KR20130004917A - 후면 전극형 태양 전지를 제조하는 방법 및 그 장치 - Google Patents

후면 전극형 태양 전지를 제조하는 방법 및 그 장치 Download PDF

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Publication number
KR20130004917A
KR20130004917A KR1020127025955A KR20127025955A KR20130004917A KR 20130004917 A KR20130004917 A KR 20130004917A KR 1020127025955 A KR1020127025955 A KR 1020127025955A KR 20127025955 A KR20127025955 A KR 20127025955A KR 20130004917 A KR20130004917 A KR 20130004917A
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South Korea
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dopant source
type dopant
source layer
type
layer
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Ceased
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KR1020127025955A
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English (en)
Korean (ko)
Inventor
보 리
데이비드 스미스
피터 코신스
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선파워 코포레이션
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Publication of KR20130004917A publication Critical patent/KR20130004917A/ko
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/703Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • H10F77/219Arrangements for electrodes of back-contact photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • H10F10/146Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • H10F71/1221The active layers comprising only Group IV materials comprising polycrystalline silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/707Surface textures, e.g. pyramid structures of the substrates or of layers on substrates, e.g. textured ITO layer on a glass substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Photovoltaic Devices (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
KR1020127025955A 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치 Ceased KR20130004917A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US31065510P 2010-03-04 2010-03-04
US61/310,655 2010-03-04
US12/972,247 US8790957B2 (en) 2010-03-04 2010-12-17 Method of fabricating a back-contact solar cell and device thereof
US12/972,247 2010-12-17
PCT/US2010/062264 WO2011109058A2 (en) 2010-03-04 2010-12-28 Method of fabricating a back-contact solar cell and device thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177017550A Division KR20170076814A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치

Publications (1)

Publication Number Publication Date
KR20130004917A true KR20130004917A (ko) 2013-01-14

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Application Number Title Priority Date Filing Date
KR1020127025955A Ceased KR20130004917A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치
KR1020177017550A Ceased KR20170076814A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치
KR1020187016046A Ceased KR20180066275A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020177017550A Ceased KR20170076814A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치
KR1020187016046A Ceased KR20180066275A (ko) 2010-03-04 2010-12-28 후면 전극형 태양 전지를 제조하는 방법 및 그 장치

Country Status (7)

