KR20090018998A - 여러자리 베타-케토이미네이트의 금속 착물 - Google Patents
여러자리 베타-케토이미네이트의 금속 착물 Download PDFInfo
- Publication number
- KR20090018998A KR20090018998A KR1020090007099A KR20090007099A KR20090018998A KR 20090018998 A KR20090018998 A KR 20090018998A KR 1020090007099 A KR1020090007099 A KR 1020090007099A KR 20090007099 A KR20090007099 A KR 20090007099A KR 20090018998 A KR20090018998 A KR 20090018998A
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- KR
- South Korea
- Prior art keywords
- metal
- methyl
- group
- carbon atoms
- hydrogen
- Prior art date
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 102
- 239000002184 metal Substances 0.000 title claims abstract description 98
- -1 metal-nitride Inorganic materials 0.000 claims abstract description 71
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 39
- 239000003446 ligand Substances 0.000 claims abstract description 35
- 239000001257 hydrogen Substances 0.000 claims abstract description 27
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 27
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 25
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 11
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 3
- 125000005462 imide group Chemical group 0.000 claims abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 32
- 125000004432 carbon atom Chemical group C* 0.000 claims description 30
- 229910052712 strontium Inorganic materials 0.000 claims description 27
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 26
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 26
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 26
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 239000002243 precursor Substances 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 17
- 229910017052 cobalt Inorganic materials 0.000 claims description 16
- 239000010941 cobalt Substances 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical group CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 13
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 13
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 13
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 13
- 229910052788 barium Inorganic materials 0.000 claims description 12
- 150000002739 metals Chemical class 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 229910052726 zirconium Inorganic materials 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 238000000231 atomic layer deposition Methods 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 9
- 239000010408 film Substances 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 125000002723 alicyclic group Chemical group 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 6
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 5
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 5
- 229910052791 calcium Inorganic materials 0.000 claims description 5
- 239000011575 calcium Substances 0.000 claims description 5
- 150000003857 carboxamides Chemical class 0.000 claims description 5
- 150000002170 ethers Chemical class 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 150000004292 cyclic ethers Chemical class 0.000 claims description 4
- 150000001983 dialkylethers Chemical class 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 claims description 4
- 150000002895 organic esters Chemical class 0.000 claims description 4
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 2
- 229910021645 metal ion Inorganic materials 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 7
- 238000007740 vapor deposition Methods 0.000 claims 5
- 230000008021 deposition Effects 0.000 claims 4
- 125000002947 alkylene group Chemical group 0.000 claims 3
- 239000003795 chemical substances by application Substances 0.000 claims 3
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 claims 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 claims 1
- 235000011941 Tilia x europaea Nutrition 0.000 claims 1
- 239000004571 lime Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 125000002733 (C1-C6) fluoroalkyl group Chemical group 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 4
- 239000010703 silicon Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 125000000041 C6-C10 aryl group Chemical group 0.000 abstract 4
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 3
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 150000001455 metallic ions Chemical class 0.000 abstract 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 45
- 239000013078 crystal Substances 0.000 description 44
