KR20140006811A - 경화성 수지 조성물 및 경화물 - Google Patents

경화성 수지 조성물 및 경화물 Download PDF

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Publication number
KR20140006811A
KR20140006811A KR1020137016336A KR20137016336A KR20140006811A KR 20140006811 A KR20140006811 A KR 20140006811A KR 1020137016336 A KR1020137016336 A KR 1020137016336A KR 20137016336 A KR20137016336 A KR 20137016336A KR 20140006811 A KR20140006811 A KR 20140006811A
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KR
South Korea
Prior art keywords
group
ladder
silsesquioxane
resin composition
curable resin
Prior art date
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KR1020137016336A
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English (en)
Korean (ko)
Inventor
시게아끼 가무로
게이조 이노우에
히로후미 후베쯔
Original Assignee
가부시끼가이샤 다이셀
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Application filed by 가부시끼가이샤 다이셀 filed Critical 가부시끼가이샤 다이셀
Publication of KR20140006811A publication Critical patent/KR20140006811A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C08K5/34924—Triazines containing cyanurate groups; Tautomers thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52—Encapsulations
    • H01L33/56—Materials, e.g. epoxy or silicone resin

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Silicon Polymers (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
KR1020137016336A 2010-11-25 2011-11-21 경화성 수지 조성물 및 경화물 KR20140006811A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010262919A JP2012111875A (ja) 2010-11-25 2010-11-25 硬化性樹脂組成物及び硬化物
JPJP-P-2010-262919 2010-11-25
PCT/JP2011/076792 WO2012070525A1 (ja) 2010-11-25 2011-11-21 硬化性樹脂組成物及び硬化物

Publications (1)

Publication Number Publication Date
KR20140006811A true KR20140006811A (ko) 2014-01-16

Family

ID=46145867

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137016336A KR20140006811A (ko) 2010-11-25 2011-11-21 경화성 수지 조성물 및 경화물

Country Status (4)

Country Link
JP (1) JP2012111875A (ja)
KR (1) KR20140006811A (ja)
CN (1) CN103154145B (ja)
WO (1) WO2012070525A1 (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5933932B2 (ja) * 2011-05-06 2016-06-15 株式会社カネカ 硬化性組成物
CN103547632A (zh) * 2011-07-14 2014-01-29 积水化学工业株式会社 光半导体装置用密封剂及光半导体装置
JP5937798B2 (ja) * 2011-09-07 2016-06-22 株式会社ダイセル ラダー型シルセスキオキサン及びその製造方法、並びに、硬化性樹脂組成物及びその硬化物
JP6059010B2 (ja) * 2012-12-28 2017-01-11 東レ・ダウコーニング株式会社 硬化性シリコーン組成物、その硬化物、および光半導体装置
JP5778875B2 (ja) * 2013-01-09 2015-09-16 株式会社ダイセル 硬化性樹脂組成物及びその硬化物
US9481791B2 (en) 2013-02-14 2016-11-01 Daicel Corporation Curable resin composition and cured product thereof, encapsulant, and semiconductor device
JP5736524B1 (ja) * 2013-08-01 2015-06-17 株式会社ダイセル 硬化性樹脂組成物及びそれを用いた半導体装置
MY158023A (en) * 2013-08-02 2016-08-30 Daicel Corp Curable resin composition and semiconductor device using same
JP5830201B2 (ja) * 2013-08-06 2015-12-09 株式会社ダイセル 硬化性樹脂組成物及びそれを用いた半導体装置
JP2015110694A (ja) * 2013-12-06 2015-06-18 サンユレック株式会社 シリコーン樹脂組成物
WO2015186722A1 (ja) * 2014-06-06 2015-12-10 株式会社ダイセル 硬化性樹脂組成物、硬化物、封止材、及び半導体装置
JP6496185B2 (ja) * 2015-05-20 2019-04-03 株式会社ダイセル 硬化性シリコーン樹脂組成物及びその硬化物
JP6344333B2 (ja) * 2015-08-05 2018-06-20 信越化学工業株式会社 付加硬化性シリコーンゴム組成物
EP3844231A1 (en) * 2018-08-31 2021-07-07 Wacker Chemie AG Curable organopolysiloxane composition, encapsulant, and semiconductor device
CN111909527B (zh) * 2019-05-10 2021-09-28 中国科学院化学研究所 可交联的有机硅组合物及反应产物及制备方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1058730C (zh) * 1994-01-21 2000-11-22 中国科学院化学研究所 高规整性梯形聚氢倍半硅氧烷及其共聚物和它们的制法
JP2002348473A (ja) * 2001-05-23 2002-12-04 Asahi Denka Kogyo Kk 硬化性組成物
JP5225528B2 (ja) * 2001-05-30 2013-07-03 株式会社Ａｄｅｋａ ケイ素含有重合体の製造方法
JP4267404B2 (ja) * 2003-08-22 2009-05-27 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 光学材料用硬化性組成物
JP4908736B2 (ja) * 2003-10-01 2012-04-04 東レ・ダウコーニング株式会社 硬化性オルガノポリシロキサン組成物および半導体装置
JP4494077B2 (ja) * 2004-04-22 2010-06-30 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 光学材料封止用硬化性組成物
JP5392805B2 (ja) * 2005-06-28 2014-01-22 東レ・ダウコーニング株式会社 硬化性オルガノポリシロキサン樹脂組成物および光学部材
JP5705416B2 (ja) * 2008-04-11 2015-04-22 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 半導体用硬化性シリコーン組成物及びそれを用いた半導体装置
JP5972512B2 (ja) * 2008-06-18 2016-08-17 東レ・ダウコーニング株式会社 硬化性オルガノポリシロキサン組成物及び半導体装置
JP5667740B2 (ja) * 2008-06-18 2015-02-12 東レ・ダウコーニング株式会社 硬化性オルガノポリシロキサン組成物及び半導体装置
JP5426482B2 (ja) * 2010-05-31 2014-02-26 信越化学工業株式会社 発光ダイオード用付加硬化型シリコーン樹脂組成物

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Publication number Publication date
WO2012070525A1 (ja) 2012-05-31
CN103154145A (zh) 2013-06-12
JP2012111875A (ja) 2012-06-14
CN103154145B (zh) 2015-09-16

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