KR20140068021A - 자체 청소 특성을 가진 반사방지 및 오염방지 코팅 - Google Patents
자체 청소 특성을 가진 반사방지 및 오염방지 코팅 Download PDFInfo
- Publication number
- KR20140068021A KR20140068021A KR20147003997A KR20147003997A KR20140068021A KR 20140068021 A KR20140068021 A KR 20140068021A KR 20147003997 A KR20147003997 A KR 20147003997A KR 20147003997 A KR20147003997 A KR 20147003997A KR 20140068021 A KR20140068021 A KR 20140068021A
- Authority
- KR
- South Korea
- Prior art keywords
- coating
- sol
- coatings
- substrate
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 377
- 230000003667 anti-reflective effect Effects 0.000 title claims description 30
- 238000004140 cleaning Methods 0.000 title description 26
- 239000011248 coating agent Substances 0.000 claims abstract description 277
- 239000000203 mixture Substances 0.000 claims abstract description 158
- 239000002243 precursor Substances 0.000 claims abstract description 133
- 238000005299 abrasion Methods 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims description 121
- 239000002904 solvent Substances 0.000 claims description 117
- 239000002245 particle Substances 0.000 claims description 92
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 75
- 238000000034 method Methods 0.000 claims description 60
- 239000000654 additive Substances 0.000 claims description 48
- 150000001282 organosilanes Chemical class 0.000 claims description 48
- 238000004132 cross linking Methods 0.000 claims description 28
- 238000002834 transmittance Methods 0.000 claims description 28
- 239000002585 base Substances 0.000 claims description 24
- 230000000996 additive effect Effects 0.000 claims description 23
- 230000002209 hydrophobic effect Effects 0.000 claims description 23
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 18
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 18
- 230000008569 process Effects 0.000 claims description 17
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 claims description 17
- 125000000524 functional group Chemical group 0.000 claims description 16
- 239000003054 catalyst Substances 0.000 claims description 15
- 230000001965 increasing effect Effects 0.000 claims description 12
- 229920000642 polymer Polymers 0.000 claims description 11
- 239000003960 organic solvent Substances 0.000 claims description 10
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 5
- 150000001298 alcohols Chemical class 0.000 claims description 5
- 239000003153 chemical reaction reagent Substances 0.000 claims description 5
- 239000003377 acid catalyst Substances 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 4
- 150000001299 aldehydes Chemical class 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 2
- 150000002170 ethers Chemical class 0.000 claims description 2
- 230000002940 repellent Effects 0.000 claims 1
- 239000005871 repellent Substances 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 122
- 229910000077 silane Inorganic materials 0.000 abstract description 122
- 239000011521 glass Substances 0.000 abstract description 98
- 239000008199 coating composition Substances 0.000 abstract description 31
- 230000003373 anti-fouling effect Effects 0.000 abstract description 19
- 238000003980 solgel method Methods 0.000 abstract description 5
- 239000003518 caustics Substances 0.000 abstract description 3
- 231100001010 corrosive Toxicity 0.000 abstract description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 41
- 239000000499 gel Substances 0.000 description 41
- 239000000428 dust Substances 0.000 description 39
- 239000007788 liquid Substances 0.000 description 31
- 239000000463 material Substances 0.000 description 31
- 239000000126 substance Substances 0.000 description 30
- 239000006117 anti-reflective coating Substances 0.000 description 25
