KR20040089138A - 오염 방지용 수성 피복 조성물 - Google Patents
오염 방지용 수성 피복 조성물 Download PDFInfo
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- KR20040089138A KR20040089138A KR10-2004-7011952A KR20047011952A KR20040089138A KR 20040089138 A KR20040089138 A KR 20040089138A KR 20047011952 A KR20047011952 A KR 20047011952A KR 20040089138 A KR20040089138 A KR 20040089138A
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- aqueous
- coating composition
- surfactant
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- 239000008199 coating composition Substances 0.000 title claims abstract description 80
- 230000003373 anti-fouling effect Effects 0.000 title claims abstract description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 82
- 239000004094 surface-active agent Substances 0.000 claims abstract description 101
- 239000006185 dispersion Substances 0.000 claims abstract description 92
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 claims abstract description 50
- 239000010954 inorganic particle Substances 0.000 claims abstract description 28
- 239000000839 emulsion Substances 0.000 claims description 122
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 105
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 97
- 229910000077 silane Inorganic materials 0.000 claims description 91
- 125000002947 alkylene group Chemical group 0.000 claims description 85
- 238000000576 coating method Methods 0.000 claims description 84
- 239000000203 mixture Substances 0.000 claims description 80
- 239000011248 coating agent Substances 0.000 claims description 76
- 239000000178 monomer Substances 0.000 claims description 76
- 239000008119 colloidal silica Substances 0.000 claims description 49
- 125000004432 carbon atom Chemical group C* 0.000 claims description 42
- 239000007787 solid Substances 0.000 claims description 37
- 238000007720 emulsion polymerization reaction Methods 0.000 claims description 35
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 31
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 30
- 239000003973 paint Substances 0.000 claims description 30
- 125000000217 alkyl group Chemical group 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 22
- 229920001296 polysiloxane Polymers 0.000 claims description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 229920000620 organic polymer Polymers 0.000 claims description 12
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 10
- 150000004759 cyclic silanes Chemical class 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- 230000004048 modification Effects 0.000 claims description 2
- 238000012986 modification Methods 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 239000000047 product Substances 0.000 description 83
- 238000006243 chemical reaction Methods 0.000 description 76
- 239000007864 aqueous solution Substances 0.000 description 75
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 54
- -1 polycarbonyl Polymers 0.000 description 46
- 238000002156 mixing Methods 0.000 description 36
- 239000002245 particle Substances 0.000 description 35
- 229940048053 acrylate Drugs 0.000 description 34
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 32
- 239000007788 liquid Substances 0.000 description 30
- 238000004519 manufacturing process Methods 0.000 description 30
- 150000001875 compounds Chemical class 0.000 description 28
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 27
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 26
- 239000000126 substance Substances 0.000 description 26
- 238000006116 polymerization reaction Methods 0.000 description 25
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 22
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 22
- 238000012360 testing method Methods 0.000 description 22
- 238000011109 contamination Methods 0.000 description 20
- 238000009472 formulation Methods 0.000 description 20
- 238000002360 preparation method Methods 0.000 description 20
- 239000004480 active ingredient Substances 0.000 description 18
- 239000002736 nonionic surfactant Substances 0.000 description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 16
- 239000010703 silicon Substances 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 238000003756 stirring Methods 0.000 description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 12
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 12
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 235000011114 ammonium hydroxide Nutrition 0.000 description 12
- 239000003945 anionic surfactant Substances 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 150000003254 radicals Chemical class 0.000 description 12
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 11
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 11
- 239000004611 light stabiliser Substances 0.000 description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 11
- 238000003860 storage Methods 0.000 description 11
- 125000000129 anionic group Chemical group 0.000 description 10
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 10
- 238000006011 modification reaction Methods 0.000 description 10
