KR20080064795A - 페이스트 도포기의 기판 정렬 방법 - Google Patents
페이스트 도포기의 기판 정렬 방법 Download PDFInfo
- Publication number
- KR20080064795A KR20080064795A KR1020080061034A KR20080061034A KR20080064795A KR 20080064795 A KR20080064795 A KR 20080064795A KR 1020080061034 A KR1020080061034 A KR 1020080061034A KR 20080061034 A KR20080061034 A KR 20080061034A KR 20080064795 A KR20080064795 A KR 20080064795A
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- KR
- South Korea
- Prior art keywords
- substrate
- head support
- alignment
- support means
- application head
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
- B05C5/0216—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles by relative movement of article and outlet according to a predetermined path
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Coating Apparatus (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
Abstract
Description
정렬 마크의 기준 좌표계에서의 좌표 | 실제 샘플 패턴의 측정된 좌표 |
(x1, y1) | (x1+Δx1, y1+Δy1) |
(x2, y2) | (x2+Δx2, y2+Δy2) |
Claims (4)
- 기판이 탑재된 스테이지와, 상기 스테이지 상에 설치된 도포헤드지지수단과, 상기 도포헤드지지수단 상에 설치되어 이송되는 도포 헤드와, 상기 도포 헤드에 설치된 정렬 카메라를 포함하고, 상기 정렬 카메라에의해 상기 기판 상의 정렬 마크를 판독하여 기판을 정렬하는 페이스트 도포기의 기판 정렬 방법에 있어서, 상기 방법이 :a) 정렬 마크를 판독하여 기판을 정렬하는 단계와;b) 도포헤드지지수단의 틀어진 정도인 도포헤드지지수단 오차를 검출하는 단계와;c) 상기 도포 헤드에 설치된 정렬 카메라의 위치를 검출된 도포헤드지지수단 오차만큼 보정한 위치로 조정하는 단계와;c) 검출된 도포헤드지지수단의 틀어진 정도에 따라 도포 패턴 데이터를 수정하는 단계와;d) 정렬 마크를 판독하여 다시 기판을 정렬하는 단계와;e) 단계 c)에서 수정된 도포 패턴 데이터에 따라 기판 상에 페이스트를 도포하는 단계;를 포함하는 것을 특징으로 하는 페이스트 도포기의 기판 정렬 방법.
- 제 1 항에 있어서, 상기 단계 b)가 :b1) 기판 상에 소정의 기준 좌표를 가진 2 개의 샘플 패턴들을 도포하는 단계와;b2) 상기 패턴들을 센싱하여 실제 도포된 좌표를 측정하는 단계와;b3) 상기 측정한 좌표와 상기 기준 좌표를 비교하여 X 축 좌표 및 Y 축 좌표의 오차 값들로부터 도포헤드지지수단 오차를 검출하는 단계;를 포함하는 것을 특징으로 하는 페이스트 도포기의 기판 정렬 방법.
- 제 1 항 내지 제 2 항 중의 어느 한 항에 있어서, 상기 단계 c)가 :상기 도포 헤드에 설치된 정렬 카메라가 정렬 위치일 때, 검출된 도포헤드지지수단 오차만큼 상기 정렬 카메라의 위치를 보정한 위치로 조정하는 단계;를 포함하는 것을 특징으로 하는 페이스트 도포기의 기판 정렬 방법.
- 제 3 항에 있어서, 상기 제어 방법이 :상기 단계 a), b), c)를 도포헤드지지수단 오차가 실질적으로 0이 될 때까지 반복하는 것을 특징으로 하는 페이스트 도포기의 기판 정렬 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20060043837 | 2006-05-16 | ||
KR1020060043837 | 2006-05-16 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070009501A Division KR100884834B1 (ko) | 2006-05-16 | 2007-01-30 | 페이스트 도포기의 기판 정렬 방법 |
Publications (2)
Publication Number | Publication Date |
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KR20080064795A true KR20080064795A (ko) | 2008-07-09 |
KR100899146B1 KR100899146B1 (ko) | 2009-05-27 |
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ID=39090287
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070009501A KR100884834B1 (ko) | 2006-05-16 | 2007-01-30 | 페이스트 도포기의 기판 정렬 방법 |
KR1020080061034A KR100899146B1 (ko) | 2006-05-16 | 2008-06-26 | 페이스트 도포기의 기판 정렬 방법 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020070009501A KR100884834B1 (ko) | 2006-05-16 | 2007-01-30 | 페이스트 도포기의 기판 정렬 방법 |
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KR (2) | KR100884834B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101065977B1 (ko) * | 2008-12-18 | 2011-09-19 | 삼성에스디아이 주식회사 | 잉크 젯 프린터 헤드 정렬 방법 및 그 장치 |
KR101141806B1 (ko) * | 2009-09-10 | 2012-05-11 | 가부시키가이샤 히타치플랜트테크놀로지 | 도포 장치와 그 도포 위치 보정 방법 |
KR101288195B1 (ko) * | 2009-06-17 | 2013-07-18 | 가부시키가이샤 알박 | 토출 장치 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10082417B2 (en) * | 2013-12-30 | 2018-09-25 | Nordson Corporation | Calibration methods for a viscous fluid dispensing system |
KR20200044252A (ko) | 2018-10-18 | 2020-04-29 | 삼성디스플레이 주식회사 | 표시 패널 검사 시스템, 표시 패널 검사 방법 및 이를 이용한 표시 패널. |
KR102287441B1 (ko) * | 2019-07-03 | 2021-08-09 | 주식회사 탑 엔지니어링 | 스테이지 정렬 장치, 이를 포함하는 도포 장치, 및 이를 이용한 스테이지 정렬 방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3139377B2 (ja) * | 1995-12-27 | 2001-02-26 | 東レ株式会社 | 塗布装置および塗布方法ならびにカラーフィルタの製造装置および製造方法 |
KR19990006187A (ko) * | 1997-06-30 | 1999-01-25 | 김영환 | 액정패널과 실리콘노즐 간극보정장치 |
KR100618579B1 (ko) * | 2002-12-23 | 2006-08-31 | 엘지.필립스 엘시디 주식회사 | 디스펜서 정렬장치 및 그 방법 |
JP3982502B2 (ja) * | 2004-01-15 | 2007-09-26 | セイコーエプソン株式会社 | 描画装置 |
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2007
- 2007-01-30 KR KR1020070009501A patent/KR100884834B1/ko active IP Right Grant
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2008
- 2008-06-26 KR KR1020080061034A patent/KR100899146B1/ko active IP Right Grant
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101065977B1 (ko) * | 2008-12-18 | 2011-09-19 | 삼성에스디아이 주식회사 | 잉크 젯 프린터 헤드 정렬 방법 및 그 장치 |
KR101288195B1 (ko) * | 2009-06-17 | 2013-07-18 | 가부시키가이샤 알박 | 토출 장치 |
KR101141806B1 (ko) * | 2009-09-10 | 2012-05-11 | 가부시키가이샤 히타치플랜트테크놀로지 | 도포 장치와 그 도포 위치 보정 방법 |
Also Published As
Publication number | Publication date |
---|---|
KR20070111313A (ko) | 2007-11-21 |
KR100884834B1 (ko) | 2009-02-20 |
KR100899146B1 (ko) | 2009-05-27 |
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