KR20100119369A - 증착 소스 - Google Patents
증착 소스 Download PDFInfo
- Publication number
- KR20100119369A KR20100119369A KR1020090038451A KR20090038451A KR20100119369A KR 20100119369 A KR20100119369 A KR 20100119369A KR 1020090038451 A KR1020090038451 A KR 1020090038451A KR 20090038451 A KR20090038451 A KR 20090038451A KR 20100119369 A KR20100119369 A KR 20100119369A
- Authority
- KR
- South Korea
- Prior art keywords
- crucible
- heating unit
- heating
- additional
- disposed
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any preceding group
- F27B17/0016—Chamber type furnaces
- F27B17/0041—Chamber type furnaces specially adapted for burning bricks or pottery
- F27B17/0075—Heating devices therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (9)
- 도가니;상기 도가니에 열을 가하도록 상기 도가니를 감싸면서 배치된 제1 가열부; 및상기 제1 가열부와 소정의 간격을 갖도록 이격되고 상기 도가니를 감싸면서 배치된 제2 가열부를 포함하고,상기 제2 가열부는 각각 서로 이격된 복수의 부가열부들을 구비하고, 상기 복수의 부가열부들은 서로 이격된 상태로 상기 도가니를 감싸는 증착 소스.
- 제1 항에 있어서,상기 부가열부들은 각각 상기 도가니의 상이한 영역에 대응하도록 배치되어 상기 도가니의 상이한 영역을 가열하는 증착 소스.
- 제1 항에 있어서,상기 부가열부들중에 적어도 하나의 부가열부는 상기 도가니의 일측면을 감싸고, 상기 부가열부들 중에 적어도 또 다른 하나의 부가열부는 상기 도가니의 상기 일측면과 마주보는 측면을 감싸는 증착 소스.
- 제1 항에 있어서,상기 제1 가열부는 상기 도가니의 상측 외주면을 감싸도록 배치되고, 상기 제2 가열부는 상기 도가니의 하측 외주면을 감싸도록 배치되는 증착 소스.
- 제1 항에 있어서,상기 제1 가열부는 상기 도가니의 하측 외주면을 감싸도록 배치되고, 상기 제2 가열부는 상기 도가니의 상측 외주면을 감싸도록 배치되는 증착 소스.
- 제1 항에 있어서,상기 제1 가열부는 각각 서로 이격된 복수의 부가열부들을 구비하고, 상기 제1 가열부의 복수의 부가열부들은 서로 이격된 상태로 상기 도가니를 감싸는 증착 소스.
- 제1 항에 있어서,상기 제1 가열부 및 상기 제2 가열부는 외부 전원에 의하여 연결되고,상기 제1 가열부, 상기 부가열부들은 각각 별도의 외부 전원에 의하여 연결된 증착 소스.
- 제1 항에 있어서,상기 도가니 측면에 배치되어 상기 도가니에 담긴 증착 재료가 증발되는 양을 감지하는 센서부를 더 포함하는 증착 소스.