- XQAABEDPVQWFPN-UHFFFAOYSA-N octyl 3-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OCCCCCCCC)=CC(N2N=C3C=CC=CC3=N2)=C1O XQAABEDPVQWFPN-UHFFFAOYSA-N 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 9
- 238000007792 addition Methods 0.000 description 9
- 150000001412 amines Chemical class 0.000 description 9
- 239000012736 aqueous medium Substances 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 238000009826 distribution Methods 0.000 description 9
- 239000003995 emulsifying agent Substances 0.000 description 9
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 9
- 238000010992 reflux Methods 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 125000003710 aryl alkyl group Chemical group 0.000 description 8
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 8
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 7
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 7
- 239000012964 benzotriazole Substances 0.000 description 7
- 125000002843 carboxylic acid group Chemical group 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000002320 enamel (paints) Substances 0.000 description 7
- 230000002349 favourable effect Effects 0.000 description 7
- QANMHLXAZMSUEX-UHFFFAOYSA-N kinetin Chemical compound N=1C=NC=2N=CNC=2C=1NCC1=CC=CO1 QANMHLXAZMSUEX-UHFFFAOYSA-N 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 6
- 238000006460 hydrolysis reaction Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 6
- 229910000859 α-Fe Inorganic materials 0.000 description 6
- 239000012190 activator Substances 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 5
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- 235000011130 ammonium sulphate Nutrition 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
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- 125000005156 substituted alkylene group Chemical group 0.000 description 5
- 125000002348 vinylic group Chemical group 0.000 description 5
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 101100190227 Drosophila melanogaster PGRP-SA gene Proteins 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
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- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Chemical group 0.000 description 4
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 4
- 238000010526 radical polymerization reaction Methods 0.000 description 4
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- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 3
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- 125000005037 alkyl phenyl group Chemical group 0.000 description 3
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- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
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- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 3
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- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
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- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
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- 238000012546 transfer Methods 0.000 description 1
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- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-I triphosphate(5-) Chemical class [O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O UNXRWKVEANCORM-UHFFFAOYSA-I 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
도료안정성 | 수접촉각(도) | 내수성 | 빗물에 의한 얼룩 오염성 | 내후성 | |
실시예 1 | O | 50 | △ | ◎ | △ |
실시예 2 | O | 72 | △ | ◎ | △ |
실시예 3 | O | 74 | O | O | O |
실시예 4 | O | 70 | △ | ◎ | △ |
실시예 5 | O | 70 | △ | ◎ | △ |
실시예 6 | O | 72 | △ | O | △ |
실시예 7 | O | 70 | O | O | △ |
실시예 8 | O | 65 | ◎ | ◎ | ◎ |
실시예 9 | O | 68 | ◎ | O | ◎ |
실시예 10 | O | 65 | ◎ | ◎ | ◎ |
실시예 11 | O | 65 | ◎ | ◎ | ◎ |
비교예 1 | O | 82 | ◎ | × | ◎ |
비교예 2 | × | 78 | O | × | O |
비교예 3 | × | 87 | △ | O | △ |
비교예 4 | × | 85 | △ | ◎ | △ |
Claims (21)
- (A) 수성 분산체, (B) 콜로이드형 무기 입자 및 (C) 술포숙신산계 계면활성제를 함유하는 오염 방지용 수성 피복 조성물.
- 제 1 항에 있어서, (D) 알킬렌옥시드기를 함유하는 계면활성제를 추가로 함유하는 수성 피복 조성물.
- 제 1 항 또는 제 2 항에 있어서, (A) 수성 분산체가 (C) 술포숙신산계 계면활성제 및/또는 (D) 알킬렌옥시드기를 함유하는 계면활성제의 존재 하에서 유화 중합하여 얻어진 아크릴계 에멀젼인 수성 피복 조성물.
- 제 1 항 내지 제 3 항 중 어느 한 항에 있어서, 막 형성에 의해 얻어진 도막의 수접촉각이 75°이하인 수성 피복 조성물.
- 제 2 항 내지 제 4 항 중 어느 한 항에 있어서, (A) 수성 분산체의 수지 고형분 100질량부에 대하여 (B) 콜로이드형 무기 입자의 양이 0.1∼95질량부, (C) 술포숙신산계 계면활성제의 양이 0.1∼20질량부, (D) 알킬렌옥시드기를 함유하는 계면활성제의 양이 0.1∼5질량부인 수성 피복 조성물.
- 제 1 항 내지 제 5 항 중 어느 한 항에 있어서, (A) 수성 분산체가 실리콘 변성되어 이루어지는 아크릴계 에멀젼인 수성 피복 조성물.
- 제 1 항 내지 제 6 항 중 어느 한 항에 있어서, (A) 수성 분산체가 (F) 가수분해성 실란의 존재 하에서 (E) 에틸렌성 불포화 단량체를 유화 중합하여 얻어지는 아크릴계 에멀젼인 수성 피복 조성물.
- 제 7 항에 있어서, (F) 가수분해성 실란이 하기 일반식 (a):(R1)n-Si-(R2)4-n(a)[식 중, n 은 0∼3 의 정수이고, R1은 수소 원자, 탄소수 1∼16 의 지방족 탄화수소기, 탄소수 5∼10 의 아릴기, 탄소수 5∼6 의 시클로알킬기, 비닐기, 탄소수 1∼10 의 아크릴산알킬기, 및 탄소수 1∼10 의 메타크릴산알킬기로 이루어지는 군에서 선택되고 ; n 개의 R1은 동일하거나 상이해도 되고 ; R2는 탄소수 1∼8 의 알콕시기, 아세톡시기 또는 수산기로부터 선택되고 ; 4-n 개의 R2는 동일하거나 상이해도 됨]으로 표시되는 실란을 함유하는 수성 피복 조성물.
- 제 7 항 또는 제 8 항에 있어서, (F) 가수분해성 실란이 상기 일반식 (a) 에서 n=O 인 실란 (I) 및 n=1 인 실란 (II) 로 이루어지는 군에서 선택되는 1 종 이상과, n=2 인 실란 (III), n=3 인 실란 (IV), 고리형 실란 및 가수분해기를 갖는 선형 실록산으로 이루어지는 군에서 선택되는 1 종 이상을 몰비 100/1∼1/100 으로 함유하는 수성 피복 조성물.
