KR20130132769A - 기반 상에 배치된 리소그래피 시스템과 기반 상에 리소그래피 시스템을 배치하는 방법 - Google Patents

기반 상에 배치된 리소그래피 시스템과 기반 상에 리소그래피 시스템을 배치하는 방법 Download PDF

Info

Publication number
KR20130132769A
KR20130132769A KR1020137006705A KR20137006705A KR20130132769A KR 20130132769 A KR20130132769 A KR 20130132769A KR 1020137006705 A KR1020137006705 A KR 1020137006705A KR 20137006705 A KR20137006705 A KR 20137006705A KR 20130132769 A KR20130132769 A KR 20130132769A
Authority
KR
South Korea
Prior art keywords
base plate
base
struts
lithographic system
resin material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020137006705A
Other languages
English (en)
Korean (ko)
Inventor
예리 페이스터
Original Assignee
마퍼 리쏘그라피 아이피 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마퍼 리쏘그라피 아이피 비.브이. filed Critical 마퍼 리쏘그라피 아이피 비.브이.
Publication of KR20130132769A publication Critical patent/KR20130132769A/ko
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
    • F16F15/046—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means using combinations of springs of different kinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electron Beam Exposure (AREA)
KR1020137006705A 2010-09-20 2011-09-20 기반 상에 배치된 리소그래피 시스템과 기반 상에 리소그래피 시스템을 배치하는 방법 Withdrawn KR20130132769A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US38469010P 2010-09-20 2010-09-20
US61/384,690 2010-09-20
NL2005374A NL2005374C2 (en) 2010-09-20 2010-09-20 Method for arranging a lithography system on a foundation, and lithography system arranged on said foundation.
NL2005374 2010-09-20
PCT/NL2011/050630 WO2012039606A1 (en) 2010-09-20 2011-09-20 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation

Publications (1)

Publication Number Publication Date
KR20130132769A true KR20130132769A (ko) 2013-12-05

Family

ID=43920813

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137006705A Withdrawn KR20130132769A (ko) 2010-09-20 2011-09-20 기반 상에 배치된 리소그래피 시스템과 기반 상에 리소그래피 시스템을 배치하는 방법

Country Status (6)

Country Link
EP (1) EP2619629A1 (https=)
JP (1) JP2013543254A (https=)
KR (1) KR20130132769A (https=)
NL (1) NL2005374C2 (https=)
TW (1) TW201217915A (https=)
WO (1) WO2012039606A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6817621B2 (ja) * 2016-10-25 2021-01-20 株式会社マルテー大塚 道路鋲と、道路鋲の補修方法
IL267672B2 (en) 2016-12-30 2023-04-01 Asml Netherlands Bv An adjustable assembly and a substrate exposure system containing this adjustable assembly
US10048599B2 (en) 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
TWI794964B (zh) * 2021-09-09 2023-03-01 協崑股份有限公司 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805000A (en) * 1986-01-17 1989-02-14 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
KR100250152B1 (ko) * 1997-11-15 2000-03-15 유무성 노광장치
AU5447499A (en) * 1998-09-03 2000-03-27 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
WO2000025352A1 (en) * 1998-10-28 2000-05-04 Nikon Corporation Stage device, exposure system, method of device manufacture, and device
JP2001148341A (ja) * 1999-11-19 2001-05-29 Nikon Corp 露光装置
JP2004063653A (ja) * 2002-07-26 2004-02-26 Nikon Corp 防振装置、ステージ装置及び露光装置
TWI307526B (en) * 2002-08-06 2009-03-11 Nikon Corp Supporting device and the mamufacturing method thereof, stage device and exposure device
US20040149881A1 (en) * 2003-01-31 2004-08-05 Allen David S Adjustable support structure for air conditioner and the like
US7460208B2 (en) * 2005-02-18 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009164307A (ja) * 2007-12-28 2009-07-23 Canon Inc 支持構造、露光装置、支持構造の形成方法、及び、デバイス製造方法
US8739383B2 (en) * 2009-04-20 2014-06-03 Nikon Corporation Method and apparatus for aligning mirror blocks of a multi-element mirror assembly

Also Published As

Publication number Publication date
EP2619629A1 (en) 2013-07-31
WO2012039606A9 (en) 2012-06-28
WO2012039606A1 (en) 2012-03-29
TW201217915A (en) 2012-05-01
NL2005374C2 (en) 2012-03-22
JP2013543254A (ja) 2013-11-28
WO2012039606A4 (en) 2012-05-18

Similar Documents

Publication Publication Date Title
US7988122B2 (en) Vibration control pedestal and installation method thereof
US20120069317A1 (en) Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
KR20090072985A (ko) 노광장치, 구조체, 장치의 설치방법 및 디바이스 제조방법
JP5641950B2 (ja) タービンの仮組立装置およびタービン組立方法
KR20130132769A (ko) 기반 상에 배치된 리소그래피 시스템과 기반 상에 리소그래피 시스템을 배치하는 방법
US6208408B1 (en) Projection exposure apparatus and device manufacturing method
JP4195497B2 (ja) ステージ装置
CN103797420A (zh) 具有基底板的真空腔室
US20060175910A1 (en) Positioning apparatus
US11243476B2 (en) Stage apparatus, lithographic apparatus, control unit and method
CN1653586A (zh) 用于圆片制造设备预简化的设施连接斗
KR101536485B1 (ko) 터빈 외부 차실, 터빈 외부 차실용 가대 및 터빈 외부 차실용 가대의 시공 방법
CN1591194A (zh) 光刻装置和器件制造方法
JP2020026730A (ja) 防振浮き床支持ばね伸縮機構、防振浮き床の施工方法及び防振浮き床のばねユニットの交換方法
JP4449299B2 (ja) 基板ホルダ、基板トレイ、ステージ装置、露光装置
TWI403860B (zh) 曝光設備及裝置製造方法
CN102454733A (zh) 板弹簧、平台系统以及光刻设备
CN1365329A (zh) 车辆、尤其是客运火车中用于地板结构和其他的内装部件的支座之定位和找平的方法与装置
KR20040076289A (ko) 이중 바닥 구조
JP4964853B2 (ja) ステージ装置
KR102338771B1 (ko) 유압 댐퍼에 의한 높이조절이 가능한 분리형 제진대 시스템
KR102727996B1 (ko) 개선된 제진대유닛들로 분절형 제진대를 시공하는 방법
JP5766835B2 (ja) タービン外部車室用架台の施工方法
TWI794964B (zh) 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法
TW202304276A (zh) 用於增進數位微影蝕刻精確度的橋接器加固構件

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PC1203 Withdrawal of no request for examination

St.27 status event code: N-1-6-B10-B12-nap-PC1203

WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid
P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000