- 230000015572 biosynthetic process Effects 0.000 description 39
- 238000003786 synthesis reaction Methods 0.000 description 39
- 239000000243 solution Substances 0.000 description 28
- 239000007787 solid Substances 0.000 description 19
- 239000007983 Tris buffer Substances 0.000 description 18
- VSBJOMJQJLJPMB-UHFFFAOYSA-N 5-[2-(dimethylamino)ethylimino]-2,2-dimethylhexan-3-one Chemical compound CN(C)CCN=C(C)CC(=O)C(C)(C)C VSBJOMJQJLJPMB-UHFFFAOYSA-N 0.000 description 12
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 12
- 238000002441 X-ray diffraction Methods 0.000 description 11
- 238000000921 elemental analysis Methods 0.000 description 11
- 239000007858 starting material Substances 0.000 description 11
- 239000003039 volatile agent Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 8
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- YPHLYXXEXBWEFV-UHFFFAOYSA-N 4-[2-(dimethylamino)ethylimino]pentan-2-one Chemical compound CN(C)CCN=C(C)CC(C)=O YPHLYXXEXBWEFV-UHFFFAOYSA-N 0.000 description 5
- OMPMLFBRLBCHGW-UHFFFAOYSA-N 5-[2-(diethylamino)ethylimino]-2,2-dimethylhexan-3-one Chemical compound CCN(CC)CCN=C(C)CC(=O)C(C)(C)C OMPMLFBRLBCHGW-UHFFFAOYSA-N 0.000 description 5
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910000104 sodium hydride Inorganic materials 0.000 description 5
- 238000000605 extraction Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000001757 thermogravimetry curve Methods 0.000 description 4
- 238000005292 vacuum distillation Methods 0.000 description 4
- GBNDTYKAOXLLID-UHFFFAOYSA-N zirconium(4+) ion Chemical compound [Zr+4] GBNDTYKAOXLLID-UHFFFAOYSA-N 0.000 description 4
- LCLCVVVHIPPHCG-UHFFFAOYSA-N 5,5-dimethylhexane-2,4-dione Chemical compound CC(=O)CC(=O)C(C)(C)C LCLCVVVHIPPHCG-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- AHFNSWYSDBXHKD-UHFFFAOYSA-N 5-[3-(dimethylamino)propylimino]-2,2-dimethylhexan-3-one Chemical compound CN(C)CCCN=C(C)CC(=O)C(C)(C)C AHFNSWYSDBXHKD-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 150000002829 nitrogen Chemical group 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 1
- ULPMRIXXHGUZFA-UHFFFAOYSA-N (R)-4-Methyl-3-hexanone Natural products CCC(C)C(=O)CC ULPMRIXXHGUZFA-UHFFFAOYSA-N 0.000 description 1
- MIOZXHSALLZYTG-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]ethanamine Chemical compound CN(C)CCOCCN MIOZXHSALLZYTG-UHFFFAOYSA-N 0.000 description 1
- PFCHFHIRKBAQGU-UHFFFAOYSA-N 3-hexanone Chemical compound CCCC(=O)CC PFCHFHIRKBAQGU-UHFFFAOYSA-N 0.000 description 1
- OBZQBFKWLCVSAE-UHFFFAOYSA-N 4-[2-(dimethylamino)ethylimino]hexan-2-one Chemical compound CC(=O)CC(CC)=NCCN(C)C OBZQBFKWLCVSAE-UHFFFAOYSA-N 0.000 description 1
- VHHFBKSDEKJPCZ-UHFFFAOYSA-N 5-[2-[2-(dimethylamino)ethoxy]ethylimino]-2,2-dimethylhexan-3-one Chemical compound CN(C)CCOCCN=C(C)CC(=O)C(C)(C)C VHHFBKSDEKJPCZ-UHFFFAOYSA-N 0.000 description 1
- LWCNXQIPAYIHBR-UHFFFAOYSA-N 5-[3-(diethylamino)propylimino]-2,2-dimethylhexan-3-one Chemical compound CCN(CC)CCCN=C(C)CC(=O)C(C)(C)C LWCNXQIPAYIHBR-UHFFFAOYSA-N 0.000 description 1
- GSPWFAGUHCILBF-UHFFFAOYSA-N CN(C)CCCN=C(CC(C)=O)C Chemical compound CN(C)CCCN=C(CC(C)=O)C GSPWFAGUHCILBF-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- KEZNKMFFCFLTFL-UHFFFAOYSA-N N1C(CCC1)=O.[Sr] Chemical compound N1C(CCC1)=O.[Sr] KEZNKMFFCFLTFL-UHFFFAOYSA-N 0.000 description 1
- 235000019502 Orange oil Nutrition 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001552 barium Chemical class 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000002716 delivery method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000008863 intramolecular interaction Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010502 orange oil Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
Description
Claims (31)
- 이미드기에 질소 또는 산소 작용기를 가지는 하나 이상의 여러자리(polydentate) β-케토이미네이토 리간드를 포함하는 금속 함유 착물로서, 하기 화학식(A)로 이루어진 군으로부터 선택된 화학식으로 표현되는 금속 함유 착물:[상기 식에서, M은 제2족 내지 제5족 및 제8족 내지 제10족 금속으로부터 선택되는 금속 이온이 금속이고,R1은 1 내지 6개의 탄소 원자를 갖는 알킬, 1 내지 6개의 탄소 원자를 갖는 플루오로알킬, 3 내지 6개의 탄소 원자를 갖는 지환족, 및 6 내지 10개의 탄소 원자를 갖는 아릴로 이루어진 군으로부터 선택되고,R2는 수소, 1 내지 6개의 탄소 원자를 갖는 알킬, 1 내지 6개의 탄소 원자를 갖는 알콕시, 3 내지 6개의 탄소 원자를 갖는 지환족 및 6 내지 10개의 탄소 원자를 갖는 아릴로 이루어진 군으로부터 선택되고,R3는 1 내지 6개의 탄소 원자를 갖는 알킬, 1 내지 6개의 탄소 원자를 갖는 플루오로알킬, 3 내지 6개의 탄소 원자를 갖는 지환족, 및 6 내지 10개의 탄소 원자를 갖는 아릴로 이루어진 군으로부터 선택되고,R4는 2 내지 4개의 탄소 원자를 갖는 알킬렌 브릿지이고,R5-6는 개별적으로 1 내지 6개의 탄소 원자를 갖는 직쇄 알킬, 1 내지 6개의 탄소 원자를 갖는 플루오로알킬, 3 내지 6개의 탄소 원자를 갖는 지환족, 6 내지 10개의 탄소 원자를 갖는 아릴 및 산소 또는 질소 원자를 함유하는 헤테로시클릭으로 이루어진 군으로부터 선택되고,n은 금속 M의 원자가와 동일한 정수이다].