- 제 1 항 내지 제 9 항 중 어느 한 항에 있어서, (B) 콜로이드형 무기 입자가 유기 폴리머로 피복된 콜로이드형 무기 입자를 함유하는 수성 피복 조성물.
- 제 1 항 내지 제 10 항 중 어느 한 항에 있어서, (B) 콜로이드형 무기 입자가 콜로이드성 실리카인 수성 피복 조성물.
- 제 1 항 내지 제 11 항 중 어느 한 항에 있어서, (C) 술포숙신산계 계면활성제가 라디칼 중합성 이중결합을 갖지 않는 술포숙신산계 계면활성제인 수성 피복 조성물.
- 제 2 항 내지 제 12 항 중 어느 한 항에 있어서, (D) 알킬렌옥시드기를 함유하는 계면활성제가 알킬렌옥시드기를 함유하는 라디칼 중합성 이중결합을 갖는 계면활성제인 수성 피복 조성물.
- 제 1 항 내지 제 13 항 중 어느 한 항에 있어서, (A) 수성 분산체가 시클로알킬기를 갖는 (메트)아크릴산 에스테르를 5질량% 이상 함유하는 (E) 에틸렌성 불포화 단량체를 유화 중합하여 얻어진 아크릴계 에멀젼인 수성 피복 조성물.
- 제 1 항 내지 제 14 항 중 어느 한 항에 있어서, 도료용으로 사용하는 것을 특징으로 하는 수성 피복 조성물.
- 제 15 항에 기재된 수성 피복 조성물을 함유하는 도료.
- 제 16 항에 기재된 도료를 사용하여 도장된 도장 물품.
- 제 16 항에 기재된 도료를 사용하여 도장된 외벽재.
- 제 16 항에 기재된 도료를 사용하여 도장된 건물.
- 제 16 항에 기재된 도료를 사용하여 형성된 피복을 함유하는 내오염성 복합체.
- 제 16 항에 기재된 도료를 사용하는 것을 특징으로 하는 도장 방법.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2002-00026933 | 2002-02-04 | ||
JP2002026933 | 2002-02-04 | ||
JP2002301080 | 2002-10-15 | ||
JPJP-P-2002-00301080 | 2002-10-15 | ||
PCT/JP2003/001071 WO2003066747A1 (fr) | 2002-02-04 | 2003-02-03 | Composition aqueuse de revetement antisalissure |
Publications (2)
Publication Number | Publication Date |
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KR20040089138A true KR20040089138A (ko) | 2004-10-20 |
KR100731563B1 KR100731563B1 (ko) | 2007-06-22 |
Family
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Application Number | Title | Priority Date | Filing Date |
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KR1020047011952A KR100731563B1 (ko) | 2002-02-04 | 2003-02-03 | 오염 방지용 수성 피복 조성물 |
Country Status (5)
Country | Link |
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EP (1) | EP1473331B1 (ko) |
JP (1) | JP4141388B2 (ko) |
KR (1) | KR100731563B1 (ko) |
AU (1) | AU2003244464A1 (ko) |
WO (1) | WO2003066747A1 (ko) |
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KR20160110947A (ko) * | 2014-01-24 | 2016-09-23 | 닛카카가쿠가부시키가이샤 | 발수제 조성물, 발수성 섬유 제품, 및 발수성 섬유 제품의 제조 방법 |
KR102630958B1 (ko) * | 2023-07-10 | 2024-01-31 | 피앤씨텍(주) | 특수 아크릴 바인더 수지를 이용한 내오염 도장 조성물및 이를 이용한 콘크리트 구조물 및 벽돌 구조물의 표면 보호 방법 |
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2003
- 2003-02-03 WO PCT/JP2003/001071 patent/WO2003066747A1/ja active Application Filing
- 2003-02-03 JP JP2003566106A patent/JP4141388B2/ja not_active Expired - Fee Related
- 2003-02-03 AU AU2003244464A patent/AU2003244464A1/en not_active Abandoned
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Cited By (3)
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KR20160035605A (ko) * | 2011-11-25 | 2016-03-31 | 닛뽕소다 가부시키가이샤 | 광 촉매 담지 구조체 |
KR20160110947A (ko) * | 2014-01-24 | 2016-09-23 | 닛카카가쿠가부시키가이샤 | 발수제 조성물, 발수성 섬유 제품, 및 발수성 섬유 제품의 제조 방법 |
KR102630958B1 (ko) * | 2023-07-10 | 2024-01-31 | 피앤씨텍(주) | 특수 아크릴 바인더 수지를 이용한 내오염 도장 조성물및 이를 이용한 콘크리트 구조물 및 벽돌 구조물의 표면 보호 방법 |
Also Published As
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EP1473331A1 (en) | 2004-11-03 |
JP4141388B2 (ja) | 2008-08-27 |
EP1473331A4 (en) | 2005-09-28 |
WO2003066747A1 (fr) | 2003-08-14 |
JPWO2003066747A1 (ja) | 2005-06-02 |
EP1473331B1 (en) | 2013-10-30 |
KR100731563B1 (ko) | 2007-06-22 |
AU2003244464A1 (en) | 2003-09-02 |
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