KR20090085552A - 광학 소자 및 광학 소자의 제조방법 - Google Patents
광학 소자 및 광학 소자의 제조방법 Download PDFInfo
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- KR20090085552A KR20090085552A KR1020090056347A KR20090056347A KR20090085552A KR 20090085552 A KR20090085552 A KR 20090085552A KR 1020090056347 A KR1020090056347 A KR 1020090056347A KR 20090056347 A KR20090056347 A KR 20090056347A KR 20090085552 A KR20090085552 A KR 20090085552A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4261—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element with major polarization dependent properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polarising Elements (AREA)
- Micromachines (AREA)
Abstract
Description
Claims (6)
- 기판과,상기 기판 위에 형성된 제1 층 및 이 제1 층 위에 적층된 제2 층을 구비하고,상기 제1 층 및 상기 제2 층의 각각은, 이들 층의 적층 방향과 수직 방향으로 가시광의 파장 이하인 10nm이상 200nm이하의 피치의 공간 및 구조체의 반복으로 이루어지는 라인 앤드 스페이스의 반복 구조를 갖고,상기 제2 층의 구조체는, 상기 제1 층의 구조체와 직교하는 방향으로 상기 제1 층의 공간을 벌려서 형성되고, 상기 제1 층의 구조체의 상부가, 상기 제2 층의 구조체의 하부에 맞물리는 것을 특징으로 하는 광학 소자.
- 제 1 항에 있어서,상기 기판과 상기 제1 층 사이에 복수의 층을 갖고, 상기 제1 층이 상기 기판으로부터 카운트해 i번째 층으로 구성되고, 상기 제2 층이 (i+1)번째 층으로 구성되어 있는 것을 특징으로 하는 광학 소자.
- 제 1 항에 있어서,3nm이상 20nm이하의 범위에서 상기 제1 층의 구조체의 상부가, 상기 제2 층 의 구조체의 하부에 맞물리는 것을 특징으로 하는 광학 소자.
- 제 1 항에 있어서,상기 제1 층 및 제2 층의 구조체가 동일 재료로 구성되어 있는 것을 특징으로 하는 광학 소자.
- 제 1 항에 있어서,상기 제1 및 제2 층의 구조체가 유전체로 구성되어 있는 것을 특징으로 하는 광학 소자.
- 기판 위에 적어도 제1 층 및 제2 층을 갖는 광학 소자의 제조 방법으로서,제1 층을 형성하는 공정과,상기 제1 층에, 가시광의 파장 이하의 10nm이상 200nm이하의 피치의 공간 및 구조체의 반복으로 이루어지는 라인 앤드 스페이스의 반복 구조를 형성하는 공정과,상기 공간을 희생층으로 매립하는 공정과,상기 희생층을 에칭해서, 상기 구조체의 상부의 측면을, 상기 구조체의 상면으로부터 3nm이상 20nm이하의 범위에서 노출시키는 공정과,상기 반복 구조 및 상기 희생층 위에, 상기 제2 층을 형성하는 공정과,상기 제2 층에, 상기 제1 층의 라인 앤드 스페이스의 반복 구조와 직교하는 방향으로, 가시광의 파장 이하인 10nm이상 200nm이하의 피치의 공간 및 구조체의 반복으로 이루어지는 라인 앤드 스페이스 반복 구조를 형성하는 공정과,상기 희생층을 제거하는 공정을 포함한 것을 특징으로 하는 광학 소자의 제조 방법.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2006-052013 | 2006-02-28 | ||
JP2006052013 | 2006-02-28 | ||
JPJP-P-2007-032708 | 2007-02-13 | ||
JP2007032708A JP5100146B2 (ja) | 2006-02-28 | 2007-02-13 | 光学素子及び光学素子の製造方法 |
Related Parent Applications (1)
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KR1020070018873A Division KR101057414B1 (ko) | 2006-02-28 | 2007-02-26 | 광학 소자 및 광학 소자의 제조방법 |
Publications (2)
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KR20090085552A true KR20090085552A (ko) | 2009-08-07 |
KR100968160B1 KR100968160B1 (ko) | 2010-07-06 |
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KR1020070018873A KR101057414B1 (ko) | 2006-02-28 | 2007-02-26 | 광학 소자 및 광학 소자의 제조방법 |
KR1020090056347A KR100968160B1 (ko) | 2006-02-28 | 2009-06-24 | 광학 소자 및 광학 소자의 제조방법 |