- 239000010408 film Substances 0.000 description 25
- 230000003287 optical effect Effects 0.000 description 25
- 239000002253 acid Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 23
- 230000003993 interaction Effects 0.000 description 20
- 230000008901 benefit Effects 0.000 description 17
- 239000000243 solution Substances 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- 229910052739 hydrogen Inorganic materials 0.000 description 15
- 238000006460 hydrolysis reaction Methods 0.000 description 15
- 238000011282 treatment Methods 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 14
- 239000001257 hydrogen Substances 0.000 description 14
- -1 detergents Chemical class 0.000 description 13
- 230000007062 hydrolysis Effects 0.000 description 13
- 238000000527 sonication Methods 0.000 description 13
- 238000011109 contamination Methods 0.000 description 12
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- 229910002808 Si–O–Si Inorganic materials 0.000 description 11
- 230000002776 aggregation Effects 0.000 description 11
- 230000008859 change Effects 0.000 description 11
- 239000012528 membrane Substances 0.000 description 11
- 238000002156 mixing Methods 0.000 description 11
- 230000002829 reductive effect Effects 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 230000032683 aging Effects 0.000 description 10
- 238000001723 curing Methods 0.000 description 10
- 239000003599 detergent Substances 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 10
- 238000005498 polishing Methods 0.000 description 10
- 239000006185 dispersion Substances 0.000 description 9
- 230000007774 longterm Effects 0.000 description 9
- 150000007513 acids Chemical class 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000002708 enhancing effect Effects 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 239000006087 Silane Coupling Agent Substances 0.000 description 7
- 238000004220 aggregation Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000007373 indentation Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 150000004756 silanes Chemical class 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000007983 Tris buffer Substances 0.000 description 6
- 230000009471 action Effects 0.000 description 6
- 238000006482 condensation reaction Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- 239000005341 toughened glass Substances 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000013618 particulate matter Substances 0.000 description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000000411 transmission spectrum Methods 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000005329 float glass Substances 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- 239000011236 particulate material Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000443 aerosol Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 230000009878 intermolecular interaction Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 239000006072 paste Substances 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 125000005372 silanol group Chemical group 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 241000252506 Characiformes Species 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000000370 acceptor Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000010923 batch production Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000006664 bond formation reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 150000004820 halides Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 125000003253 isopropoxy group Chemical class [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000012429 reaction media Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- BVQYIDJXNYHKRK-UHFFFAOYSA-N trimethoxy(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F BVQYIDJXNYHKRK-UHFFFAOYSA-N 0.000 description 2
