KR20130020876A - 포토리소그래피 시스템용 프로그래머블 조명기와 조명 방법 - Google Patents

포토리소그래피 시스템용 프로그래머블 조명기와 조명 방법 Download PDF

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Publication number
KR20130020876A
KR20130020876A KR1020120084396A KR20120084396A KR20130020876A KR 20130020876 A KR20130020876 A KR 20130020876A KR 1020120084396 A KR1020120084396 A KR 1020120084396A KR 20120084396 A KR20120084396 A KR 20120084396A KR 20130020876 A KR20130020876 A KR 20130020876A
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KR
South Korea
Prior art keywords
field
micro
reticle
exposure
programmable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020120084396A
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English (en)
Korean (ko)
Inventor
보리스라프 즐라타노프
앤드류 엠. 하우리루크
Original Assignee
울트라테크 인크.
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Application filed by 울트라테크 인크. filed Critical 울트라테크 인크.
Publication of KR20130020876A publication Critical patent/KR20130020876A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
KR1020120084396A 2011-08-19 2012-08-01 포토리소그래피 시스템용 프로그래머블 조명기와 조명 방법 Ceased KR20130020876A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/199,112 US8823921B2 (en) 2011-08-19 2011-08-19 Programmable illuminator for a photolithography system
US13/199,112 2011-08-19

Publications (1)

Publication Number Publication Date
KR20130020876A true KR20130020876A (ko) 2013-03-04

Family

ID=47712432

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120084396A Ceased KR20130020876A (ko) 2011-08-19 2012-08-01 포토리소그래피 시스템용 프로그래머블 조명기와 조명 방법

Country Status (6)

Country Link
US (1) US8823921B2 (enExample)
JP (1) JP5521012B2 (enExample)
KR (1) KR20130020876A (enExample)
CN (1) CN102955376B (enExample)
SG (2) SG10201503937XA (enExample)
TW (1) TWI497229B (enExample)

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CN106707693B (zh) * 2015-07-29 2019-03-12 上海微电子装备（集团）股份有限公司 一种led光源照明装置
CN106933049B (zh) * 2015-12-30 2020-06-16 上海微电子装备（集团）股份有限公司 一种用于半导体光刻的曝光系统与曝光方法
CN108628103B (zh) * 2017-03-15 2021-05-07 中芯国际集成电路制造(上海)有限公司 光强均匀性自动调节装置及调整方法
TWI627440B (zh) * 2017-05-17 2018-06-21 力晶科技股份有限公司 影像亮度重配模組及影像亮度重配方法
DE102018123328B4 (de) * 2018-09-21 2022-09-08 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines solchen optischen Systems
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US11366307B2 (en) 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
US11960211B2 (en) * 2021-07-09 2024-04-16 Taiwan Semiconductor Manufacturing Co., Ltd. Optical lithography system and method of using the same
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US20260050221A1 (en) * 2024-08-15 2026-02-19 Taiwan Semiconductor Manufacturing Company, Ltd. Lithographic system, and method of using the same to perform lithography
CN118818921A (zh) * 2024-08-30 2024-10-22 新毅东(北京)科技有限公司 光刻机的曝光剂量控制架构

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Also Published As

Publication number Publication date
TWI497229B (zh) 2015-08-21
CN102955376B (zh) 2015-12-16
TW201316132A (zh) 2013-04-16
JP5521012B2 (ja) 2014-06-11
US8823921B2 (en) 2014-09-02
JP2013048237A (ja) 2013-03-07
SG188038A1 (en) 2013-03-28
US20130044301A1 (en) 2013-02-21
CN102955376A (zh) 2013-03-06
SG10201503937XA (en) 2015-06-29

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