- 제 1항에 있어서, 화학식(A)에서 M이 칼슘, 스트론튬, 바륨, 스칸듐, 이트륨, 란타늄, 티타늄, 지르코늄, 바나듐, 코발트, 철, 니켈, 팔라듐, 백금, 이리듐, 레늄, 및 오스뮴으로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 2항에 있어서, M이 Ca, Sr 및 Ba로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 3항에 있어서, R1이 t-부틸 및 t-펜틸로 이루어진 군으로부터 선택되고, R2 및 R3가 개별적으로 수소, 메틸 및 에틸로 이루어진 군으로부터 선택되고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 개별적으로 메틸 및 에틸로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 3항에 있어서, M이 스트론튬이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 3항에 있어서, M이 스트론튬이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 에틸인 금속 함유 착물.
- 제 2항에 있어서, M이 Fe, Co, 및 Ni로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 7항에 있어서, R1이 C1-6 알킬로 이루어진 군으로부터 선택되고, R2 및 R3가 개별적으로 수소, 메틸 및 에틸로 이루어진 군으로부터 선택되고, R4가 C2-3 알킬렌 브릿지이고, R5 및 R6가 개별적으로 메틸 및 에틸로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 7항에 있어서, M이 코발트이고, R1이 메틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 코발트이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 코발트이고, R1이 메틸이고, R2가 수소이며, R3가 메틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 코발트이고, R1이 t-부틸이고, R2가 수소이며, R3가 메 틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 니켈이고, R1이 메틸이고, R2 및 R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 니켈이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 니켈이고, R1이 메틸이고, R2 및 R3가 메틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 7항에 있어서, M이 니켈이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 2항에 있어서, M이 Y 및 La으로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 17항에 있어서, R1이 C1-5 알킬로 이루어진 군으로부터 선택되고, R2 및 R3가 개별적으로 수소, 메틸 및 에틸로 이루어진 군으로부터 선택되고, R4가 C2-3 알킬렌 브릿지이고, R5 및 R6가 개별적으로 메틸 및 에틸로 이루어진 군으로부터 선택되는 금속 함유 착물.
- 제 17항에 있어서, M이 Y이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 17항에 있어서, M이 Y이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 17항에 있어서, M이 La이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C2 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 17항에 있어서, M이 La이고, R1이 t-부틸이고, R2가 수소이며, R3가 메틸이고, R4가 C3 알킬렌 브릿지이고, R5 및 R6가 메틸인 금속 함유 착물.
- 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물을 용매에 용해시킨 금속 함유 착물 용액로서, 용매가, 1 내지 20개의 에톡시 -(C2H4O)- 반복 단위를 갖는 글라임(glyme) 용매; C2-C12 알칸올, C1-C6 알킬 부분을 포함하는 디알킬 에테르, 및 C4-C8 시클릭 에테르로 이루어진 군으로부터 선택된 유기 에테르; C12-C60 크라운 O4-O20 에테르(여기에서, 앞에 있는 Ci 범위는 에테르 화합물내 탄소 원자의 수, i이고, 뒤에 있는 Oi의 범위는 에테르 화합물내 산소 원자의 수, i이다); C6-C12 지방족 탄화수소; C6-C18 방향족 탄화수소; 유기 에스테르; 유기 아민, 폴리아민 및 유기 아미드로 이루어진 군으로부터 선택된 금속 함유 착물 용액.