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 2
- QWOVEJBDMKHZQK-UHFFFAOYSA-N 1,3,5-tris(3-trimethoxysilylpropyl)-1,3,5-triazinane-2,4,6-trione Chemical compound CO[Si](OC)(OC)CCCN1C(=O)N(CCC[Si](OC)(OC)OC)C(=O)N(CCC[Si](OC)(OC)OC)C1=O QWOVEJBDMKHZQK-UHFFFAOYSA-N 0.000 description 1
- QZTKDVCDBIDYMD-UHFFFAOYSA-N 2,2'-[(2-amino-2-oxoethyl)imino]diacetic acid Chemical compound NC(=O)CN(CC(O)=O)CC(O)=O QZTKDVCDBIDYMD-UHFFFAOYSA-N 0.000 description 1
- WGGNJZRNHUJNEM-UHFFFAOYSA-N 2,2,4,4,6,6-hexamethyl-1,3,5,2,4,6-triazatrisilinane Chemical compound C[Si]1(C)N[Si](C)(C)N[Si](C)(C)N1 WGGNJZRNHUJNEM-UHFFFAOYSA-N 0.000 description 1
- SXGZJKUKBWWHRA-UHFFFAOYSA-N 2-(N-morpholiniumyl)ethanesulfonate Chemical compound [O-]S(=O)(=O)CC[NH+]1CCOCC1 SXGZJKUKBWWHRA-UHFFFAOYSA-N 0.000 description 1
- JKMHFZQWWAIEOD-UHFFFAOYSA-N 2-[4-(2-hydroxyethyl)piperazin-1-yl]ethanesulfonic acid Chemical compound OCC[NH+]1CCN(CCS([O-])(=O)=O)CC1 JKMHFZQWWAIEOD-UHFFFAOYSA-N 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- AUNDWZCDAOTGDQ-UHFFFAOYSA-N 4-triethoxysilylbutanal Chemical compound CCO[Si](OCC)(OCC)CCCC=O AUNDWZCDAOTGDQ-UHFFFAOYSA-N 0.000 description 1
- 239000001879 Curdlan Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000007995 HEPES buffer Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical group [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical group [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- FKPSBYZGRQJIMO-UHFFFAOYSA-M benzyl(triethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC1=CC=CC=C1 FKPSBYZGRQJIMO-UHFFFAOYSA-M 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- YQPFMTIZDAWFAC-UHFFFAOYSA-N dichloro-bis(trimethylsilyloxy)silane Chemical compound C[Si](C)(C)O[Si](Cl)(Cl)O[Si](C)(C)C YQPFMTIZDAWFAC-UHFFFAOYSA-N 0.000 description 1
- NAZQJQFKJXAPNG-UHFFFAOYSA-N dichloro-methoxy-propylsilane Chemical compound CCC[Si](Cl)(Cl)OC NAZQJQFKJXAPNG-UHFFFAOYSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- XFTDXAPRKPJHJV-UHFFFAOYSA-N diethoxy(isocyanatomethyl)silane Chemical compound N(=C=O)C[SiH](OCC)OCC XFTDXAPRKPJHJV-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000010452 phosphate Chemical group 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical group [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 230000010399 physical interaction Effects 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229920000438 poly[methyl(3,3,3-trifluoropropyl)siloxane] polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000013083 solar photovoltaic technology Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 238000007614 solvation Methods 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910021653 sulphate ion Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- NUMQCACRALPSHD-UHFFFAOYSA-N tert-butyl ethyl ether Chemical compound CCOC(C)(C)C NUMQCACRALPSHD-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- HPEPIADELDNCED-UHFFFAOYSA-N triethoxysilylmethanol Chemical compound CCO[Si](CO)(OCC)OCC HPEPIADELDNCED-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- JBYXACURRYATNJ-UHFFFAOYSA-N trimethoxy(1-trimethoxysilylhexyl)silane Chemical compound CCCCCC([Si](OC)(OC)OC)[Si](OC)(OC)OC JBYXACURRYATNJ-UHFFFAOYSA-N 0.000 description 1
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 description 1
- DJYGUVIGOGFJOF-UHFFFAOYSA-N trimethoxy(trimethoxysilylmethyl)silane Chemical compound CO[Si](OC)(OC)C[Si](OC)(OC)OC DJYGUVIGOGFJOF-UHFFFAOYSA-N 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1656—Antifouling paints; Underwater paints characterised by the film-forming substance
- C09D5/1662—Synthetic film-forming substance
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
