KR20120073272A - 성막 장치, 성막 헤드 및 성막 방법 - Google Patents

성막 장치, 성막 헤드 및 성막 방법 Download PDF

Info

Publication number
KR20120073272A
KR20120073272A KR1020127008818A KR20127008818A KR20120073272A KR 20120073272 A KR20120073272 A KR 20120073272A KR 1020127008818 A KR1020127008818 A KR 1020127008818A KR 20127008818 A KR20127008818 A KR 20127008818A KR 20120073272 A KR20120073272 A KR 20120073272A
Authority
KR
South Korea
Prior art keywords
forming material
film forming
organic film
inorganic film
vapor
Prior art date
Application number
KR1020127008818A
Other languages
English (en)
Korean (ko)
Inventor
유지 오노
테루유키 하야시
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20120073272A publication Critical patent/KR20120073272A/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020127008818A 2009-10-05 2010-09-30 성막 장치, 성막 헤드 및 성막 방법 KR20120073272A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009231835 2009-10-05
JPJP-P-2009-231835 2009-10-05

Publications (1)

Publication Number Publication Date
KR20120073272A true KR20120073272A (ko) 2012-07-04

Family

ID=43856702

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127008818A KR20120073272A (ko) 2009-10-05 2010-09-30 성막 장치, 성막 헤드 및 성막 방법

Country Status (5)

Country Link
JP (1) JP5484478B2 (fr)
KR (1) KR20120073272A (fr)
CN (1) CN102575347B (fr)
TW (1) TW201130182A (fr)
WO (1) WO2011043244A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
JP3697482B2 (ja) * 2001-08-08 2005-09-21 独立行政法人産業技術総合研究所 絶縁膜生成方法およびその装置
AU2003217530A1 (en) * 2002-04-01 2003-10-13 Ans Inc Apparatus and method for depositing organic matter of vapor phase
JP3809391B2 (ja) * 2002-04-19 2006-08-16 株式会社アルバック 薄膜形成装置
JP2006278616A (ja) * 2005-03-29 2006-10-12 Furukawa Electric Co Ltd:The 薄膜製造装置、薄膜の製造方法、および薄膜積層体
JP5203584B2 (ja) * 2006-08-09 2013-06-05 東京エレクトロン株式会社 成膜装置、成膜システムおよび成膜方法
JP2008184666A (ja) * 2007-01-30 2008-08-14 Phyzchemix Corp 成膜装置
JP4845782B2 (ja) * 2007-03-16 2011-12-28 東京エレクトロン株式会社 成膜原料

Also Published As

Publication number Publication date
WO2011043244A1 (fr) 2011-04-14
CN102575347B (zh) 2014-02-26
JP5484478B2 (ja) 2014-05-07
CN102575347A (zh) 2012-07-11
TW201130182A (en) 2011-09-01
JPWO2011043244A1 (ja) 2013-03-04

Similar Documents

Publication Publication Date Title
KR100703427B1 (ko) 증발원 및 이를 채용한 증착장치
JP4436920B2 (ja) 有機蒸着源及びその加熱源の制御方法
US7914621B2 (en) Vapor deposition source and vapor deposition apparatus having the same
KR101256193B1 (ko) 박막 증착장치 및 이에 사용되는 선형증발원
KR101983213B1 (ko) 유기 재료를 위한 증발 소스
JP2008274322A (ja) 蒸着装置
KR20020090156A (ko) 연속기상증착장치, 기상증착장치 및 기상증착방법
JP2009019243A (ja) 蒸着方法および蒸着装置
JP5306993B2 (ja) 蒸着源ユニット、蒸着装置および蒸着源ユニットの温度調整装置
KR101084333B1 (ko) 유기전계발광 디스플레이 패널 제조용 증발원 및 이를 포함하는 증착장치
KR20160135355A (ko) 유기 재료를 위한 증발 소스
US20140315342A1 (en) Deposition apparatus, deposition method, organic el display, and lighting device
KR20120061394A (ko) 증발원 및 유기물 증착 방법
JP2008088489A (ja) 蒸着装置
KR100666575B1 (ko) 증발원 및 이를 이용한 증착 장치
KR101113128B1 (ko) 성막 장치의 제어 방법, 성막 방법, 성막 장치, 유기 ｅｌ 전자 디바이스 및 그 제어 프로그램을 격납한 기억 매체
KR20120035788A (ko) 유기물 공급장치 및 이를 이용한 유기물 증착장치
KR101094307B1 (ko) 표시 장치를 제조하기 위한 장치 및 방법
KR100666573B1 (ko) 증발원 및 이를 이용한 증착 장치
JP2015067850A (ja) 真空蒸着装置
TW201300557A (zh) 成膜裝置及成膜方法
KR20120073272A (ko) 성막 장치, 성막 헤드 및 성막 방법
TW201346052A (zh) 成膜裝置
JP2003253433A (ja) 薄膜形成装置
JP2004022400A (ja) 有機膜形成装置および有機膜形成方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E601 Decision to refuse application