CN101183219B - 碱显影型的糊剂组合物 - Google Patents
碱显影型的糊剂组合物 Download PDFInfo
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- CN101183219B CN101183219B CN2007101872572A CN200710187257A CN101183219B CN 101183219 B CN101183219 B CN 101183219B CN 2007101872572 A CN2007101872572 A CN 2007101872572A CN 200710187257 A CN200710187257 A CN 200710187257A CN 101183219 B CN101183219 B CN 101183219B
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- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
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- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- QASWQXKZQZCVST-UHFFFAOYSA-N propan-2-yl dihydrogen phosphite Chemical compound CC(C)OP(O)O QASWQXKZQZCVST-UHFFFAOYSA-N 0.000 description 1
- MHZDONKZSXBOGL-UHFFFAOYSA-N propyl dihydrogen phosphate Chemical compound CCCOP(O)(O)=O MHZDONKZSXBOGL-UHFFFAOYSA-N 0.000 description 1
- PRAHMDIEZMWIRW-UHFFFAOYSA-N propyl dihydrogen phosphite Chemical compound CCCOP(O)O PRAHMDIEZMWIRW-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
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- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
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- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 1
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- 239000002562 thickening agent Substances 0.000 description 1
- RBNWAMSGVWEHFP-UHFFFAOYSA-N trans-p-Menthane-1,8-diol Chemical compound CC(C)(O)C1CCC(C)(O)CC1 RBNWAMSGVWEHFP-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
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| JP2006309104 | 2006-11-15 | ||
| JP2006-309104 | 2006-11-15 | ||
| JP2006309104 | 2006-11-15 | ||
| JP2006309103 | 2006-11-15 | ||
| JP2006-309103 | 2006-11-15 | ||
| JP2006309103 | 2006-11-15 |
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| CN101183219A CN101183219A (zh) | 2008-05-21 |
| CN101183219B true CN101183219B (zh) | 2012-07-04 |
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| CN2007101872572A Expired - Fee Related CN101183219B (zh) | 2006-11-15 | 2007-11-15 | 碱显影型的糊剂组合物 |
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| JP (1) | JP5183161B2 (ja) |
| KR (1) | KR20080044184A (ja) |
| CN (1) | CN101183219B (ja) |
| TW (1) | TW200844660A (ja) |
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| JP5236557B2 (ja) * | 2009-03-31 | 2013-07-17 | 太陽ホールディングス株式会社 | レーザーを用いたパターン形成方法 |
| JP5561989B2 (ja) * | 2009-10-02 | 2014-07-30 | 太陽ホールディングス株式会社 | レーザーを用いたパターン形成方法 |
| KR101277020B1 (ko) * | 2010-09-30 | 2013-06-24 | 다이요 홀딩스 가부시키가이샤 | 감광성 도전 페이스트 |
| JP5825963B2 (ja) * | 2011-09-30 | 2015-12-02 | 太陽ホールディングス株式会社 | 感光性導電性樹脂組成物、感光性導電性ペーストおよび導電体パターン |
| JP6058890B2 (ja) * | 2012-01-11 | 2017-01-11 | 株式会社Adeka | 硬化性樹脂組成物 |
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| CN1726434A (zh) * | 2002-12-16 | 2006-01-25 | 昭和电工株式会社 | 滤色片黑色矩阵光阻组合物 |
| CN1779568A (zh) * | 2003-11-27 | 2006-05-31 | 太阳油墨制造株式会社 | 固化性树脂组合物、其固化物以及印刷电路板 |
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| JP2000338322A (ja) * | 1999-05-26 | 2000-12-08 | Mitsubishi Chemicals Corp | カラーフィルター用光重合性組成物およびカラーフィルター |
| JP4489566B2 (ja) * | 2003-11-27 | 2010-06-23 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、その硬化物、およびプリント配線板 |
| JP4830310B2 (ja) * | 2004-02-23 | 2011-12-07 | 三菱化学株式会社 | オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター |
| JP4556479B2 (ja) * | 2004-04-27 | 2010-10-06 | Ｊｓｒ株式会社 | 着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示パネル |
| JP2006268027A (ja) * | 2005-02-23 | 2006-10-05 | Jsr Corp | プラズマディスプレイパネルの製造方法および転写フィルム |
| JP4253306B2 (ja) * | 2005-03-01 | 2009-04-08 | 太陽インキ製造株式会社 | 感光性ペースト及びそれを用いて形成した焼成物パターン |
| JP2006309157A (ja) * | 2005-04-01 | 2006-11-09 | Jsr Corp | 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子 |
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2007
- 2007-11-14 KR KR1020070116036A patent/KR20080044184A/ko not_active Application Discontinuation
- 2007-11-14 TW TW096143057A patent/TW200844660A/zh unknown
- 2007-11-15 CN CN2007101872572A patent/CN101183219B/zh not_active Expired - Fee Related
- 2007-11-15 JP JP2007297034A patent/JP5183161B2/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1726434A (zh) * | 2002-12-16 | 2006-01-25 | 昭和电工株式会社 | 滤色片黑色矩阵光阻组合物 |
| CN1779568A (zh) * | 2003-11-27 | 2006-05-31 | 太阳油墨制造株式会社 | 固化性树脂组合物、其固化物以及印刷电路板 |
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| TW200844660A (en) | 2008-11-16 |
| JP5183161B2 (ja) | 2013-04-17 |
| JP2008146042A (ja) | 2008-06-26 |
| KR20080044184A (ko) | 2008-05-20 |
| CN101183219A (zh) | 2008-05-21 |
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