- C03C2203/27—Wet processes, e.g. sol-gel process using alkoxides the alkoxides containing other organic groups, e.g. alkyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/184,568 | 2011-07-18 | ||
| US13/184,568 US8864897B2 (en) | 2009-04-30 | 2011-07-18 | Anti-reflective and anti-soiling coatings with self-cleaning properties |
| PCT/US2012/046791 WO2013012753A1 (en) | 2011-07-18 | 2012-07-13 | Anti-reflective and anti-soiling coatings with self-cleaning properties |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20140068021A true KR20140068021A (ko) | 2014-06-05 |
Family
ID=47558409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20147003997A Withdrawn KR20140068021A (ko) | 2011-07-18 | 2012-07-13 | 자체 청소 특성을 가진 반사방지 및 오염방지 코팅 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8864897B2 (enExample) |
| EP (1) | EP2734485A4 (enExample) |
| JP (1) | JP5954716B2 (enExample) |
| KR (1) | KR20140068021A (enExample) |
| CN (1) | CN103917503A (enExample) |
| MY (1) | MY164126A (enExample) |
| PH (1) | PH12014500172A1 (enExample) |
| WO (1) | WO2013012753A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170137760A (ko) * | 2015-03-17 | 2017-12-13 | 옵티툰 오와이 | 신규한 카보실록산 중합체 조성물, 그 제조 방법 및 용도 |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9353268B2 (en) | 2009-04-30 | 2016-05-31 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings for self-cleaning properties |
| US9376593B2 (en) | 2009-04-30 | 2016-06-28 | Enki Technology, Inc. | Multi-layer coatings |
| US8864897B2 (en) | 2009-04-30 | 2014-10-21 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings with self-cleaning properties |
| JP2013144427A (ja) * | 2011-12-16 | 2013-07-25 | Nitto Denko Corp | 赤外線反射フィルム |
| US9862842B2 (en) * | 2012-02-29 | 2018-01-09 | Sabic Global Technologies B.V. | Infrared radiation absorbing articles and method of manufacture |
| US10266702B2 (en) | 2012-06-08 | 2019-04-23 | University Of Houston System | Self-cleaning coatings and methods for making same |
| US20140153122A1 (en) * | 2012-11-30 | 2014-06-05 | Guardian Industries Corp. | Concentrating solar power apparatus having mirror coating and anti-soiling coating |
| US9181455B2 (en) | 2012-12-03 | 2015-11-10 | Guardian Industries Corp. | Method of making hydrophobic coated article, coated article including hydrophobic coatings, and/or sol compositions for use in the same |
| US9971065B2 (en) * | 2013-03-14 | 2018-05-15 | Gaurdian Glass, LLC | Anti-reflection glass made from sol made by blending tri-alkoxysilane and tetra-alkoxysilane inclusive sols |
| WO2014193513A2 (en) * | 2013-03-15 | 2014-12-04 | Enki Technology, Inc. | Tuning the anti-reflective, abrasion resistance, anti-soiling and self-cleaning properties of transparent coatings for different glass substrates and solar cells |
| US9366784B2 (en) | 2013-05-07 | 2016-06-14 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9684097B2 (en) | 2013-05-07 | 2017-06-20 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9359261B2 (en) | 2013-05-07 | 2016-06-07 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9703011B2 (en) | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
| WO2014186454A1 (en) | 2013-05-14 | 2014-11-20 | University Of Houston | Waterproof coating with nanoscopic/microscopic features |
| EP3122693A4 (en) * | 2014-03-25 | 2017-11-22 | Seungyeol Han | Low-temperature curable energy transmission enhancement coatings having tunable properties including optical,hydrophobicity and abrasion resistance |
| US9335444B2 (en) | 2014-05-12 | 2016-05-10 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| DE102014008310B4 (de) * | 2014-05-30 | 2016-10-13 | Ferro Gmbh | Beschichtungszusammensetzung für die Herstellung einer staubabweisenden Beschichtung, Substrat mit Beschichtung, insbesondere Glas- oder Spiegeloberflächen, Herstellung der Beschichtungszusammensetzung und des beschichteten Substrats und Verwendung |