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KR1020070018873A KR101057414B1 (ko) | 2006-02-28 | 2007-02-26 | 광학 소자 및 광학 소자의 제조방법 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7929209B2 (ko) |
EP (1) | EP1826596A1 (ko) |
JP (1) | JP5100146B2 (ko) |
KR (2) | KR101057414B1 (ko) |
Families Citing this family (17)
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JP5349793B2 (ja) * | 2007-12-10 | 2013-11-20 | キヤノン株式会社 | 光学素子およびその製造方法 |
JP5943960B2 (ja) * | 2008-05-26 | 2016-07-05 | キヤノン株式会社 | 偏光ビームスプリッタ、位相板およびバンドパスフィルター |
JP2010009029A (ja) * | 2008-05-26 | 2010-01-14 | Canon Inc | 光学素子の製造方法及び光学素子 |
JP4494497B2 (ja) * | 2008-06-09 | 2010-06-30 | キヤノン株式会社 | 三次元構造体の製造方法 |
US8941920B2 (en) * | 2008-07-28 | 2015-01-27 | Canon Kabushiki Kaisha | Method of producing optical element and optical element |
JP5590828B2 (ja) * | 2008-07-28 | 2014-09-17 | キヤノン株式会社 | 光学素子の製造方法および光学素子 |
JP5574602B2 (ja) * | 2008-12-26 | 2014-08-20 | 株式会社フォトニックラティス | 多値波長板 |
JP2011040564A (ja) | 2009-08-11 | 2011-02-24 | Toshiba Corp | 半導体素子の製造方法および製造装置 |
JP5471467B2 (ja) * | 2010-01-13 | 2014-04-16 | 株式会社リコー | 光学素子、画像生成装置及び画像表示装置 |
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JP6063365B2 (ja) * | 2013-10-07 | 2017-01-18 | リコーインダストリアルソリューションズ株式会社 | 微細パターンの形成方法及び光学素子の形成方法 |
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EP3980821A4 (en) * | 2019-06-05 | 2023-10-18 | Applied Materials, Inc. | OPENINGS FOR FLAT OPTICAL DEVICES |
CN115461654A (zh) * | 2020-04-28 | 2022-12-09 | 3M创新有限公司 | 包括纳米结构化表面和封闭空隙的制品 |
WO2022020098A1 (en) | 2020-07-20 | 2022-01-27 | Applied Materials, Inc. | Integrated conductive apertures for optical devices |
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-
2007
- 2007-02-13 JP JP2007032708A patent/JP5100146B2/ja not_active Expired - Fee Related
- 2007-02-21 US US11/677,235 patent/US7929209B2/en not_active Expired - Fee Related
- 2007-02-26 EP EP07103029A patent/EP1826596A1/en not_active Withdrawn
- 2007-02-26 KR KR1020070018873A patent/KR101057414B1/ko active IP Right Grant
-
2009
- 2009-06-24 KR KR1020090056347A patent/KR100968160B1/ko active IP Right Grant
-
2011
- 2011-01-26 US US13/013,882 patent/US8715516B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20110114598A1 (en) | 2011-05-19 |
KR100968160B1 (ko) | 2010-07-06 |
KR20070089606A (ko) | 2007-08-31 |
EP1826596A1 (en) | 2007-08-29 |
KR101057414B1 (ko) | 2011-08-17 |
JP2007264604A (ja) | 2007-10-11 |
JP5100146B2 (ja) | 2012-12-19 |
US20070201135A1 (en) | 2007-08-30 |
US7929209B2 (en) | 2011-04-19 |
US8715516B2 (en) | 2014-05-06 |
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