KR20110105713A - 광 필터 및 분석 기기 - Google Patents

광 필터 및 분석 기기 Download PDF

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Publication number
KR20110105713A
KR20110105713A KR1020110022649A KR20110022649A KR20110105713A KR 20110105713 A KR20110105713 A KR 20110105713A KR 1020110022649 A KR1020110022649 A KR 1020110022649A KR 20110022649 A KR20110022649 A KR 20110022649A KR 20110105713 A KR20110105713 A KR 20110105713A
Authority
KR
South Korea
Prior art keywords
substrate
optical filter
mirror
electrode
upper substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020110022649A
Other languages
English (en)
Korean (ko)
Inventor
스스무 신토
세이지 야마자키
Original Assignee
세이코 엡슨 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세이코 엡슨 가부시키가이샤 filed Critical 세이코 엡슨 가부시키가이샤
Publication of KR20110105713A publication Critical patent/KR20110105713A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G02F1/213—Fabry-Perot type
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Micromachines (AREA)
  • Optical Filters (AREA)
KR1020110022649A 2010-03-19 2011-03-15 광 필터 및 분석 기기 Ceased KR20110105713A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2010-063923 2010-03-19
JP2010063923A JP5434719B2 (ja) 2010-03-19 2010-03-19 光フィルターおよび分析機器

Publications (1)

Publication Number Publication Date
KR20110105713A true KR20110105713A (ko) 2011-09-27

Family

ID=44260891

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110022649A Ceased KR20110105713A (ko) 2010-03-19 2011-03-15 광 필터 및 분석 기기

Country Status (5)

Country Link
US (2) US20110228396A1 (https=)
EP (6) EP2367057B1 (https=)
JP (1) JP5434719B2 (https=)
KR (1) KR20110105713A (https=)
TW (1) TWI528050B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112114426A (zh) * 2019-06-21 2020-12-22 精工爱普生株式会社 波长可变干涉滤波器

Families Citing this family (8)

* Cited by examiner, † Cited by third party
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JP5434719B2 (ja) 2010-03-19 2014-03-05 セイコーエプソン株式会社 光フィルターおよび分析機器
JP5928992B2 (ja) 2010-10-07 2016-06-01 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP6024086B2 (ja) * 2011-09-29 2016-11-09 セイコーエプソン株式会社 波長可変干渉フィルター、光学フィルターデバイス、光学モジュール、電子機器、及び波長可変干渉フィルターの製造方法
JP5910099B2 (ja) * 2012-01-18 2016-04-27 セイコーエプソン株式会社 干渉フィルター、光学モジュールおよび電子機器
JP6089674B2 (ja) * 2012-12-19 2017-03-08 セイコーエプソン株式会社 波長可変干渉フィルター、波長可変干渉フィルターの製造方法、光学フィルターデバイス、光学モジュール、及び電子機器
US20140226988A1 (en) * 2013-02-12 2014-08-14 Avago Technologies General Ip (Singapore) Pte. Ltd Bidirectional optical data communications module having reflective lens
JP6861214B2 (ja) * 2016-08-24 2021-04-21 浜松ホトニクス株式会社 ファブリペロー干渉フィルタ
JP7517139B2 (ja) * 2020-12-24 2024-07-17 セイコーエプソン株式会社 波長可変光学フィルター

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JPH07113708A (ja) * 1993-10-20 1995-05-02 Hitachi Ltd 半導体絶対圧力センサの製造方法
JP3178223B2 (ja) * 1994-03-10 2001-06-18 富士電機株式会社 ダイヤフラムの製造方法
JPH09274860A (ja) * 1996-04-05 1997-10-21 Dainippon Printing Co Ltd プラズマディスプレイパネル
JP2000124117A (ja) * 1998-10-14 2000-04-28 Nikon Corp メンブレンマスク及びその製造方法
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JP5589459B2 (ja) * 2010-03-15 2014-09-17 セイコーエプソン株式会社 光フィルター及び光フィルターモジュール並びに分析機器及び光機器
JP5434719B2 (ja) * 2010-03-19 2014-03-05 セイコーエプソン株式会社 光フィルターおよび分析機器
JP5928992B2 (ja) * 2010-10-07 2016-06-01 セイコーエプソン株式会社 波長可変干渉フィルターの製造方法
JP6089674B2 (ja) * 2012-12-19 2017-03-08 セイコーエプソン株式会社 波長可変干渉フィルター、波長可変干渉フィルターの製造方法、光学フィルターデバイス、光学モジュール、及び電子機器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112114426A (zh) * 2019-06-21 2020-12-22 精工爱普生株式会社 波长可变干涉滤波器
CN112114426B (zh) * 2019-06-21 2022-08-02 精工爱普生株式会社 波长可变干涉滤波器

Also Published As

Publication number Publication date
EP2600193A2 (en) 2013-06-05
EP2600194A3 (en) 2013-12-25
EP2367057A2 (en) 2011-09-21
EP2600194B1 (en) 2015-09-16
EP2985657A1 (en) 2016-02-17
EP2600192B1 (en) 2015-09-30
EP2600191A3 (en) 2013-12-25
EP2600194A2 (en) 2013-06-05
EP2600192A2 (en) 2013-06-05
US20110228396A1 (en) 2011-09-22
JP2011197386A (ja) 2011-10-06
TWI528050B (zh) 2016-04-01
TW201202744A (en) 2012-01-16
JP5434719B2 (ja) 2014-03-05
US20160209638A1 (en) 2016-07-21
US9703092B2 (en) 2017-07-11
CN102193187A (zh) 2011-09-21
EP2600193A3 (en) 2013-12-25
EP2985657B1 (en) 2017-10-18
EP2367057A3 (en) 2012-01-11
EP2367057B1 (en) 2013-05-08
EP2600192A3 (en) 2013-12-25
EP2600191A2 (en) 2013-06-05

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