| EP3170208B1 (en) * | 2014-07-14 | 2024-06-05 | First Solar, Inc. | Coating materials and methods for enhanced reliability |
| US9399720B2 (en) | 2014-07-14 | 2016-07-26 | Enki Technology, Inc. | High gain durable anti-reflective coating |
| US9382449B2 (en) | 2014-09-19 | 2016-07-05 | Enki Technology, Inc. | Optical enhancing durable anti-reflective coating |
| US9598586B2 (en) | 2014-07-14 | 2017-03-21 | Enki Technology, Inc. | Coating materials and methods for enhanced reliability |
| WO2016011071A2 (en) | 2014-07-14 | 2016-01-21 | Enki Technology, Inc. | High gain durable anti-reflective coating |
| US9790593B2 (en) | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| PL3203273T3 (pl) * | 2014-09-30 | 2022-03-14 | Nippon Sheet Glass Company, Limited | Płyta szklana powleczona nisko-odblaskowo, podłoże szklane oraz urządzenie do konwersji fotoelektrycznej |
| CN105450163A (zh) * | 2014-09-30 | 2016-03-30 | 杜邦公司 | 具有防污层的太阳能电池模块 |
| EP3212339A4 (en) * | 2014-10-30 | 2018-05-30 | Beckman Coulter, Inc. | Compositions and methods for coating surfaces |
| CN104845523B (zh) * | 2015-04-21 | 2017-03-22 | 衢州氟硅技术研究院 | 一种含多官能度含氟硅氧烷树脂的组合物及其制备方法 |
| CN112213802A (zh) | 2015-09-14 | 2021-01-12 | 康宁股份有限公司 | 减反射制品以及包含其的显示器装置 |
| US10112208B2 (en) | 2015-12-11 | 2018-10-30 | VITRO S.A.B. de C.V. | Glass articles with nanoparticle regions |
| TWI580739B (zh) * | 2015-12-29 | 2017-05-01 | 奇美實業股份有限公司 | 抗反射塗料組成物及抗反射膜 |
| CN106634565A (zh) * | 2016-10-21 | 2017-05-10 | 周荣 | 一种透明隔热玻璃涂料的制备方法 |
| CN115925275A (zh) * | 2016-11-18 | 2023-04-07 | 宾夕法尼亚州立大学研究基金会 | 排斥液体和粘弹性物质以及防生物污染的涂层 |
| US10498288B2 (en) | 2017-01-26 | 2019-12-03 | Evermore United S.A. | Waterless cleaning system and method for solar trackers using an autonomous robot |
| US10498287B2 (en) | 2017-01-26 | 2019-12-03 | Evermore United S.A. | Waterless cleaning system and method for solar trackers using an autonomous robot |
| US11201583B2 (en) | 2017-01-26 | 2021-12-14 | Evermore United S.A. | Waterless cleaning system and method for solar trackers using an autonomous robot |
| US10797636B2 (en) | 2017-01-26 | 2020-10-06 | Evermore United S.A. | Waterless cleaning system and method for solar trackers using an autonomous robot |
| US12408924B2 (en) | 2017-05-12 | 2025-09-09 | Robert S. Fishel | Mechanism and device for left atrial appendage occlusion with electrical isolation |
| US11357512B2 (en) | 2017-05-12 | 2022-06-14 | Robert Fishel | Mechanism and device for left atrial appendage occlusion with electrical isolation |
| CN111132945B (zh) * | 2017-07-31 | 2022-10-21 | 康宁股份有限公司 | 具有受控的粗糙度和微结构的涂层 |
| KR102824070B1 (ko) | 2018-08-17 | 2025-06-23 | 코닝 인코포레이티드 | 얇고, 내구성 있는 반사-방지 구조를 갖는 무기산화물 물품 |
| GB2581513A (en) * | 2019-02-21 | 2020-08-26 | Kastus Tech Dac | Nanostructured hybrid sol-gel coatings for metal surface protection |
| CN111019522A (zh) * | 2019-12-20 | 2020-04-17 | 苏州浩纳新材料科技有限公司 | 具有自清洁和增透双功能的太阳能组件涂层及制备方法 |
| CN111244213B (zh) * | 2020-03-10 | 2022-01-28 | 英利能源(中国)有限公司 | 一种光伏组件 |
| CN111471995B (zh) * | 2020-05-21 | 2022-05-24 | 中物院成都科学技术发展中心 | 一种防月尘材料及其应用 |
| CN111592233A (zh) * | 2020-05-29 | 2020-08-28 | 醴陵旗滨电子玻璃有限公司 | 化学强化玻璃、浮法玻璃原片及其制备方法和生产线 |
| US12386101B2 (en) | 2020-07-09 | 2025-08-12 | Corning Incorporated | Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same |
| WO2022098740A1 (en) * | 2020-11-05 | 2022-05-12 | Quantum Innovations, Inc. | Antibacterial and/or antiviral treatment composition for optical components and method of application |
| CN114620947B (zh) * | 2022-03-10 | 2023-03-17 | 福耀玻璃工业集团股份有限公司 | 车辆用憎水减反玻璃及其制造方法与夹层玻璃 |
| CN116589198A (zh) * | 2023-05-18 | 2023-08-15 | 咸宁南玻节能玻璃有限公司 | 一种ag防眩玻璃的制备方法 |
| CN116656155B (zh) * | 2023-05-22 | 2024-10-18 | 兰州空间技术物理研究所 | 一种太阳能电池表面月尘防护涂层及其制备方法和防尘效率评价方法 |
