JP2007528445A - 板ガラスに蒸着酸化ガリウム被膜を形成する方法 - Google Patents
板ガラスに蒸着酸化ガリウム被膜を形成する方法 Download PDFInfo
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- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 229910001195 gallium oxide Inorganic materials 0.000 title claims abstract description 61
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000005357 flat glass Substances 0.000 title claims description 6
- 239000007789 gas Substances 0.000 claims abstract description 54
- 239000011521 glass Substances 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 238000000151 deposition Methods 0.000 claims abstract description 33
- 150000002895 organic esters Chemical class 0.000 claims abstract description 33
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 30
- 230000008021 deposition Effects 0.000 claims abstract description 22
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 13
- -1 gallium halide Chemical class 0.000 claims abstract description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000001301 oxygen Substances 0.000 claims abstract description 11
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 9
- 239000002243 precursor Substances 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 25
- 239000011248 coating agent Substances 0.000 claims description 23
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical group CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 239000005329 float glass Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 2
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 claims description 2
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 claims description 2
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 claims description 2
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical compound CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 41
- 238000009826 distribution Methods 0.000 description 12
- 239000010410 layer Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 239000000376 reactant Substances 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 6
- 229910001882 dioxygen Inorganic materials 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 238000006124 Pilkington process Methods 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- XOYLJNJLGBYDTH-UHFFFAOYSA-M chlorogallium Chemical compound [Ga]Cl XOYLJNJLGBYDTH-UHFFFAOYSA-M 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000012769 display material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005118 spray pyrolysis Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/228—Other specific oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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Abstract
【解決手段】有機エステルと無機ハロゲン化ガリウムとを用いた化学蒸着法により、ガラス基板に酸化ガリウム膜を形成する。蒸着速度を早くするために、有機エステルは3から6個の炭素原子からなるもの使用することが好ましい。また酸化ガリウム膜を形成する化学蒸着は、大気圧下で行う。本発明によれば、蒸着速度が速いため、十分な厚みを持った酸化ガリウム膜を形成することができる。本発明における方法により得られる蒸着速度は、1秒当たり75Å以上である。
【選択図】なし
Description
Battiston et al.Thin Solid Films, 1996, 279, 115 (蒸着速度:117Å/分すなわち1.95Å/秒)
Ballarin et al. Inorg.Chim.Acta, 1994, 217, 71 (蒸着速度:記載なし)
Minea et al. J. Mater. Chem. 1999, 9, 929. (蒸着速度:3800Å/分以下すなわち63.3Å/秒)
本発明は高温のガラス基板に酸化ガリウム被膜を行うため、以下の過程から成る。
(a)酸化ガリウムを形成するための、無機ハロゲン化ガリウムと、有機エステルとを含む前駆体混合ガスを調整する。
(b)前記前駆体混合ガスを高温ガラスに面したコーティングチャンバに導入しつつ、前記前駆体の温度をハロゲン化ガリウムが反応し酸化ガリウムとなる温度以下に維持する。
(c)前記前駆体混合ガスがコーティングチャンバに導入され、前記前駆体混合ガスが熱を受けることによって、有機エステルからの酸素と結合して酸化ガリウムを高温ガラス表面に蒸着する。
R1−C(=O)−O−CR2R3R4
ここで、R1−R3はHもしくは1から4個の炭素原子からなる飽和炭素鎖で、R4は1から4個の炭素原子からなる飽和炭素鎖である。
1.エステルが気相分子内熱分解脱離を受けて、対応するカルボン酸とオレフィンになる。
2.第一過程で生成したカルボン酸が更に熱分解を受け、分子内脱水され、水とケトンを生成する。
3.第2過程で生成した水が塩化ガリウムと反応して加水分解により酸化ガリウムが生成される。
表1は、蒸着条件とその結果の膜厚を示している。膜厚は光学的に測定した。
Claims (16)
- 酸化ガリウム被膜を高温ガラス基板上に被着するための化学蒸着方法であって、
酸化ガリウムを生成するために、無機ハロゲン化ガリウム及び有機エステルを含む前駆体混合ガスを準備する過程と、
高温ガラスに向けて開かれたコーティングチャンバに前駆体混合ガスを導入しつつ、塩化ガリウムが反応して酸化ガリウムが生成される温度以下に前駆体混合ガスの温度を保つ過程と、
