JP5521012B2 - フォトリソグラフシステムに用いられるプログラム可能な照明装置 - Google Patents

フォトリソグラフシステムに用いられるプログラム可能な照明装置 Download PDF

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JP5521012B2
JP5521012B2 JP2012179995A JP2012179995A JP5521012B2 JP 5521012 B2 JP5521012 B2 JP 5521012B2 JP 2012179995 A JP2012179995 A JP 2012179995A JP 2012179995 A JP2012179995 A JP 2012179995A JP 5521012 B2 JP5521012 B2 JP 5521012B2
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field
reticle
exposure
programmable
micromirror
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Japanese (ja)
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JP2013048237A5 (enExample
JP2013048237A (ja
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ズラタノフ、ボリスラフ
ハウリーラック、エム、アンドリュー
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ウルトラテック インク
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2012179995A 2011-08-19 2012-08-15 フォトリソグラフシステムに用いられるプログラム可能な照明装置 Active JP5521012B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/199,112 US8823921B2 (en) 2011-08-19 2011-08-19 Programmable illuminator for a photolithography system
US13/199,112 2011-08-19

Publications (3)

Publication Number Publication Date
JP2013048237A JP2013048237A (ja) 2013-03-07
JP2013048237A5 JP2013048237A5 (enExample) 2014-03-06
JP5521012B2 true JP5521012B2 (ja) 2014-06-11

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JP2012179995A Active JP5521012B2 (ja) 2011-08-19 2012-08-15 フォトリソグラフシステムに用いられるプログラム可能な照明装置

Country Status (6)

Country Link
US (1) US8823921B2 (enExample)
JP (1) JP5521012B2 (enExample)
KR (1) KR20130020876A (enExample)
CN (1) CN102955376B (enExample)
SG (2) SG10201503937XA (enExample)
TW (1) TWI497229B (enExample)

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CN106707693B (zh) * 2015-07-29 2019-03-12 上海微电子装备（集团）股份有限公司 一种led光源照明装置
CN106933049B (zh) * 2015-12-30 2020-06-16 上海微电子装备（集团）股份有限公司 一种用于半导体光刻的曝光系统与曝光方法
CN108628103B (zh) * 2017-03-15 2021-05-07 中芯国际集成电路制造(上海)有限公司 光强均匀性自动调节装置及调整方法
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DE102018123328B4 (de) * 2018-09-21 2022-09-08 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum Betreiben eines solchen optischen Systems
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Also Published As

Publication number Publication date
TWI497229B (zh) 2015-08-21
CN102955376B (zh) 2015-12-16
TW201316132A (zh) 2013-04-16
US8823921B2 (en) 2014-09-02
JP2013048237A (ja) 2013-03-07
SG188038A1 (en) 2013-03-28
US20130044301A1 (en) 2013-02-21
CN102955376A (zh) 2013-03-06
SG10201503937XA (en) 2015-06-29
KR20130020876A (ko) 2013-03-04

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