| CN117903695B (zh) * | 2024-01-19 | 2025-12-09 | 青岛理工大学 | 一种固态超滑表面及其构建方法和应用 |
| CN119307180B (zh) * | 2024-12-17 | 2025-04-18 | 成都晨光博达新材料股份有限公司 | 一种涂料组合物、抗静电保护涂层及制备方法 |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4049506A (en) | 1974-09-03 | 1977-09-20 | Tribotech | Method for coating bonding tools and product |
| US4319983A (en) | 1980-05-19 | 1982-03-16 | Atlantic Richfield Company | Passivation process |
| US4535026A (en) | 1983-06-29 | 1985-08-13 | The United States Of America As Represented By The United States Department Of Energy | Antireflective graded index silica coating, method for making |
| DE3583707D1 (de) | 1984-06-26 | 1991-09-12 | Asahi Glass Co Ltd | Durchsichtiger schwer schmutzender gegenstand mit niedriger reflexion. |
| DE3730022A1 (de) | 1987-09-08 | 1989-03-16 | Basf Ag | Verfahren zum herstellen von homo- und copolymerisaten des propens mittels eines ziegler-natta-katalysatorsystems |
| US4929278A (en) | 1988-01-26 | 1990-05-29 | United States Department Of Energy | Sol-gel antireflective coating on plastics |
| US4966812A (en) | 1988-01-26 | 1990-10-30 | The United States Of America As Represented By The Department Of Energy | Sol-gel antireflective coating on plastics |
| JPH02264074A (ja) | 1989-04-05 | 1990-10-26 | Yoshio Ichikawa | 抗菌性コーティング用組成物および抗菌性布帛 |
| JPH0485380A (ja) | 1990-07-25 | 1992-03-18 | Matsushita Electric Works Ltd | 無機系コーティング材 |
| JPH05196802A (ja) * | 1992-01-23 | 1993-08-06 | Ito Kogaku Kogyo Kk | 光学部品の反射防止処理液及び反射防止処理光学部品 |
| US5698266A (en) | 1993-04-05 | 1997-12-16 | Commissariat A L'energie Atomique | Process for the production of thin coatings having optical and abrasion resistance properties |
| US20010031811A1 (en) | 1993-12-13 | 2001-10-18 | Huawen Li | Durable coating composition, process for producing durable, antireflective coatings, and coated articles |
| FR2718143B1 (fr) | 1994-03-29 | 1996-11-29 | Saint Gobain Vitrage | Composition pour un revêtement non mouillable. |
| JPH085380A (ja) | 1994-06-23 | 1996-01-12 | Sony Corp | 地磁気方位センサ |
| US5580819A (en) | 1995-03-22 | 1996-12-03 | Ppg Industries, Inc. | Coating composition, process for producing antireflective coatings, and coated articles |
| JP3079960B2 (ja) | 1995-08-02 | 2000-08-21 | 松下電器産業株式会社 | 電子レンジとガラス板 |
| US6183872B1 (en) | 1995-08-11 | 2001-02-06 | Daikin Industries, Ltd. | Silicon-containing organic fluoropolymers and use of the same |
| FR2748743B1 (fr) | 1996-05-14 | 1998-06-19 | Saint Gobain Vitrage | Vitrage a revetement antireflet |
| DE19649953A1 (de) | 1996-12-03 | 1998-06-04 | Huels Chemische Werke Ag | Fluoralkyl-funktionelle Organopolysiloxan-haltige Zusammensetzungen auf Wasserbasis, Verfahren zu deren Herstellung sowie deren Verwendung |
| US5851674A (en) | 1997-07-30 | 1998-12-22 | Minnesota Mining And Manufacturing Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| US6277485B1 (en) | 1998-01-27 | 2001-08-21 | 3M Innovative Properties Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| AU5484499A (en) | 1998-08-18 | 2000-03-14 | Ppg Industries Ohio, Inc. | Process for producing durable antireflective surfaces and antireflective articles |
| US6143358A (en) | 1998-10-01 | 2000-11-07 | Nanofilm, Ltd. | Hydrophobic thin films on magnesium fluoride surfaces |
| DE19940858A1 (de) | 1999-08-27 | 2001-03-01 | Basf Coatings Ag | Sol-Gel-Überzug für einschichtige oder mehrschichtige Lackierungen |
| PT1286592E (pt) | 2000-06-06 | 2008-12-16 | Woodholdings Environmental Inc | Composições conservantes para produtos de madeira |
| US6902767B2 (en) | 2000-06-21 | 2005-06-07 | D & L, Llc | Process for treating wood and products from treated wood |
| JP4126522B2 (ja) * | 2000-08-04 | 2008-07-30 | 信越化学工業株式会社 | 被膜形成用組成物用縮合物及び加水分解物の製造方法 |