Country Link
US (2) US8790957B2 (https=)
JP (2) JP5637640B2 (https=)
KR (3) KR20130004917A (https=)
CN (2) CN106057934B (https=)
AU (1) AU2010347232B2 (https=)
DE (1) DE112010005344B4 (https=)
WO (1) WO2011109058A2 (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0652434A (ja) * 1992-07-28 1994-02-25 Murata Mfg Co Ltd カップベンダー吐出ノズル
JP3174907B2 (ja) 1996-12-16 2001-06-11 株式会社ジーデイーエス 電荷信号均一化装置
US8790957B2 (en) 2010-03-04 2014-07-29 Sunpower Corporation Method of fabricating a back-contact solar cell and device thereof
US10011920B2 (en) 2011-02-23 2018-07-03 International Business Machines Corporation Low-temperature selective epitaxial growth of silicon for device integration
US8586397B2 (en) * 2011-09-30 2013-11-19 Sunpower Corporation Method for forming diffusion regions in a silicon substrate
WO2013089473A1 (ko) * 2011-12-16 2013-06-20 주성엔지니어링(주) 태양전지의 제조방법
US20130247967A1 (en) * 2012-03-23 2013-09-26 Scott Harrington Gaseous ozone (o3) treatment for solar cell fabrication
US9059212B2 (en) 2012-10-31 2015-06-16 International Business Machines Corporation Back-end transistors with highly doped low-temperature contacts
US20140130854A1 (en) * 2012-11-12 2014-05-15 Samsung Sdi Co., Ltd. Photoelectric device and the manufacturing method thereof
US8912071B2 (en) 2012-12-06 2014-12-16 International Business Machines Corporation Selective emitter photovoltaic device
US8642378B1 (en) * 2012-12-18 2014-02-04 International Business Machines Corporation Field-effect inter-digitated back contact photovoltaic device
WO2014176409A1 (en) * 2013-04-24 2014-10-30 Natcore Technology, Inc. Solar cells with patterned antireflective surfaces
TW201442261A (zh) * 2013-04-30 2014-11-01 Terasolar Energy Materials Corp 矽晶太陽能電池的製造方法以及矽晶太陽能電池
JP6114170B2 (ja) * 2013-12-05 2017-04-12 信越化学工業株式会社 太陽電池の製造方法
US9401450B2 (en) * 2013-12-09 2016-07-26 Sunpower Corporation Solar cell emitter region fabrication using ion implantation
US9837259B2 (en) 2014-08-29 2017-12-05 Sunpower Corporation Sequential etching treatment for solar cell fabrication
US9246046B1 (en) * 2014-09-26 2016-01-26 Sunpower Corporation Etching processes for solar cell fabrication
US11355657B2 (en) * 2015-03-27 2022-06-07 Sunpower Corporation Metallization of solar cells with differentiated p-type and n-type region architectures
NL2015534B1 (en) * 2015-09-30 2017-05-10 Tempress Ip B V Method of manufacturing a solar cell.
US9607847B1 (en) * 2015-12-18 2017-03-28 Texas Instruments Incorporated Enhanced lateral cavity etch
US10217878B2 (en) 2016-04-01 2019-02-26 Sunpower Corporation Tri-layer semiconductor stacks for patterning features on solar cells
USD822890S1 (en) 2016-09-07 2018-07-10 Felxtronics Ap, Llc Lighting apparatus
FR3058264B1 (fr) * 2016-10-28 2020-10-02 Commissariat Energie Atomique Procede de fabrication de cellules photovoltaiques a contacts arriere.
US11201253B2 (en) 2016-11-15 2021-12-14 Shin-Etsu Chemical Co., Ltd. High photovoltaic-conversion efficiency solar cell, method for manufacturing the same, solar cell module, and photovoltaic power generation system
US10775030B2 (en) 2017-05-05 2020-09-15 Flex Ltd. Light fixture device including rotatable light modules
USD846793S1 (en) 2017-08-09 2019-04-23 Flex Ltd. Lighting module locking mechanism
USD833061S1 (en) 2017-08-09 2018-11-06 Flex Ltd. Lighting module locking endcap
USD877964S1 (en) 2017-08-09 2020-03-10 Flex Ltd. Lighting module
USD872319S1 (en) 2017-08-09 2020-01-07 Flex Ltd. Lighting module LED light board
USD862777S1 (en) 2017-08-09 2019-10-08 Flex Ltd. Lighting module wide distribution lens
USD832494S1 (en) 2017-08-09 2018-10-30 Flex Ltd. Lighting module heatsink
USD832495S1 (en) 2017-08-18 2018-10-30 Flex Ltd. Lighting module locking mechanism
USD862778S1 (en) 2017-08-22 2019-10-08 Flex Ltd Lighting module lens
USD888323S1 (en) 2017-09-07 2020-06-23 Flex Ltd Lighting module wire guard
FR3112427A1 (fr) * 2020-07-13 2022-01-14 Semco Smartech France Formation de contacts passivés pour cellules solaires IBC
EP3982421A1 (en) 2020-10-09 2022-04-13 International Solar Energy Research Center Konstanz E.V. Method for local modification of etching resistance in a silicon layer, use of this method in the production of passivating contact solar cells and thus-created solar cell
CN113921626A (zh) * 2021-09-30 2022-01-11 泰州隆基乐叶光伏科技有限公司 一种背接触电池的制作方法
EP4195299A1 (en) 2021-12-13 2023-06-14 International Solar Energy Research Center Konstanz E.V. Interdigitated back contact solar cell and method for producing an interdigitated back contact solar cell
CN117727810A (zh) * 2023-12-14 2024-03-19 浙江晶科能源有限公司 太阳能电池及其制造方法、光伏组件
CN118073471A (zh) * 2024-02-18 2024-05-24 天合光能股份有限公司 背接触太阳能电池及其制备方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5057439A (en) * 1990-02-12 1991-10-15 Electric Power Research Institute Method of fabricating polysilicon emitters for solar cells
JPH11177046A (ja) 1997-12-09 1999-07-02 Toshiba Corp 半導体装置及びその製造方法並びにキャパシタの製造方法
US5888309A (en) 1997-12-29 1999-03-30 Taiwan Semiconductor Manufacturing Company, Ltd. Lateral etch inhibited multiple for forming a via through a microelectronics layer susceptible to etching within a fluorine containing plasma followed by an oxygen containing plasma
US6287961B1 (en) 1999-01-04 2001-09-11 Taiwan Semiconductor Manufacturing Company Dual damascene patterned conductor layer formation method without etch stop layer
JP2005064014A (ja) * 2003-08-11 2005-03-10 Sharp Corp 薄膜結晶太陽電池およびその製造方法
DE102004050269A1 (de) 2004-10-14 2006-04-20 Institut Für Solarenergieforschung Gmbh Verfahren zur Kontakttrennung elektrisch leitfähiger Schichten auf rückkontaktierten Solarzellen und Solarzelle
US7799371B2 (en) * 2005-11-17 2010-09-21 Palo Alto Research Center Incorporated Extruding/dispensing multiple materials to form high-aspect ratio extruded structures
JP5126795B2 (ja) * 2005-12-21 2013-01-23 サンパワー コーポレイション 裏面電極型太陽電池構造及びその製造プロセス
KR101212198B1 (ko) * 2006-04-06 2012-12-13 삼성에스디아이 주식회사 태양 전지
US7737357B2 (en) * 2006-05-04 2010-06-15 Sunpower Corporation Solar cell having doped semiconductor heterojunction contacts
US20080000522A1 (en) * 2006-06-30 2008-01-03 General Electric Company Photovoltaic device which includes all-back-contact configuration; and related processes
US7928015B2 (en) * 2006-12-12 2011-04-19 Palo Alto Research Center Incorporated Solar cell fabrication using extruded dopant-bearing materials
RU2468475C2 (ru) * 2007-07-26 2012-11-27 Университет Констанц Способ изготовления кремниевого солнечного элемента (варианты) и соответствующий солнечный элемент
JP5236914B2 (ja) 2007-09-19 2013-07-17 シャープ株式会社 太陽電池の製造方法
WO2009052511A2 (en) * 2007-10-18 2009-04-23 Belano Holdings, Ltd. Mono-silicon solar cells
US7851698B2 (en) 2008-06-12 2010-12-14 Sunpower Corporation Trench process and structure for backside contact solar cells with polysilicon doped regions
KR101472018B1 (ko) * 2008-10-13 2014-12-15 엘지전자 주식회사 후면전극 태양전지 및 그 제조방법
US8790957B2 (en) 2010-03-04 2014-07-29 Sunpower Corporation Method of fabricating a back-contact solar cell and device thereof

Also Published As

Publication number Publication date
US8790957B2 (en) 2014-07-29
CN106057934A (zh) 2016-10-26
US9406821B2 (en) 2016-08-02
CN102870225A (zh) 2013-01-09
CN102870225B (zh) 2016-07-06
KR20180066275A (ko) 2018-06-18
DE112010005344B4 (de) 2024-03-21
JP2013521645A (ja) 2013-06-10
KR20170076814A (ko) 2017-07-04
JP5637640B2 (ja) 2014-12-10
AU2010347232A1 (en) 2012-09-27
JP2015062232A (ja) 2015-04-02
DE112010005344T5 (de) 2012-12-13
US20140305501A1 (en) 2014-10-16
AU2010347232B2 (en) 2014-08-07
US20110214719A1 (en) 2011-09-08
WO2011109058A2 (en) 2011-09-09
WO2011109058A3 (en) 2011-11-17
CN106057934B (zh) 2018-08-10

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