KR20100065305A - 멀티 엘리먼트 패키지 내에서의 인터커넥트 - Google Patents

멀티 엘리먼트 패키지 내에서의 인터커넥트 Download PDF

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Publication number
KR20100065305A
KR20100065305A KR1020107004435A KR20107004435A KR20100065305A KR 20100065305 A KR20100065305 A KR 20100065305A KR 1020107004435 A KR1020107004435 A KR 1020107004435A KR 20107004435 A KR20107004435 A KR 20107004435A KR 20100065305 A KR20100065305 A KR 20100065305A
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South Korea
Prior art keywords
connector block
semiconductor device
forming
polymer layer
layer
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KR1020107004435A
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English (en)
Korean (ko)
Inventor
진방 탕
대럴 알. 프리어
윌리암 에이치. 라이틀
Original Assignee
프리스케일 세미컨덕터, 인크.
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Publication of KR20100065305A publication Critical patent/KR20100065305A/ko
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • H10W70/614—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together the multiple chips being integrally enclosed
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/08—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs
    • H10W70/09—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs extending onto an encapsulation that laterally surrounds the chip or wafer, e.g. fan-out wafer level package [FOWLP] RDLs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/611—Insulating or insulated package substrates; Interposers; Redistribution layers for connecting multiple chips together
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63—Vias, e.g. via plugs
    • H10W70/635—Through-vias
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/0198—Manufacture or treatment batch processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/401—Package configurations characterised by multiple insulating or insulated package substrates, interposers or RDLs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/743—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used as a support during manufacture of interconnect decals or build up layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H10W44/203—Electrical connections
    • H10W44/209—Vertical interconnections, e.g. vias
    • H10W44/212—Coaxial feed-throughs in substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/20—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF]
    • H10W44/241—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements
    • H10W44/248—Electrical arrangements for controlling or matching impedance at high-frequency [HF] or radio frequency [RF] for passive devices or passive elements for antennas
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/501—Inductive arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H10W74/019—Manufacture or treatment using temporary auxiliary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/129—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed forming a chip-scale package [CSP]

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
  • Details Of Aerials (AREA)
KR1020107004435A 2007-08-29 2008-07-09 멀티 엘리먼트 패키지 내에서의 인터커넥트 Withdrawn KR20100065305A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/846,874 2007-08-29
US11/846,874 US7838420B2 (en) 2007-08-29 2007-08-29 Method for forming a packaged semiconductor device

Publications (1)

Publication Number Publication Date
KR20100065305A true KR20100065305A (ko) 2010-06-16

Family

ID=40406108

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107004435A Withdrawn KR20100065305A (ko) 2007-08-29 2008-07-09 멀티 엘리먼트 패키지 내에서의 인터커넥트

Country Status (7)

Country Link
US (1) US7838420B2 (enExample)
EP (1) EP2195840A4 (enExample)
JP (1) JP5397962B2 (enExample)
KR (1) KR20100065305A (enExample)
CN (1) CN101790788A (enExample)
TW (1) TWI451551B (enExample)
WO (1) WO2009032398A1 (enExample)

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JP2010245107A (ja) * 2009-04-01 2010-10-28 Shinko Electric Ind Co Ltd 半導体装置及びその製造方法
US8407890B2 (en) 2010-01-25 2013-04-02 Freescale Semiconductor Inc. Method of manufacting an electronic device module with integrated antenna structure
US9142502B2 (en) 2011-08-31 2015-09-22 Zhiwei Gong Semiconductor device packaging having pre-encapsulation through via formation using drop-in signal conduits
US8916421B2 (en) 2011-08-31 2014-12-23 Freescale Semiconductor, Inc. Semiconductor device packaging having pre-encapsulation through via formation using lead frames with attached signal conduits
US8597983B2 (en) 2011-11-18 2013-12-03 Freescale Semiconductor, Inc. Semiconductor device packaging having substrate with pre-encapsulation through via formation
JP5834907B2 (ja) * 2011-12-28 2015-12-24 富士通株式会社 半導体装置、半導体装置の製造方法及び電子装置
US9842798B2 (en) 2012-03-23 2017-12-12 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming a PoP device with embedded vertical interconnect units
US9837303B2 (en) 2012-03-23 2017-12-05 STATS ChipPAC Pte. Ltd. Semiconductor method and device of forming a fan-out device with PWB vertical interconnect units
US8810024B2 (en) * 2012-03-23 2014-08-19 Stats Chippac Ltd. Semiconductor method and device of forming a fan-out PoP device with PWB vertical interconnect units
US10049964B2 (en) 2012-03-23 2018-08-14 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming a fan-out PoP device with PWB vertical interconnect units
CN103311141B (zh) * 2013-07-05 2016-01-20 北京理工大学 一种同轴垂直互连导电体的制作方法
US8822268B1 (en) 2013-07-17 2014-09-02 Freescale Semiconductor, Inc. Redistributed chip packages containing multiple components and methods for the fabrication thereof
US9362234B2 (en) 2014-01-07 2016-06-07 Freescale Semiconductor, Inc. Shielded device packages having antennas and related fabrication methods
US10354958B2 (en) 2014-10-01 2019-07-16 Nxp Usa, Inc. Through package circuit in fan-out wafer level package
US9666930B2 (en) 2014-10-23 2017-05-30 Nxp Usa, Inc. Interface between a semiconductor die and a waveguide, where the interface is covered by a molding compound
TWI652775B (zh) 2016-01-11 2019-03-01 矽品精密工業股份有限公司 電子封裝件
US10236260B2 (en) 2016-06-30 2019-03-19 Nxp Usa, Inc. Shielded package with integrated antenna
WO2019039335A1 (ja) * 2017-08-21 2019-02-28 株式会社村田製作所 電子部品の製造方法及び電子部品
US11557565B2 (en) 2020-10-06 2023-01-17 Nxp Usa, Inc. Semiconductor device assembly and method therefor
US11502054B2 (en) 2020-11-11 2022-11-15 Nxp Usa, Inc. Semiconductor device assembly and method therefor
CN114243287B (zh) * 2021-12-10 2025-08-29 上海微波技术研究所（中国电子科技集团公司第五十研究所） 毫米波相控阵天线阵列集成转换接头
US20240088068A1 (en) * 2022-09-08 2024-03-14 Nxp Usa, Inc. Semiconductor device with through package via and method therefor
US20250218977A1 (en) * 2023-12-29 2025-07-03 International Business Machines Corporation Coaxial through insulator via between chiplets

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Also Published As

Publication number Publication date
EP2195840A1 (en) 2010-06-16
US7838420B2 (en) 2010-11-23
WO2009032398A1 (en) 2009-03-12
JP5397962B2 (ja) 2014-01-22
CN101790788A (zh) 2010-07-28
EP2195840A4 (en) 2011-01-19
TWI451551B (zh) 2014-09-01
US20090057849A1 (en) 2009-03-05
JP2010538463A (ja) 2010-12-09
TW200913206A (en) 2009-03-16

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