TW200844660A - Alkali development type paste composition, method for conductive pattern and black matrix pattern formation using the same, and the conductive pattern and the black matrix pattern - Google Patents

Alkali development type paste composition, method for conductive pattern and black matrix pattern formation using the same, and the conductive pattern and the black matrix pattern Download PDF

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Publication number
TW200844660A
TW200844660A TW096143057A TW96143057A TW200844660A TW 200844660 A TW200844660 A TW 200844660A TW 096143057 A TW096143057 A TW 096143057A TW 96143057 A TW96143057 A TW 96143057A TW 200844660 A TW200844660 A TW 200844660A
Authority
TW
Taiwan
Prior art keywords
pattern
paste composition
alkali
group
photopolymerization initiator
Prior art date
Application number
TW096143057A
Other languages
English (en)
Chinese (zh)
Inventor
Masaki Sasaki
Nobuhito Itoh
Masao Arima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW200844660A publication Critical patent/TW200844660A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW096143057A 2006-11-15 2007-11-14 Alkali development type paste composition, method for conductive pattern and black matrix pattern formation using the same, and the conductive pattern and the black matrix pattern TW200844660A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006309104 2006-11-15
JP2006309103 2006-11-15

Publications (1)

Publication Number Publication Date
TW200844660A true TW200844660A (en) 2008-11-16

Family

ID=39606234

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096143057A TW200844660A (en) 2006-11-15 2007-11-14 Alkali development type paste composition, method for conductive pattern and black matrix pattern formation using the same, and the conductive pattern and the black matrix pattern

Country Status (4)

Country Link
JP (1) JP5183161B2 (ja)
KR (1) KR20080044184A (ja)
CN (1) CN101183219B (ja)
TW (1) TW200844660A (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5236557B2 (ja) * 2009-03-31 2013-07-17 太陽ホールディングス株式会社 レーザーを用いたパターン形成方法
JP5561989B2 (ja) * 2009-10-02 2014-07-30 太陽ホールディングス株式会社 レーザーを用いたパターン形成方法
KR101277020B1 (ko) * 2010-09-30 2013-06-24 다이요 홀딩스 가부시키가이샤 감광성 도전 페이스트
JP5825963B2 (ja) * 2011-09-30 2015-12-02 太陽ホールディングス株式会社 感光性導電性樹脂組成物、感光性導電性ペーストおよび導電体パターン
JP6058890B2 (ja) * 2012-01-11 2017-01-11 株式会社Adeka 硬化性樹脂組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338322A (ja) * 1999-05-26 2000-12-08 Mitsubishi Chemicals Corp カラーフィルター用光重合性組成物およびカラーフィルター
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
TW200519535A (en) * 2003-11-27 2005-06-16 Taiyo Ink Mfg Co Ltd Hardenable resin composition, hardened body thereof, and printed circuit board
JP4830310B2 (ja) * 2004-02-23 2011-12-07 三菱化学株式会社 オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター
JP4556479B2 (ja) * 2004-04-27 2010-10-06 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示パネル
JP2006268027A (ja) * 2005-02-23 2006-10-05 Jsr Corp プラズマディスプレイパネルの製造方法および転写フィルム
JP4253306B2 (ja) * 2005-03-01 2009-04-08 太陽インキ製造株式会社 感光性ペースト及びそれを用いて形成した焼成物パターン
JP2006309157A (ja) * 2005-04-01 2006-11-09 Jsr Corp 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子

Also Published As

Publication number Publication date
JP5183161B2 (ja) 2013-04-17
JP2008146042A (ja) 2008-06-26
CN101183219B (zh) 2012-07-04
KR20080044184A (ko) 2008-05-20
CN101183219A (zh) 2008-05-21

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