TW201217915A - Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation - Google Patents

Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation Download PDF

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Publication number
TW201217915A
TW201217915A TW100133722A TW100133722A TW201217915A TW 201217915 A TW201217915 A TW 201217915A TW 100133722 A TW100133722 A TW 100133722A TW 100133722 A TW100133722 A TW 100133722A TW 201217915 A TW201217915 A TW 201217915A
Authority
TW
Taiwan
Prior art keywords
substrate
lithography system
pedestal
resin material
item
Prior art date
Application number
TW100133722A
Other languages
English (en)
Chinese (zh)
Inventor
Jerry Peijster
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of TW201217915A publication Critical patent/TW201217915A/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
    • F16F15/046—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means using combinations of springs of different kinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electron Beam Exposure (AREA)
TW100133722A 2010-09-20 2011-09-20 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation TW201217915A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US38469010P 2010-09-20 2010-09-20
NL2005374A NL2005374C2 (en) 2010-09-20 2010-09-20 Method for arranging a lithography system on a foundation, and lithography system arranged on said foundation.

Publications (1)

Publication Number Publication Date
TW201217915A true TW201217915A (en) 2012-05-01

Family

ID=43920813

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100133722A TW201217915A (en) 2010-09-20 2011-09-20 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation

Country Status (6)

Country Link
EP (1) EP2619629A1 (https=)
JP (1) JP2013543254A (https=)
KR (1) KR20130132769A (https=)
NL (1) NL2005374C2 (https=)
TW (1) TW201217915A (https=)
WO (1) WO2012039606A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI794964B (zh) * 2021-09-09 2023-03-01 協崑股份有限公司 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6817621B2 (ja) * 2016-10-25 2021-01-20 株式会社マルテー大塚 道路鋲と、道路鋲の補修方法
IL267672B2 (en) 2016-12-30 2023-04-01 Asml Netherlands Bv An adjustable assembly and a substrate exposure system containing this adjustable assembly
US10048599B2 (en) 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4805000A (en) * 1986-01-17 1989-02-14 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
KR100250152B1 (ko) * 1997-11-15 2000-03-15 유무성 노광장치
AU5447499A (en) * 1998-09-03 2000-03-27 Nikon Corporation Exposure apparatus and exposure method, and device and method for producing the same
WO2000025352A1 (en) * 1998-10-28 2000-05-04 Nikon Corporation Stage device, exposure system, method of device manufacture, and device
JP2001148341A (ja) * 1999-11-19 2001-05-29 Nikon Corp 露光装置
JP2004063653A (ja) * 2002-07-26 2004-02-26 Nikon Corp 防振装置、ステージ装置及び露光装置
TWI307526B (en) * 2002-08-06 2009-03-11 Nikon Corp Supporting device and the mamufacturing method thereof, stage device and exposure device
US20040149881A1 (en) * 2003-01-31 2004-08-05 Allen David S Adjustable support structure for air conditioner and the like
US7460208B2 (en) * 2005-02-18 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2009164307A (ja) * 2007-12-28 2009-07-23 Canon Inc 支持構造、露光装置、支持構造の形成方法、及び、デバイス製造方法
US8739383B2 (en) * 2009-04-20 2014-06-03 Nikon Corporation Method and apparatus for aligning mirror blocks of a multi-element mirror assembly

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI794964B (zh) * 2021-09-09 2023-03-01 協崑股份有限公司 極紫外光設備（ｅｕｖ）之高精密度承載基座及其實施方法

Also Published As

Publication number Publication date
EP2619629A1 (en) 2013-07-31
WO2012039606A9 (en) 2012-06-28
WO2012039606A1 (en) 2012-03-29
NL2005374C2 (en) 2012-03-22
JP2013543254A (ja) 2013-11-28
KR20130132769A (ko) 2013-12-05
WO2012039606A4 (en) 2012-05-18

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