及其方法
WO2019240802A1 (en) Evaporator for depositing material on a substrate, method of forming an evaporator, and evaporation apparatus for depositing material on a flexible substrate
CN115768916A (zh) 喷嘴组件、蒸发源和用于将蒸发的材料沉积至基板上的沉积系统和方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170315

Termination date: 20191201

CF01 Termination of patent right due to non-payment of annual fee