| US7351449B2 (en) | 2000-09-22 | 2008-04-01 | N Gimat Co. | Chemical vapor deposition methods for making powders and coatings, and coatings made using these methods |
| DE10051725A1 (de) | 2000-10-18 | 2002-05-02 | Merck Patent Gmbh | Wäßrige Beschichtungslösung für abriebfeste SiO2-Antireflexschichten |
| US6906115B2 (en) | 2001-06-27 | 2005-06-14 | Daikin Industries, Ltd. | Surface treatment composition and preparation thereof |
| DE10146687C1 (de) | 2001-09-21 | 2003-06-26 | Flabeg Solarglas Gmbh & Co Kg | Glas mit einer porösen Antireflex-Oberflächenbeschichtung sowie Verfahren zur Herstellung des Glases und Verwendung eines derartigen Glases |
| TW593188B (en) | 2001-09-21 | 2004-06-21 | Merck Patent Gmbh | Hybrid sol for the production of abrasion-resistant SiO2 antireflection layers |
| JP4107050B2 (ja) * | 2001-10-25 | 2008-06-25 | 松下電工株式会社 | コーティング材組成物及びそれにより形成された被膜を有する物品 |
| US6692832B2 (en) | 2002-03-25 | 2004-02-17 | Guardian Industries Corporation | Anti-reflective hydrophobic coatings and methods |
| JP2004083812A (ja) * | 2002-08-28 | 2004-03-18 | Catalysts & Chem Ind Co Ltd | 透明被膜形成用塗布液および透明被膜付基材、表示装置 |
| EP1418448A1 (en) | 2002-11-06 | 2004-05-12 | Koninklijke DSM N.V. | Preparation of a mechanically durable single layer coating with anti-reflective properties |
| DE10253839A1 (de) * | 2002-11-14 | 2004-05-27 | Hansgrohe Ag | Beschichtungsverfahren |
| DE10253841A1 (de) * | 2002-11-14 | 2004-05-27 | Hansgrohe Ag | Beschichtungsverfahren |
| US6768048B2 (en) | 2002-12-04 | 2004-07-27 | The Boeing Company | Sol-gel coatings for solar cells |
| CN100349999C (zh) | 2003-02-28 | 2007-11-21 | 皇家飞利浦电子股份有限公司 | 含有含氟聚合物的溶胶凝胶涂料 |
| CN100457844C (zh) | 2003-04-09 | 2009-02-04 | Lg化学株式会社 | 生产绝缘膜的涂料组合物、制备绝缘膜的方法、绝缘膜及含有该绝缘膜的半导体器件 |
| DE60326121D1 (de) | 2003-05-20 | 2009-03-26 | Dsm Ip Assets Bv | Verfahren zur Herstellung von Nanostrukturierten Oberflächenbeschichtungen, deren Beschichtungen und Gegenständen enthaltend die Beschichtung |
| US6997018B2 (en) | 2003-06-02 | 2006-02-14 | Ferro Corporation | Method of micro and nano texturing glass |
| US7914897B2 (en) | 2003-06-23 | 2011-03-29 | University Of Zurich | Superhydrophobic coating |
| US20080028984A1 (en) | 2003-10-28 | 2008-02-07 | Tru Vue, Inc. | Anti-Reflective Coating for a Substrate |
| US7919145B2 (en) | 2003-11-21 | 2011-04-05 | Xerocoat Inc. | Silica films and method of production thereof |
| JP4803342B2 (ja) * | 2004-10-19 | 2011-10-26 | 信越化学工業株式会社 | 耐擦傷性表面被膜形成用シリコーンコーティング組成物及びそれを用いた被覆物品 |
| CN101203581B (zh) | 2005-05-31 | 2012-09-05 | 布里斯麦特公司 | 二氧化硅膜形态的控制 |
| US20060292345A1 (en) | 2005-06-14 | 2006-12-28 | Dave Bakul C | Micropatterned superhydrophobic silica based sol-gel surfaces |
| DE102005060401A1 (de) | 2005-12-15 | 2007-06-21 | Degussa Gmbh | Lagerstabile Beschichtungszusammensetzung für eine abriebfeste und witterungsbeständige Ausstattung glatter anorganischer Oberflächen mit "Easy-to-clean"-Eigenschaften |
| US20070184247A1 (en) | 2006-02-03 | 2007-08-09 | Simpson John T | Transparent, super-hydrophobic, disordered composite material |
| KR100981575B1 (ko) * | 2006-07-10 | 2010-09-10 | 주식회사 엘지화학 | 오염 제거가 용이한 디스플레이 반사 방지용 코팅 조성물 |
| US7553514B2 (en) | 2006-08-28 | 2009-06-30 | 3M Innovative Properties Company | Antireflective article |
| US20080113188A1 (en) | 2006-11-09 | 2008-05-15 | Shah Pratik B | Hydrophobic organic-inorganic hybrid silane coatings |
| PT1935929E (pt) | 2006-12-19 | 2012-02-09 | Evonik Degussa Gmbh | Processo sol-gel para produzir películas protetoras para substratos poliméricos |
| US7931940B2 (en) | 2007-08-28 | 2011-04-26 | Hoya Corporation | Production method of silica aerogel film, anti-reflection coating and optical element |
