KR20070012647A - 평면 유리상에 갈륨 산화물 코팅을 침착하는 방법 - Google Patents

평면 유리상에 갈륨 산화물 코팅을 침착하는 방법 Download PDF

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Publication number
KR20070012647A
KR20070012647A KR1020067018433A KR20067018433A KR20070012647A KR 20070012647 A KR20070012647 A KR 20070012647A KR 1020067018433 A KR1020067018433 A KR 1020067018433A KR 20067018433 A KR20067018433 A KR 20067018433A KR 20070012647 A KR20070012647 A KR 20070012647A
Authority
KR
South Korea
Prior art keywords
gallium oxide
gallium
substrate
coating
gas mixture
Prior art date
Application number
KR1020067018433A
Other languages
English (en)
Korean (ko)
Inventor
마이클 피. 레밍톤
데이빗 에이. 스트릭클러
스리칸스 바라나시
Original Assignee
필킹톤 노쓰 아메리카, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 필킹톤 노쓰 아메리카, 인코포레이티드 filed Critical 필킹톤 노쓰 아메리카, 인코포레이티드
Publication of KR20070012647A publication Critical patent/KR20070012647A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
  • Formation Of Insulating Films (AREA)
KR1020067018433A 2004-03-10 2005-02-23 평면 유리상에 갈륨 산화물 코팅을 침착하는 방법 KR20070012647A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/797,450 2004-03-10
US10/797,450 US7223441B2 (en) 2004-03-10 2004-03-10 Method for depositing gallium oxide coatings on flat glass

Publications (1)

Publication Number Publication Date
KR20070012647A true KR20070012647A (ko) 2007-01-26

Family

ID=34920057

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067018433A KR20070012647A (ko) 2004-03-10 2005-02-23 평면 유리상에 갈륨 산화물 코팅을 침착하는 방법

Country Status (8)

Country Link
US (1) US7223441B2 (fr)
EP (1) EP1725504B1 (fr)
JP (1) JP4757862B2 (fr)
KR (1) KR20070012647A (fr)
CN (1) CN1930099B (fr)
AT (1) ATE374168T1 (fr)
DE (1) DE602005002635T2 (fr)
WO (1) WO2005092809A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101452976B1 (ko) * 2012-06-14 2014-10-22 연세대학교 산학협력단 원자층증착법을 이용한 갈륨 산화물 나노선을 형성하는 방법

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7160578B2 (en) * 2004-03-10 2007-01-09 Pilkington North America Method for depositing aluminum oxide coatings on flat glass
KR101353334B1 (ko) * 2006-11-22 2014-02-18 소이텍 갈륨 질화물 증착에서의 반응 가스 감소
US20090214858A1 (en) * 2008-02-25 2009-08-27 Pilkington North America, Inc. Magnesium oxide coated glass article and a method for depositing magnesium oxide coatings on flat glass
JP2010231019A (ja) * 2009-03-27 2010-10-14 Fuji Xerox Co Ltd 受光素子、プロセスカートリッジおよび画像形成装置
CN102169949B (zh) * 2011-02-25 2013-10-09 聚灿光电科技(苏州)有限公司 一种发光二极管基板及其制造方法
GB201114242D0 (en) * 2011-08-18 2011-10-05 Pilkington Group Ltd Tantalum oxide coatings
CN104647828B (zh) * 2013-11-21 2017-06-16 北京有色金属研究总院 一种Cr2O3和Al2O3复合梯度阻氢涂层及其制备方法和应用
CN105500811B (zh) * 2014-10-08 2018-02-23 北京有色金属研究总院 高温真空集热管内壁弥散阻氢涂层及其制备方法
US10651317B2 (en) 2016-04-15 2020-05-12 Macom Technology Solutions Holdings, Inc. High-voltage lateral GaN-on-silicon Schottky diode
US20170301780A1 (en) 2016-04-15 2017-10-19 Macom Technology Solutions Holdings, Inc. High-voltage gan high electron mobility transistors with reduced leakage current
US10950598B2 (en) 2018-01-19 2021-03-16 Macom Technology Solutions Holdings, Inc. Heterolithic microwave integrated circuits including gallium-nitride devices formed on highly doped semiconductor
US11056483B2 (en) 2018-01-19 2021-07-06 Macom Technology Solutions Holdings, Inc. Heterolithic microwave integrated circuits including gallium-nitride devices on intrinsic semiconductor
US11233047B2 (en) 2018-01-19 2022-01-25 Macom Technology Solutions Holdings, Inc. Heterolithic microwave integrated circuits including gallium-nitride devices on highly doped regions of intrinsic silicon
JP2020011858A (ja) * 2018-07-17 2020-01-23 トヨタ自動車株式会社 成膜方法、及び、半導体装置の製造方法
US11600614B2 (en) 2020-03-26 2023-03-07 Macom Technology Solutions Holdings, Inc. Microwave integrated circuits including gallium-nitride devices on silicon
CN112410763A (zh) * 2020-10-28 2021-02-26 武汉华星光电半导体显示技术有限公司 一种薄膜封装层，其制备方法及可折叠显示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4321301A1 (de) * 1992-07-06 1994-01-13 Zeiss Carl Fa Dünne Schicht aus Galliumoxid und Herstellverfahren dafür
US5389401A (en) * 1994-02-23 1995-02-14 Gordon; Roy G. Chemical vapor deposition of metal oxides
US5451548A (en) 1994-03-23 1995-09-19 At&T Corp. Electron beam deposition of gallium oxide thin films using a single high purity crystal source
US5725801A (en) 1995-07-05 1998-03-10 Adrian H. Kitai Doped amorphous and crystalline gallium oxides, alkaline earth gallates and doped zinc germanate phosphors as electroluminescent materials
GB9616983D0 (en) * 1996-08-13 1996-09-25 Pilkington Plc Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass
US6238738B1 (en) * 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
JP4184487B2 (ja) * 1997-08-15 2008-11-19 昭和電工株式会社 二酸化チタン微粒子の製造方法
GB9913315D0 (en) * 1999-06-08 1999-08-11 Pilkington Plc Improved process for coating glass
JP4083396B2 (ja) * 2000-07-10 2008-04-30 独立行政法人科学技術振興機構 紫外透明導電膜とその製造方法
GB0306797D0 (en) * 2003-03-25 2003-04-30 Pilkington Plc Titania coatings
US7211513B2 (en) * 2003-07-01 2007-05-01 Pilkington North America, Inc. Process for chemical vapor desposition of a nitrogen-doped titanium oxide coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101452976B1 (ko) * 2012-06-14 2014-10-22 연세대학교 산학협력단 원자층증착법을 이용한 갈륨 산화물 나노선을 형성하는 방법

Also Published As

Publication number Publication date
CN1930099A (zh) 2007-03-14
US20050202170A1 (en) 2005-09-15
ATE374168T1 (de) 2007-10-15
DE602005002635T2 (de) 2008-07-17
JP4757862B2 (ja) 2011-08-24
WO2005092809A1 (fr) 2005-10-06
DE602005002635D1 (de) 2007-11-08
EP1725504B1 (fr) 2007-09-26
EP1725504A1 (fr) 2006-11-29
US7223441B2 (en) 2007-05-29
JP2007528445A (ja) 2007-10-11
CN1930099B (zh) 2011-08-03

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