前記前駆体混合ガスを前記コーティングチャンバに導入することにより、前記前駆体混合ガスが加熱され、前記有機エステルからの酸素と結合して形成される酸化ガリウムを、前記高温ガラス表面に被着させる過程とを有することを特徴とする化学蒸着方法。 - 前記有機エステルが以下の式で表され、
R1−C(=O)−O−CR2R3R4
前記式のR1からR3は水素もしくは1から4個の炭素原子を有する飽和炭素鎖であって、
R4は1から4個の炭素原子を有する飽和炭素鎖であることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着する化学蒸着方法。 - 前記有機エステルが、酢酸エチル、酢酸イソブチル、酢酸−n−ブチル、酢酸−t−ブチル及びギ酸エチルからなる群から選ばれることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に形成する化学蒸着方法。
- 前記基板が、フロートガラスリボンであることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着法。
- 前記ハロゲン化ガリウムが3塩化ガリウムであることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着法。
- 前記酸化ガリウムの高温ガラス基板への被着の速度が75Å/秒以上であることを特徴とする請求項1に記載の、酸化ガリウム被膜を被着させる化学蒸着方法。
- 前記酸化ガリウムの高温ガラス基板への被着の速度が100Å/秒以上であることを特徴とする請求項6に記載の、酸化ガリウム被膜を被着させる化学蒸着方法。
- 前記前駆体混合ガスの流れが被膜されるフロートガラスリボン上で層流であることを特徴とする請求項4に記載の、酸化ガリウム被膜を高温板ガラスに被着させる化学蒸着方法。
- 前記高温ガラス表面の温度が約1100°F−1320°F/590℃−715℃であることを特徴とする請求項4に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着方法。
- 前記有機エステルが酢酸エチルであり、
前記基板がフロートガラスリボンであることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着方法。 - 前記基板にシリカ被膜が形成され、
前記シリカ被膜の上に前記ガリウム酸化物被膜を被着させることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着法。 - 前記前駆体混合ガスに含まれる3塩化ガリウムの濃度が約0.5−5体積%であることを特徴とする請求項1に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着法。
- 前記前駆体混合ガスに含まれる前記有機エステルの濃度が3塩化ガリウムの濃度に対して約3−10倍であることを特徴とする請求項12に記載の、酸化ガリウム被膜を基板上に被着させる化学蒸着法。
- 前記酸化ガリウム被膜の屈折率が約1.7−1.95であることを特徴とする請求項1に記載の、酸化ガリウム被膜をガラス基板上に被着させる化学蒸着法。
- 酸化ガリウム被膜を高温ガラス基板上に被着させるための化学蒸着法であって、
無機ハロゲン化ガリウム及び3−6個の炭素原子からなる有機エステルとを含む前駆体混合ガスを予め均質に混合する過程と、
前記前駆体混合ガスを、前記有機エステルの熱分解反応が発生する温度以下に維持しつつ、前記基板を前記有機エステルの熱分解反応が発生する温度以上とし、周囲の雰囲気を概ね大気圧であるようにして、前記前駆体混合ガスを被覆されるべき前記ガラス基板に近接した位置に移送する過程と、
前記前駆体混合ガスを前記基板上方の蒸気空間に導入し、そこで前記有機エステルが熱分解し、それによって前記ハロゲン化ガリウムと反応が開始して、酸化ガリウム被膜が前記基板上に100Å/秒以上の速度で形成されるようにする過程とを有することを特徴とする化学蒸着方法。 - 無機ハロゲン化ガリウム及び有機エステルを利用する方法であって、前記有機エステルが3−6個の炭素原子を有し、化学蒸着法により酸化ガリウム被膜を高温板ガラス基板に形成することを特徴とする方法。
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US10/797,450 | 2004-03-10 | ||
US10/797,450 US7223441B2 (en) | 2004-03-10 | 2004-03-10 | Method for depositing gallium oxide coatings on flat glass |
PCT/US2005/005601 WO2005092809A1 (en) | 2004-03-10 | 2005-02-23 | Method for depositing gallium oxide coatings on flat glass |
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JP (1) | JP4757862B2 (ja) |
KR (1) | KR20070012647A (ja) |
CN (1) | CN1930099B (ja) |
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JP2010231019A (ja) * | 2009-03-27 | 2010-10-14 | Fuji Xerox Co Ltd | 受光素子、プロセスカートリッジおよび画像形成装置 |
JP2020011858A (ja) * | 2018-07-17 | 2020-01-23 | トヨタ自動車株式会社 | 成膜方法、及び、半導体装置の製造方法 |
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US7160578B2 (en) * | 2004-03-10 | 2007-01-09 | Pilkington North America | Method for depositing aluminum oxide coatings on flat glass |
KR101353334B1 (ko) * | 2006-11-22 | 2014-02-18 | 소이텍 | 갈륨 질화물 증착에서의 반응 가스 감소 |
US20090214858A1 (en) * | 2008-02-25 | 2009-08-27 | Pilkington North America, Inc. | Magnesium oxide coated glass article and a method for depositing magnesium oxide coatings on flat glass |
CN102169949B (zh) * | 2011-02-25 | 2013-10-09 | 聚灿光电科技(苏州)有限公司 | 一种发光二极管基板及其制造方法 |
GB201114242D0 (en) * | 2011-08-18 | 2011-10-05 | Pilkington Group Ltd | Tantalum oxide coatings |
KR101452976B1 (ko) * | 2012-06-14 | 2014-10-22 | 연세대학교 산학협력단 | 원자층증착법을 이용한 갈륨 산화물 나노선을 형성하는 방법 |
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JP2010231019A (ja) * | 2009-03-27 | 2010-10-14 | Fuji Xerox Co Ltd | 受光素子、プロセスカートリッジおよび画像形成装置 |
JP2020011858A (ja) * | 2018-07-17 | 2020-01-23 | トヨタ自動車株式会社 | 成膜方法、及び、半導体装置の製造方法 |
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DE602005002635D1 (de) | 2007-11-08 |
EP1725504B1 (en) | 2007-09-26 |
KR20070012647A (ko) | 2007-01-26 |
CN1930099A (zh) | 2007-03-14 |
DE602005002635T2 (de) | 2008-07-17 |
CN1930099B (zh) | 2011-08-03 |
JP4757862B2 (ja) | 2011-08-24 |
ATE374168T1 (de) | 2007-10-15 |
WO2005092809A1 (en) | 2005-10-06 |
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