KR20090004506A - 스테이지 장치, 노광장치 및 디바이스 제조방법 - Google Patents

스테이지 장치, 노광장치 및 디바이스 제조방법 Download PDF

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Publication number
KR20090004506A
KR20090004506A KR1020080054480A KR20080054480A KR20090004506A KR 20090004506 A KR20090004506 A KR 20090004506A KR 1020080054480 A KR1020080054480 A KR 1020080054480A KR 20080054480 A KR20080054480 A KR 20080054480A KR 20090004506 A KR20090004506 A KR 20090004506A
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KR
South Korea
Prior art keywords
stage
electromagnets
measuring
controller
coils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020080054480A
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English (en)
Korean (ko)
Inventor
요시히사 히야마
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20090004506A publication Critical patent/KR20090004506A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020080054480A 2007-06-29 2008-06-11 스테이지 장치, 노광장치 및 디바이스 제조방법 Ceased KR20090004506A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007173108A JP2009016385A (ja) 2007-06-29 2007-06-29 ステージ装置、露光装置及びデバイス製造方法
JPJP-P-2007-00173108 2007-06-29

Publications (1)

Publication Number Publication Date
KR20090004506A true KR20090004506A (ko) 2009-01-12

Family

ID=40159987

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080054480A Ceased KR20090004506A (ko) 2007-06-29 2008-06-11 스테이지 장치, 노광장치 및 디바이스 제조방법

Country Status (4)

Country Link
US (1) US20090002659A1 (https=)
JP (1) JP2009016385A (https=)
KR (1) KR20090004506A (https=)
TW (1) TW200915011A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101325619B1 (ko) * 2010-07-09 2013-11-20 에이에스엠엘 네델란즈 비.브이. 가변 릴럭턴스 디바이스, 스테이지 장치, 리소그래피 장치 및 디바이스 제조방법
KR20190114817A (ko) * 2018-03-30 2019-10-10 캐논 가부시끼가이샤 스테이지 구동 장치, 리소그래피 장치, 및 물품 제조 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5677785B2 (ja) 2009-08-27 2015-02-25 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法
JP5849955B2 (ja) * 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR20130004830A (ko) 2011-07-04 2013-01-14 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
NL2011336A (en) * 2012-09-19 2014-03-20 Asml Netherlands Bv Method of calibrating a reluctance actuator assembly, reluctance actuator and lithographic apparatus comprising such reluctance actuator.
KR102081284B1 (ko) * 2013-04-18 2020-02-26 삼성디스플레이 주식회사 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치
JP7005344B2 (ja) * 2017-12-28 2022-01-21 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3913150B2 (ja) * 1994-05-19 2007-05-09 キヤノン株式会社 露光装置
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JP2001230178A (ja) * 2000-02-15 2001-08-24 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
DE60136667D1 (de) * 2000-02-21 2009-01-08 Sharp Kk Präzisionsträgerplatte
JP2001297960A (ja) * 2000-04-11 2001-10-26 Nikon Corp ステージ装置および露光装置
JP3720680B2 (ja) * 2000-06-16 2005-11-30 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法
US6753534B2 (en) * 2000-12-08 2004-06-22 Nikon Corporation Positioning stage with stationary and movable magnet tracks
US6906334B2 (en) * 2000-12-19 2005-06-14 Nikon Corporation Curved I-core
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
JP2003045785A (ja) * 2001-08-01 2003-02-14 Nikon Corp ステージ装置及び露光装置、並びにデバイス製造方法
US20030102721A1 (en) * 2001-12-04 2003-06-05 Toshio Ueta Moving coil type planar motor control
US6841956B2 (en) * 2002-09-17 2005-01-11 Nikon Corporation Actuator to correct for off center-of-gravity line of force
JP3762401B2 (ja) * 2002-09-30 2006-04-05 キヤノン株式会社 位置決め装置及び露光装置並びにデバイスの製造方法
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP4261979B2 (ja) * 2003-05-12 2009-05-13 キヤノン株式会社 位置決め装置、露光装置およびデバイス製造方法
JP4307288B2 (ja) * 2004-02-25 2009-08-05 キヤノン株式会社 位置決め装置
JP4298547B2 (ja) * 2004-03-01 2009-07-22 キヤノン株式会社 位置決め装置およびそれを用いた露光装置
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101325619B1 (ko) * 2010-07-09 2013-11-20 에이에스엠엘 네델란즈 비.브이. 가변 릴럭턴스 디바이스, 스테이지 장치, 리소그래피 장치 및 디바이스 제조방법
US9081307B2 (en) 2010-07-09 2015-07-14 Asml Netherlands B.V. Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method
KR20190114817A (ko) * 2018-03-30 2019-10-10 캐논 가부시끼가이샤 스테이지 구동 장치, 리소그래피 장치, 및 물품 제조 방법
US11543745B2 (en) 2018-03-30 2023-01-03 Canon Kabushiki Kaisha Stage driving apparatus, lithography apparatus, and method of manufacturing article

Also Published As

Publication number Publication date
JP2009016385A (ja) 2009-01-22
TW200915011A (en) 2009-04-01
US20090002659A1 (en) 2009-01-01

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