KR20080044184A - 알칼리 현상형의 페이스트 조성물, 그것을 이용한 도전성패턴 및 블랙 매트릭스 패턴의 형성 방법, 및 그 도전성패턴 및 블랙 매트릭스 패턴 - Google Patents

알칼리 현상형의 페이스트 조성물, 그것을 이용한 도전성패턴 및 블랙 매트릭스 패턴의 형성 방법, 및 그 도전성패턴 및 블랙 매트릭스 패턴 Download PDF

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Publication number
KR20080044184A
KR20080044184A KR1020070116036A KR20070116036A KR20080044184A KR 20080044184 A KR20080044184 A KR 20080044184A KR 1020070116036 A KR1020070116036 A KR 1020070116036A KR 20070116036 A KR20070116036 A KR 20070116036A KR 20080044184 A KR20080044184 A KR 20080044184A
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KR
South Korea
Prior art keywords
pattern
group
formula
paste composition
alkali
Prior art date
Application number
KR1020070116036A
Other languages
English (en)
Korean (ko)
Inventor
마사끼 사사끼
노부히또 이또
마사오 아리마
Original Assignee
다이요 잉키 세이조 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이요 잉키 세이조 가부시키가이샤 filed Critical 다이요 잉키 세이조 가부시키가이샤
Publication of KR20080044184A publication Critical patent/KR20080044184A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020070116036A 2006-11-15 2007-11-14 알칼리 현상형의 페이스트 조성물, 그것을 이용한 도전성패턴 및 블랙 매트릭스 패턴의 형성 방법, 및 그 도전성패턴 및 블랙 매트릭스 패턴 KR20080044184A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006309104 2006-11-15
JPJP-P-2006-00309104 2006-11-15
JPJP-P-2006-00309103 2006-11-15
JP2006309103 2006-11-15

Publications (1)

Publication Number Publication Date
KR20080044184A true KR20080044184A (ko) 2008-05-20

Family

ID=39606234

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070116036A KR20080044184A (ko) 2006-11-15 2007-11-14 알칼리 현상형의 페이스트 조성물, 그것을 이용한 도전성패턴 및 블랙 매트릭스 패턴의 형성 방법, 및 그 도전성패턴 및 블랙 매트릭스 패턴

Country Status (4)

Country Link
JP (1) JP5183161B2 (ja)
KR (1) KR20080044184A (ja)
CN (1) CN101183219B (ja)
TW (1) TW200844660A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101277020B1 (ko) * 2010-09-30 2013-06-24 다이요 홀딩스 가부시키가이샤 감광성 도전 페이스트

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5236557B2 (ja) * 2009-03-31 2013-07-17 太陽ホールディングス株式会社 レーザーを用いたパターン形成方法
JP5561989B2 (ja) * 2009-10-02 2014-07-30 太陽ホールディングス株式会社 レーザーを用いたパターン形成方法
JP5825963B2 (ja) * 2011-09-30 2015-12-02 太陽ホールディングス株式会社 感光性導電性樹脂組成物、感光性導電性ペーストおよび導電体パターン
JP6058890B2 (ja) * 2012-01-11 2017-01-11 株式会社Adeka 硬化性樹脂組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338322A (ja) * 1999-05-26 2000-12-08 Mitsubishi Chemicals Corp カラーフィルター用光重合性組成物およびカラーフィルター
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
TW200519535A (en) * 2003-11-27 2005-06-16 Taiyo Ink Mfg Co Ltd Hardenable resin composition, hardened body thereof, and printed circuit board
JP4830310B2 (ja) * 2004-02-23 2011-12-07 三菱化学株式会社 オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP4556479B2 (ja) * 2004-04-27 2010-10-06 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示パネル
JP2006268027A (ja) * 2005-02-23 2006-10-05 Jsr Corp プラズマディスプレイパネルの製造方法および転写フィルム
JP4253306B2 (ja) * 2005-03-01 2009-04-08 太陽インキ製造株式会社 感光性ペースト及びそれを用いて形成した焼成物パターン
JP2006309157A (ja) * 2005-04-01 2006-11-09 Jsr Corp 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101277020B1 (ko) * 2010-09-30 2013-06-24 다이요 홀딩스 가부시키가이샤 감광성 도전 페이스트

Also Published As

Publication number Publication date
TW200844660A (en) 2008-11-16
JP5183161B2 (ja) 2013-04-17
JP2008146042A (ja) 2008-06-26
CN101183219B (zh) 2012-07-04
CN101183219A (zh) 2008-05-21

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