KR20060052233A - 가열식 기판 지지부 및 상기 기판 지지부의 제조 방법 - Google Patents
가열식 기판 지지부 및 상기 기판 지지부의 제조 방법 Download PDFInfo
- Publication number
- KR20060052233A KR20060052233A KR1020050096102A KR20050096102A KR20060052233A KR 20060052233 A KR20060052233 A KR 20060052233A KR 1020050096102 A KR1020050096102 A KR 1020050096102A KR 20050096102 A KR20050096102 A KR 20050096102A KR 20060052233 A KR20060052233 A KR 20060052233A
- Authority
- KR
- South Korea
- Prior art keywords
- groove
- substrate support
- heat sink
- heating component
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/965,601 | 2004-10-13 | ||
| US10/965,601 US20060075970A1 (en) | 2004-10-13 | 2004-10-13 | Heated substrate support and method of fabricating same |
| US11/115,575 US7674338B2 (en) | 2004-10-13 | 2005-04-26 | Heated substrate support and method of fabricating same |
| US11/115,575 | 2005-04-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20060052233A true KR20060052233A (ko) | 2006-05-19 |
Family
ID=36380726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020050096102A Ceased KR20060052233A (ko) | 2004-10-13 | 2005-10-12 | 가열식 기판 지지부 및 상기 기판 지지부의 제조 방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4817791B2 (enExample) |
| KR (1) | KR20060052233A (enExample) |
| TW (1) | TWI289610B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009535801A (ja) * | 2006-04-28 | 2009-10-01 | ダンスン エレクトロン カンパニー リミテッド | サセプタの製造方法、及び、この方法によって製造されたサセプタ |
| JP7497354B2 (ja) * | 2018-12-07 | 2024-06-10 | アプライド マテリアルズ インコーポレイテッド | 部品、部品を製造する方法、及び部品を洗浄する方法 |
| JP2023166746A (ja) * | 2022-05-10 | 2023-11-22 | 東京エレクトロン株式会社 | 加熱装置及び基板処理装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1032238A (ja) * | 1996-04-19 | 1998-02-03 | Applied Komatsu Technol Kk | 被加熱型基板支持構造体 |
| JP2000005884A (ja) * | 1998-06-18 | 2000-01-11 | Furukawa Electric Co Ltd:The | 半導体製造装置の基盤ホルダー及びその製造方法 |
| JP2000243542A (ja) * | 1999-02-24 | 2000-09-08 | Nhk Spring Co Ltd | ヒータユニット及びその製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2222192A (en) * | 1938-10-12 | 1940-11-19 | Westinghouse Electric & Mfg Co | Flatiron |
| US2389588A (en) * | 1942-10-29 | 1945-11-27 | Westinghouse Electric Corp | Heating apparatus |
| US2541118A (en) * | 1945-04-11 | 1951-02-13 | Birtman Electric Co | Resistance element for electric irons |
| US5104459A (en) * | 1989-11-28 | 1992-04-14 | Atlantic Richfield Company | Method of forming aluminum alloy sheet |
| US6376815B1 (en) * | 1998-01-12 | 2002-04-23 | Furukawa Electric Co., Ltd. | Highly gas tight substrate holder and method of manufacturing the same |
| US6897411B2 (en) * | 2002-02-11 | 2005-05-24 | Applied Materials, Inc. | Heated substrate support |
| US7154070B2 (en) * | 2004-10-08 | 2006-12-26 | Furukawa-Sky Aluminum Corp. | Heater plate and a method for manufacturing the heater plate |
-
2005
- 2005-08-17 TW TW94128097A patent/TWI289610B/zh not_active IP Right Cessation
- 2005-10-11 JP JP2005296615A patent/JP4817791B2/ja not_active Expired - Fee Related
- 2005-10-12 KR KR1020050096102A patent/KR20060052233A/ko not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1032238A (ja) * | 1996-04-19 | 1998-02-03 | Applied Komatsu Technol Kk | 被加熱型基板支持構造体 |
| JP2000005884A (ja) * | 1998-06-18 | 2000-01-11 | Furukawa Electric Co Ltd:The | 半導体製造装置の基盤ホルダー及びその製造方法 |
| JP2000243542A (ja) * | 1999-02-24 | 2000-09-08 | Nhk Spring Co Ltd | ヒータユニット及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4817791B2 (ja) | 2011-11-16 |
| JP2006111973A (ja) | 2006-04-27 |
| TW200632124A (en) | 2006-09-16 |
| TWI289610B (en) | 2007-11-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20051012 |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20101012 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20051012 Comment text: Patent Application |
|
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20120322 Patent event code: PE09021S01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20120709 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20120322 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |