KR20050085257A - Ｌｃｄ 제조용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법 - Google Patents

Ｌｃｄ 제조용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법 Download PDF

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Publication number
KR20050085257A
KR20050085257A KR1020057009888A KR20057009888A KR20050085257A KR 20050085257 A KR20050085257 A KR 20050085257A KR 1020057009888 A KR1020057009888 A KR 1020057009888A KR 20057009888 A KR20057009888 A KR 20057009888A KR 20050085257 A KR20050085257 A KR 20050085257A
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KR
South Korea
Prior art keywords
photoresist composition
resist pattern
lcd
alkali
positive type
Prior art date
Application number
KR1020057009888A
Other languages
English (en)
Korean (ko)
Inventor
아키라 가타노
가즈히코 나카야마
사토시 니이쿠라
고스케 도이
Original Assignee
도오꾜오까고오교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도오꾜오까고오교 가부시끼가이샤 filed Critical 도오꾜오까고오교 가부시끼가이샤
Publication of KR20050085257A publication Critical patent/KR20050085257A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
KR1020057009888A 2002-12-06 2003-12-05 Ｌｃｄ 제조용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법 KR20050085257A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002355365A JP4071611B2 (ja) 2002-12-06 2002-12-06 Ｌｃｄ製造用ポジ型ホトレジスト組成物およびレジストパターンの形成方法
JPJP-P-2002-00355365 2002-12-06

Publications (1)

Publication Number Publication Date
KR20050085257A true KR20050085257A (ko) 2005-08-29

Family

ID=32500786

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057009888A KR20050085257A (ko) 2002-12-06 2003-12-05 Ｌｃｄ 제조용 포지티브형 포토레지스트 조성물 및레지스트 패턴의 형성방법

Country Status (5)

Country Link
JP (1) JP4071611B2 (zh)
KR (1) KR20050085257A (zh)
CN (1) CN1720484B (zh)
TW (1) TWI257526B (zh)
WO (1) WO2004053595A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4707987B2 (ja) * 2004-09-16 2011-06-22 東京応化工業株式会社 化学増幅型ポジ型ホトレジスト組成物
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
CN113589649B (zh) * 2021-08-13 2024-06-04 北京北旭电子材料有限公司 树脂组合物、光刻胶组合物及图案化方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0792669A (ja) * 1993-09-21 1995-04-07 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JPH07191461A (ja) * 1993-12-27 1995-07-28 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP3373072B2 (ja) * 1994-12-28 2003-02-04 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
JP3654981B2 (ja) * 1995-12-11 2005-06-02 東京応化工業株式会社 ポジ型ホトレジスト塗布液
JP4087949B2 (ja) * 1998-05-20 2008-05-21 セイコーエプソン株式会社 電気光学装置の製造方法及び電気光学装置
JP3640290B2 (ja) * 1998-10-02 2005-04-20 東京応化工業株式会社 ポジ型ホトレジスト塗布液及びそれを用いた表示素子用基材
JP4628531B2 (ja) * 1999-08-31 2011-02-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2001075272A (ja) * 1999-09-08 2001-03-23 Tokyo Ohka Kogyo Co Ltd 液晶素子製造用ポジ型ホトレジスト組成物
JP4429546B2 (ja) * 2001-05-09 2010-03-10 東京応化工業株式会社 ノボラック樹脂の製造方法、およびこれを用いたポジ型ホトレジスト組成物

Also Published As

Publication number Publication date
JP4071611B2 (ja) 2008-04-02
CN1720484A (zh) 2006-01-11
TW200417817A (en) 2004-09-16
CN1720484B (zh) 2010-05-05
TWI257526B (en) 2006-07-01
JP2004191394A (ja) 2004-07-08
WO2004053595A1 (ja) 2004-06-24

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