KR20150052355A - 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 - Google Patents

하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 Download PDF

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Publication number
KR20150052355A
KR20150052355A KR1020157010657A KR20157010657A KR20150052355A KR 20150052355 A KR20150052355 A KR 20150052355A KR 1020157010657 A KR1020157010657 A KR 1020157010657A KR 20157010657 A KR20157010657 A KR 20157010657A KR 20150052355 A KR20150052355 A KR 20150052355A
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KR
South Korea
Prior art keywords
thin film
housing
sample
charged particle
holding portion
Prior art date
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KR1020157010657A
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English (en)
Korean (ko)
Inventor
유스께 오미나미
도모히사 오따끼
스께히로 이또
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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Application filed by 가부시키가이샤 히다치 하이테크놀로지즈 filed Critical 가부시키가이샤 히다치 하이테크놀로지즈
Publication of KR20150052355A publication Critical patent/KR20150052355A/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020157010657A 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 KR20150052355A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011205499A JP5707286B2 (ja) 2011-09-21 2011-09-21 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
JPJP-P-2011-205499 2011-09-21
PCT/JP2012/067035 WO2013042425A1 (ja) 2011-09-21 2012-07-04 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020147004411A Division KR101542022B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020157032618A Division KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Publications (1)

Publication Number Publication Date
KR20150052355A true KR20150052355A (ko) 2015-05-13

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ID=47914206

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020147004411A KR101542022B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법
KR1020157010657A KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법
KR1020157032618A KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020147004411A KR101542022B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020157032618A KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Country Status (6)

Country Link
US (2) US9165741B2 (de)
JP (1) JP5707286B2 (de)
KR (3) KR101542022B1 (de)
CN (1) CN103782364B (de)
DE (1) DE112012003182B4 (de)
WO (1) WO2013042425A1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160134234A (ko) * 2015-05-15 2016-11-23 참엔지니어링(주) 시료 관찰 장치 및 커버 어셈블리
CN106158566A (zh) * 2015-05-15 2016-11-23 灿美工程股份有限公司 试样观察装置、盖组件及试样观察方法
KR20200082299A (ko) * 2018-12-28 2020-07-08 참엔지니어링(주) 시료 관찰 장치 및 방법

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
JP6207824B2 (ja) 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
WO2014167919A1 (ja) * 2013-04-12 2014-10-16 株式会社 日立ハイテクノロジーズ 荷電粒子線装置およびフィルタ部材
JP6169703B2 (ja) * 2013-08-23 2017-07-26 株式会社日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
GB201317026D0 (en) * 2013-09-25 2013-11-06 Oxford Instr Nanotechnology Tools Ltd X-ray analysis in air
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP2016213155A (ja) * 2015-05-13 2016-12-15 大日本印刷株式会社 試料収容セル
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6756058B2 (ja) * 2017-04-27 2020-09-16 キング・アブドゥッラー・ユニバーシティ・オブ・サイエンス・アンド・テクノロジー 透過型電子顕微鏡サンプル整列システム及び方法
KR101954328B1 (ko) * 2017-05-16 2019-03-06 (주)코셈 고분해능 주사전자현미경

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160134234A (ko) * 2015-05-15 2016-11-23 참엔지니어링(주) 시료 관찰 장치 및 커버 어셈블리
CN106158566A (zh) * 2015-05-15 2016-11-23 灿美工程股份有限公司 试样观察装置、盖组件及试样观察方法
KR20160134235A (ko) * 2015-05-15 2016-11-23 참엔지니어링(주) 시료 관찰 장치, 커버 어셈블리 및 시료 관찰 방법
KR20200082299A (ko) * 2018-12-28 2020-07-08 참엔지니어링(주) 시료 관찰 장치 및 방법

Also Published As

Publication number Publication date
JP5707286B2 (ja) 2015-04-30
US20140151553A1 (en) 2014-06-05
WO2013042425A1 (ja) 2013-03-28
KR20150133299A (ko) 2015-11-27
US9165741B2 (en) 2015-10-20
KR20140048999A (ko) 2014-04-24
US9673020B2 (en) 2017-06-06
CN103782364B (zh) 2016-04-27
DE112012003182B4 (de) 2021-06-10
KR101542022B1 (ko) 2015-08-04
US20150380208A1 (en) 2015-12-31
KR101589426B1 (ko) 2016-01-29
JP2013069443A (ja) 2013-04-18
CN103782364A (zh) 2014-05-07
DE112012003182T5 (de) 2014-04-17

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