- 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물을 용매에 용해시킨 금속 함유 착물 용액로서, 용매가, N-메틸-2-피롤리디논, N-에틸-2-피롤리디논, 및 N-시클로헥실-2-피롤리디논으로 이루어진 군으로부터 선택된 유기 아미드인 금속 함유 착물 용액.
- 기재 상에 균일한 금속 산화물 박막을 형성시키기 위한 증기 증착 방법으로서,전구체 공급원 및 산소 함유제를 증착 챔버에 도입하여 기재 상에 증착된 금속 산화물 막을 형성시키고,전구체 공급원으로서 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물을 사용하는 것을 포함하는 방법.
- 제 25항에 있어서, 증기 증착 방법이 화학 증기 증착 및 원자층 증착으로 이루어진 군으로부터 선택되는 방법.
- 제 25항에 있어서, 산소 함유제가 물, O2, H2O2, 오존 및 이들의 혼합물로 이루어진 군으로부터 선택되는 방법.
- 기재 상에 균일한 금속 박막을 형성시키기 위한 증기 증착 방법으로서,전구체 공급원 및 환원제를 증착 챔버에 도입하여 기재 상에 증착된 금속 막을 형성시키며,전구체 공급원으로서 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물을 사용하는 것을 포함하는 방법.
- 제 28항에 있어서, 환원제가 수소, 히드라진, 모노알킬히드라진, 디알킬히드라진, 암모니아 및 이들의 혼합물로 이루어진 군으로부터 선택되는 방법.
- 기재 상에 균일한 금속 산화물 박막을 형성시키기 위한 증기 증착 방법으로서,전구체 공급원 및 산소 함유제의 용액을 증착 챔버에 도입하여 기재 상에 증착된 금속 산화물 막을 형성시키며,1 내지 20개의 에톡시 -(C2H4O)- 반복 단위를 갖는 글라임 용매; C2-C12 알칸올, C1-C6 알킬 부분을 포함하는 디알킬 에테르, 및 C4-C8 시클릭 에테르로 이루어진 군으로부터 선택된 유기 에테르; C12-C60 크라운 O4-O20 에테르(여기에서, 앞에 있는 Ci 범위는 에테르 화합물내 탄소 원자의 수, i이고, 뒤에 있는 Oi의 범위는 에테르 화합물내 산소 원자의 수, i이다); C6-C12 지방족 탄화수소; C6-C18 방향족 탄화수소; 유기 에스테르; 유기 아민, 폴리아민 및 유기 아미드로 이루어진 군으로부터 선택된 용매 중에 용해된 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물로 이루어진 용액을 사용하는 것을 포함하는 방법.
- 기재 상에 균일한 금속 박막을 형성시키기 위한 증기 증착 방법으로서,전구체 공급원 및 환원제의 용액을 증착 챔버에 도입하여 기재 상에 증착된 금속 막을 형성시키며,1 내지 20개의 에톡시 -(C2H4O)- 반복 단위를 갖는 글라임 용매; C2-C12 알칸올, C1-C6 알킬 부분을 포함하는 디알킬 에테르, 및 C4-C8 시클릭 에테르로 이루어진 군으로부터 선택된 유기 에테르; C12-C60 크라운 O4-O20 에테르(여기에서, 앞에 있는 Ci 범위는 에테르 화합물내 탄소 원자의 수, i이고, 뒤에 있는 Oi의 범위는 에테르 화합물내 산소 원자의 수, i이다); C6-C12 지방족 탄화수소; C6-C18 방향족 탄화수소; 유기 에스테르; 유기 아민, 폴리아민 및 유기 아미드로 이루어진 군으로부터 선택된 용매 중에 용해된 제 1항 내지 제 22항 중 어느 한 항에 따른 금속 함유 착물로 이루어진 용액을 사용하는 것을 포함하는 방법.
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KR100892018B1 (ko) | 2009-04-07 |
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CN101074203B (zh) | 2010-12-29 |
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US7947814B2 (en) | 2011-05-24 |
JP4680953B2 (ja) | 2011-05-11 |
KR100950393B1 (ko) | 2010-03-29 |
US20070248754A1 (en) | 2007-10-25 |
EP1849789A1 (en) | 2007-10-31 |
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