KR20100135894A - 집적 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너 - Google Patents

집적 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너 Download PDF

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Publication number
KR20100135894A
KR20100135894A KR1020107025094A KR20107025094A KR20100135894A KR 20100135894 A KR20100135894 A KR 20100135894A KR 1020107025094 A KR1020107025094 A KR 1020107025094A KR 20107025094 A KR20107025094 A KR 20107025094A KR 20100135894 A KR20100135894 A KR 20100135894A
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South Korea
Prior art keywords
chamber liner
chamber
liner
quadrant
wall
Prior art date
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Ceased
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KR1020107025094A
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English (en)
Korean (ko)
Inventor
제임스 디. 카두치
앤드류 엔구옌
아지트 바라크리쉬나
마이클 씨. 쿤트니
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20100135894A publication Critical patent/KR20100135894A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0421—Apparatus for fluid treatment for etching for drying etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR1020107025094A 2008-04-07 2009-04-06 집적 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너 Ceased KR20100135894A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/099,007 US7987814B2 (en) 2008-04-07 2008-04-07 Lower liner with integrated flow equalizer and improved conductance
US12/099,007 2008-04-07

Related Child Applications (3)

Application Number Title Priority Date Filing Date
KR1020137015604A Division KR20130071504A (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028342A Division KR101267431B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028345A Division KR101267452B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너

Publications (1)

Publication Number Publication Date
KR20100135894A true KR20100135894A (ko) 2010-12-27

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ID=41132169

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020107025094A Ceased KR20100135894A (ko) 2008-04-07 2009-04-06 집적 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020137015604A Ceased KR20130071504A (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028345A Active KR101267452B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028342A Active KR101267431B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020137015604A Ceased KR20130071504A (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028345A Active KR101267452B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너
KR1020127028342A Active KR101267431B1 (ko) 2008-04-07 2009-04-06 통합형 유동 이퀄라이저와 개선된 콘덕턴스를 가지는 하부 라이너

Country Status (6)

Country Link
US (4) US7987814B2 (https=)
JP (1) JP5875864B2 (https=)
KR (4) KR20100135894A (https=)
CN (2) CN101990789B (https=)
TW (4) TWI435401B (https=)
WO (1) WO2009126576A2 (https=)

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KR20130037195A (ko) * 2011-10-05 2013-04-15 어플라이드 머티어리얼스, 인코포레이티드 대칭적인 플라즈마 프로세스 챔버
KR20160002183A (ko) * 2014-06-30 2016-01-07 세메스 주식회사 라이너 유닛 및 기판 처리 장치
KR20200101287A (ko) * 2019-02-19 2020-08-27 도쿄엘렉트론가부시키가이샤 기판 처리 장치
US10950419B2 (en) 2017-08-22 2021-03-16 Samsung Electronics Co., Ltd. Shrouds and substrate treating systems including the same

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US8282736B2 (en) 2012-10-09
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US20110284166A1 (en) 2011-11-24
US20120145326A1 (en) 2012-06-14
TWI435401B (zh) 2014-04-21
JP2011517116A (ja) 2011-05-26
US8118938B2 (en) 2012-02-21
KR20130071504A (ko) 2013-06-28
KR101267452B1 (ko) 2013-05-31
KR20120123162A (ko) 2012-11-07
TWI387035B (zh) 2013-02-21
TW201308501A (zh) 2013-02-16
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CN103402299A (zh) 2013-11-20
CN101990789B (zh) 2013-07-17
US8440019B2 (en) 2013-05-14
US20090250169A1 (en) 2009-10-08
TWI397145B (zh) 2013-05-21
CN101990789A (zh) 2011-03-23
CN103402299B (zh) 2018-10-09
TWI397144B (zh) 2013-05-21
JP5875864B2 (ja) 2016-03-02
KR101267431B1 (ko) 2013-05-30
WO2009126576A2 (en) 2009-10-15
TW201308502A (zh) 2013-02-16
US20120325406A1 (en) 2012-12-27
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