| FR2927005B1 (fr) | 2008-02-05 | 2011-12-23 | Commissariat Energie Atomique | Materiau hybride organique-inorganique, couche mince optique de ce materiau, materiau optique les comprenant, et leur procede de fabrication |
| KR101581488B1 (ko) | 2008-08-29 | 2015-12-30 | 코니카 미놀타 어드밴스드 레이어즈 인코포레이티드 | 광학 필름, 반사 방지 필름, 편광판 및 액정 표시 장치 |
| JP2010202731A (ja) | 2009-03-02 | 2010-09-16 | Shin-Etsu Chemical Co Ltd | 紫外線遮蔽性シリコーンコーティング組成物及び被覆物品 |
| WO2010127034A1 (en) | 2009-04-30 | 2010-11-04 | Southern Illinois University Carbondale | Ant-reflective and anti-soiling coatings with self-cleaning properties |
| US8864897B2 (en) | 2009-04-30 | 2014-10-21 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings with self-cleaning properties |
| US9441119B2 (en) | 2011-03-28 | 2016-09-13 | Intermolecular, Inc. | Sol-gel transition control of coatings by addition of solidifiers for conformal coatings on textured glass |
| US8668960B1 (en) | 2013-02-08 | 2014-03-11 | Enki Technology, Inc. | Flow coating apparatus and method of coating |
-
2011
- 2011-07-18 US US13/184,568 patent/US8864897B2/en active Active
-
2012
- 2012-07-13 MY MYPI2014000127A patent/MY164126A/en unknown
- 2012-07-13 WO PCT/US2012/046791 patent/WO2013012753A1/en not_active Ceased
- 2012-07-13 CN CN201280045439.5A patent/CN103917503A/zh active Pending
- 2012-07-13 EP EP12815529.8A patent/EP2734485A4/en not_active Withdrawn
- 2012-07-13 PH PH1/2014/500172A patent/PH12014500172A1/en unknown
- 2012-07-13 JP JP2014521679A patent/JP5954716B2/ja active Active
- 2012-07-13 KR KR20147003997A patent/KR20140068021A/ko not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170137760A (ko) * | 2015-03-17 | 2017-12-13 | 옵티툰 오와이 | 신규한 카보실록산 중합체 조성물, 그 제조 방법 및 용도 |
Also Published As
| Publication number | Publication date |
|---|---|
| PH12014500172A1 (en) | 2021-07-12 |
| EP2734485A4 (en) | 2015-02-25 |
| EP2734485A1 (en) | 2014-05-28 |
| CN103917503A (zh) | 2014-07-09 |
| MY164126A (en) | 2017-11-30 |
| US20120040179A1 (en) | 2012-02-16 |
| WO2013012753A8 (en) | 2013-07-11 |
| WO2013012753A1 (en) | 2013-01-24 |
| JP5954716B2 (ja) | 2016-07-20 |
| JP2014527098A (ja) | 2014-10-09 |
| US8864897B2 (en) | 2014-10-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5954716B2 (ja) | 自浄性を有する反射防止性および防汚性コーティング | |
| US9461185B2 (en) | Anti-reflective and anti-soiling coatings with self-cleaning properties | |
| US9376593B2 (en) | Multi-layer coatings | |
| EP3172260B1 (en) | High gain durable anti-reflective coating | |
| US20140261673A1 (en) | Tuning the anti-reflective, abrasion resistance, anti-soiling and self-cleaning properties of transparent coatings for different glass substrates and solar cells | |
| US9399720B2 (en) | High gain durable anti-reflective coating | |
| US20100275815A1 (en) | Anti-Reflective and Anti-Soiling Coatings with Self-Cleaning Properties | |
| WO2016064494A2 (en) | Multi-layer coatings | |
| US9382449B2 (en) | Optical enhancing durable anti-reflective coating | |
| WO2016011071A2 (en) | High gain durable anti-reflective coating | |
| US20140308529A1 (en) | Coating Composition And Antireflective Coating Prepared Therefrom | |
| US20160085944A1 (en) | Glass coating specification library | |
| CN101675133A (zh) | 可手工涂布的溶胶凝胶膜形成用涂布液 | |
| US20140272387A1 (en) | Anti-Glare Coatings with Aqueous Particle Dispersions and Methods for Forming the Same | |
| US20140182670A1 (en) | Light trapping and antireflective coatings | |
| JP4654443B2 (ja) | 太陽エネルギー利用装置の製造方法 | |
| JP7083342B2 (ja) | 低反射膜付き透明基板、光電変換装置、低反射膜付き透明基板の低反射膜を形成するための塗工液及び低反射膜付き透明基板の製造方法 | |
| JP6077659B2 (ja) | コーティング組成物 | |
| JP2006256951A (ja) | 滑水性ガラス物品の製法 | |
| WO2018185865A1 (ja) | 親水性付与剤、親水性被膜形成方法、親水性被膜、及び太陽光パネル |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20140217 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
Patent event date: 20150223 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |