KR20120123322A - In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 - Google Patents
In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 Download PDFInfo
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- KR20120123322A KR20120123322A KR1020127018153A KR20127018153A KR20120123322A KR 20120123322 A KR20120123322 A KR 20120123322A KR 1020127018153 A KR1020127018153 A KR 1020127018153A KR 20127018153 A KR20127018153 A KR 20127018153A KR 20120123322 A KR20120123322 A KR 20120123322A
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010006831A JP5437825B2 (ja) | 2010-01-15 | 2010-01-15 | In−Ga−O系酸化物焼結体、ターゲット、酸化物半導体薄膜及びこれらの製造方法 |
| JPJP-P-2010-006831 | 2010-01-15 | ||
| PCT/JP2011/000169 WO2011086940A1 (ja) | 2010-01-15 | 2011-01-14 | In-Ga-O系酸化物焼結体、ターゲット、酸化物半導体薄膜及びこれらの製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177020621A Division KR102001747B1 (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20120123322A true KR20120123322A (ko) | 2012-11-08 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127018153A Ceased KR20120123322A (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
| KR1020177020621A Active KR102001747B1 (ko) | 2010-01-15 | 2011-01-14 | In-Ga-O계 산화물 소결체, 타겟, 산화물 반도체 박막 및 이들의 제조방법 |
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| JP5301021B2 (ja) | 2011-09-06 | 2013-09-25 | 出光興産株式会社 | スパッタリングターゲット |
| JP5966840B2 (ja) | 2012-10-11 | 2016-08-10 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| JP6107085B2 (ja) | 2012-11-22 | 2017-04-05 | 住友金属鉱山株式会社 | 酸化物半導体薄膜および薄膜トランジスタ |
| JP5883990B2 (ja) * | 2013-03-29 | 2016-03-15 | Jx金属株式会社 | Igzoスパッタリングターゲット |
| CN108962724A (zh) * | 2013-07-16 | 2018-12-07 | 住友金属矿山株式会社 | 氧化物半导体薄膜和薄膜晶体管 |
| CN106132901A (zh) * | 2014-03-14 | 2016-11-16 | 住友金属矿山株式会社 | 氧化物烧结体、溅射用靶、以及用其得到的氧化物半导体薄膜 |
| KR20170086473A (ko) * | 2014-11-25 | 2017-07-26 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 산화물 소결체, 스퍼터링용 타겟, 및 그것을 이용하여 얻어지는 산화물 반도체 박막 |
| JP2017154910A (ja) * | 2016-02-29 | 2017-09-07 | 住友金属鉱山株式会社 | 酸化物焼結体及びスパッタリング用ターゲット |
| WO2018143280A1 (ja) | 2017-02-01 | 2018-08-09 | 出光興産株式会社 | 非晶質酸化物半導体膜、酸化物焼結体、及び薄膜トランジスタ |
| WO2020027243A1 (ja) | 2018-08-01 | 2020-02-06 | 出光興産株式会社 | 結晶構造化合物、酸化物焼結体、スパッタリングターゲット、結晶質酸化物薄膜、アモルファス酸化物薄膜、薄膜トランジスタ、及び電子機器 |
| WO2023189834A1 (ja) | 2022-03-29 | 2023-10-05 | 出光興産株式会社 | スパッタリングターゲット、スパッタリングターゲットの製造方法、結晶酸化物薄膜、薄膜トランジスタ、及び電子機器 |
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| JP3947575B2 (ja) | 1994-06-10 | 2007-07-25 | Hoya株式会社 | 導電性酸化物およびそれを用いた電極 |
| JPH09259640A (ja) * | 1996-03-25 | 1997-10-03 | Uchitsugu Minami | 透明導電膜 |
| US20040180217A1 (en) * | 2001-08-02 | 2004-09-16 | Kazuyoshi Inoue | Sputtering target, transparent conductive film, and their manufacturing method |
| US7211825B2 (en) * | 2004-06-14 | 2007-05-01 | Yi-Chi Shih | Indium oxide-based thin film transistors and circuits |
| JP2006165530A (ja) * | 2004-11-10 | 2006-06-22 | Canon Inc | センサ及び非平面撮像装置 |
| JP5058469B2 (ja) | 2005-09-06 | 2012-10-24 | キヤノン株式会社 | スパッタリングターゲットおよび該ターゲットを用いた薄膜の形成方法 |
| WO2007034733A1 (ja) * | 2005-09-20 | 2007-03-29 | Idemitsu Kosan Co., Ltd. | スパッタリングターゲット、透明導電膜及び透明電極 |
| JP4805648B2 (ja) * | 2005-10-19 | 2011-11-02 | 出光興産株式会社 | 半導体薄膜及びその製造方法 |
| WO2007058248A1 (ja) * | 2005-11-18 | 2007-05-24 | Idemitsu Kosan Co., Ltd. | 半導体薄膜、及びその製造方法、並びに薄膜トランジスタ |
| WO2008114588A1 (ja) * | 2007-03-20 | 2008-09-25 | Idemitsu Kosan Co., Ltd. | スパッタリングターゲット、酸化物半導体膜及び半導体デバイス |
| US8440115B2 (en) * | 2007-07-06 | 2013-05-14 | Sumitomo Metal Mining Co., Ltd. | Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the same |
| KR101228160B1 (ko) | 2007-12-27 | 2013-01-30 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | a-IGZO 산화물 박막의 제조 방법 |
| WO2009128424A1 (ja) * | 2008-04-16 | 2009-10-22 | 住友金属鉱山株式会社 | 薄膜トランジスタ型基板、薄膜トランジスタ型液晶表示装置および薄膜トランジスタ型基板の製造方法 |
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2010
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- 2011-01-14 EP EP11732812.0A patent/EP2524905A4/en not_active Withdrawn
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Also Published As
| Publication number | Publication date |
|---|---|
| JP5437825B2 (ja) | 2014-03-12 |
| KR102001747B1 (ko) | 2019-07-18 |
| US20120292617A1 (en) | 2012-11-22 |
| CN102652119B (zh) | 2014-04-02 |
| KR20170087977A (ko) | 2017-07-31 |
| CN102652119A (zh) | 2012-08-29 |
| TW201134781A (en) | 2011-10-16 |
| EP2524905A4 (en) | 2014-05-07 |
| JP2011146571A (ja) | 2011-07-28 |
| TWI496758B (zh) | 2015-08-21 |
| WO2011086940A1 (ja) | 2011-07-21 |
| EP2524905A1 (en) | 2012-11-21 |
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