- 제8 항에 있어서,상기 센서부는 상기 도가니의 일 측면 및 상기 일 측면과 마주보는 일 측면에 대응하도록 배치된 증착 소스.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090038451A KR101108152B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 소스 |
JP2010057418A JP2010261099A (ja) | 2009-04-30 | 2010-03-15 | 蒸着ソース |
US12/769,879 US8557046B2 (en) | 2009-04-30 | 2010-04-29 | Deposition source |
JP2013043884A JP5674168B2 (ja) | 2009-04-30 | 2013-03-06 | 蒸着ソース |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090038451A KR101108152B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 소스 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100119369A true KR20100119369A (ko) | 2010-11-09 |
KR101108152B1 KR101108152B1 (ko) | 2012-01-31 |
Family
ID=43029447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090038451A KR101108152B1 (ko) | 2009-04-30 | 2009-04-30 | 증착 소스 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8557046B2 (ko) |
JP (2) | JP2010261099A (ko) |
KR (1) | KR101108152B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101233523B1 (ko) * | 2011-01-03 | 2013-02-19 | 주식회사 야스 | 선형 증발원용 히터 |
KR101235580B1 (ko) * | 2010-11-30 | 2013-02-21 | (주)아이블포토닉스 | 열 증착 장치 및 그의 내부 보트 |
KR101520335B1 (ko) * | 2014-10-29 | 2015-05-15 | 에스엔유 프리시젼 주식회사 | 기판 증착 장치 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104136653A (zh) * | 2012-03-07 | 2014-11-05 | 松下电器产业株式会社 | 蒸镀装置 |
KR102084707B1 (ko) * | 2012-12-03 | 2020-04-16 | 삼성디스플레이 주식회사 | 증착원, 이를 포함한 증착 장치 및 증착 방법 |
JP5798171B2 (ja) * | 2013-04-26 | 2015-10-21 | ジージェイエム カンパニー リミテッド | 量産用蒸発装置および方法 |
CN104209538B (zh) * | 2014-09-02 | 2016-09-07 | 北京化工大学 | 一种在水相介质中制备纳米银线的方法 |
US20180037981A1 (en) * | 2016-08-03 | 2018-02-08 | Beijing Apollo Ding Rong Solar Technology Co., Ltd. | Temperature-controlled chalcogen vapor distribution apparatus and method for uniform cigs deposition |
KR20180016693A (ko) * | 2016-08-05 | 2018-02-19 | 삼성디스플레이 주식회사 | 선형 증착원 및 이를 포함하는 증착 장치 |
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JP3096352B2 (ja) * | 1992-04-24 | 2000-10-10 | 日本電子株式会社 | 高周波加熱装置 |
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JP2006225757A (ja) | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
KR100666573B1 (ko) * | 2005-01-31 | 2007-01-09 | 삼성에스디아이 주식회사 | 증발원 및 이를 이용한 증착 장치 |
US20070178225A1 (en) * | 2005-12-14 | 2007-08-02 | Keiji Takanosu | Vapor deposition crucible, thin-film forming apparatus comprising the same, and method of producing display device |
JP2007186787A (ja) * | 2005-12-14 | 2007-07-26 | Hitachi Displays Ltd | 蒸着坩堝並びにこれを備えた薄膜形成装置、及び表示装置の製造方法 |
JP4847365B2 (ja) | 2006-03-22 | 2011-12-28 | キヤノン株式会社 | 蒸着源および蒸着装置 |
JP2007291506A (ja) * | 2006-03-31 | 2007-11-08 | Canon Inc | 成膜方法 |
JP2007332458A (ja) * | 2006-05-18 | 2007-12-27 | Sony Corp | 蒸着装置および蒸着源ならびに表示装置の製造方法 |
KR100805531B1 (ko) | 2006-06-13 | 2008-02-20 | 삼성에스디아이 주식회사 | 증발원 |
JP2008019477A (ja) * | 2006-07-13 | 2008-01-31 | Canon Inc | 真空蒸着装置 |
KR20080013686A (ko) * | 2006-08-08 | 2008-02-13 | 순천향대학교 산학협력단 | 대면적 기판에 박막을 적층하기 위한 장치 |
-
2009
- 2009-04-30 KR KR1020090038451A patent/KR101108152B1/ko active IP Right Grant
-
2010
- 2010-03-15 JP JP2010057418A patent/JP2010261099A/ja active Pending
- 2010-04-29 US US12/769,879 patent/US8557046B2/en active Active
-
2013
- 2013-03-06 JP JP2013043884A patent/JP5674168B2/ja active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101235580B1 (ko) * | 2010-11-30 | 2013-02-21 | (주)아이블포토닉스 | 열 증착 장치 및 그의 내부 보트 |
KR101233523B1 (ko) * | 2011-01-03 | 2013-02-19 | 주식회사 야스 | 선형 증발원용 히터 |
KR101520335B1 (ko) * | 2014-10-29 | 2015-05-15 | 에스엔유 프리시젼 주식회사 | 기판 증착 장치 |
Also Published As
Publication number | Publication date |
---|---|
JP2010261099A (ja) | 2010-11-18 |
US20100275841A1 (en) | 2010-11-04 |
JP2013117073A (ja) | 2013-06-13 |
US8557046B2 (en) | 2013-10-15 |
JP5674168B2 (ja) | 2015-02-25 |
KR101108152B1 (ko) | 2012-01-31 |
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