KR20040087881A - 신규 비스무트 화합물, 그 제조방법 및 막의 제조방법 - Google Patents
신규 비스무트 화합물, 그 제조방법 및 막의 제조방법 Download PDFInfo
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- KR20040087881A KR20040087881A KR1020040022718A KR20040022718A KR20040087881A KR 20040087881 A KR20040087881 A KR 20040087881A KR 1020040022718 A KR1020040022718 A KR 1020040022718A KR 20040022718 A KR20040022718 A KR 20040022718A KR 20040087881 A KR20040087881 A KR 20040087881A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- formula
- alkyl group
- bismuth
- hydrogen
- Prior art date
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- 150000001622 bismuth compounds Chemical class 0.000 title claims abstract description 85
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 140
- 239000001257 hydrogen Substances 0.000 claims abstract description 68
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 68
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 45
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 41
- 150000001621 bismuth Chemical class 0.000 claims abstract description 29
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 28
- 150000002367 halogens Chemical class 0.000 claims abstract description 28
- 125000002252 acyl group Chemical group 0.000 claims abstract description 18
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 18
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract description 18
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 8
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 8
- 239000011591 potassium Chemical group 0.000 claims abstract description 8
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 8
- 239000011734 sodium Chemical group 0.000 claims abstract description 8
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 7
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical group [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 7
- -1 diaryl monohalogenated bismuth Chemical class 0.000 claims description 104
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 57
- 239000002994 raw material Substances 0.000 claims description 46
- 229910052797 bismuth Inorganic materials 0.000 claims description 44
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 42
- 125000004432 carbon atom Chemical group C* 0.000 claims description 42
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 25
- 238000006243 chemical reaction Methods 0.000 claims description 25
- 125000001424 substituent group Chemical group 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 16
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 8
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- QUKURXAJRIIAQJ-UHFFFAOYSA-L 1-(2-dichlorobismuthanylphenyl)-n,n-dimethylmethanamine Chemical compound CN(C)CC1=CC=CC=C1[Bi](Cl)Cl QUKURXAJRIIAQJ-UHFFFAOYSA-L 0.000 claims description 3
- MSQLKJCXHMRULG-UHFFFAOYSA-M chloro-bis(3-methylphenyl)bismuthane Chemical compound CC1=CC=CC([Bi](Cl)C=2C=C(C)C=CC=2)=C1 MSQLKJCXHMRULG-UHFFFAOYSA-M 0.000 claims description 3
- SLHWQZGCNDLWLG-UHFFFAOYSA-L dichloro-[2-(methoxymethyl)phenyl]bismuthane Chemical compound COCC1=CC=CC=C1[Bi](Cl)Cl SLHWQZGCNDLWLG-UHFFFAOYSA-L 0.000 claims description 3
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 claims description 3
- SSSNMSMAYWNPOF-UHFFFAOYSA-M diphenylbismuthanylium;chloride Chemical compound C=1C=CC=CC=1[Bi](Cl)C1=CC=CC=C1 SSSNMSMAYWNPOF-UHFFFAOYSA-M 0.000 claims description 2
- CNPPHRJGZVFSFI-UHFFFAOYSA-N [Li]C1=CC=CC=C1COC Chemical group [Li]C1=CC=CC=C1COC CNPPHRJGZVFSFI-UHFFFAOYSA-N 0.000 claims 2
- 238000009834 vaporization Methods 0.000 abstract description 32
- 230000008016 vaporization Effects 0.000 abstract description 32
- 239000007788 liquid Substances 0.000 abstract description 8
- 150000001875 compounds Chemical class 0.000 abstract description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 51
- 239000010408 film Substances 0.000 description 30
- 239000002904 solvent Substances 0.000 description 23
- 239000000243 solution Substances 0.000 description 21
- ZHXAZZQXWJJBHA-UHFFFAOYSA-N triphenylbismuthane Chemical compound C1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 ZHXAZZQXWJJBHA-UHFFFAOYSA-N 0.000 description 20
- 238000005229 chemical vapour deposition Methods 0.000 description 18
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 18
- 238000000354 decomposition reaction Methods 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- LGQKTNJGABNIME-UHFFFAOYSA-N 1-(2-dimethylbismuthanylphenyl)-n,n-dimethylmethanamine Chemical compound CN(C)CC1=CC=CC=C1[Bi](C)C LGQKTNJGABNIME-UHFFFAOYSA-N 0.000 description 15
- 238000010586 diagram Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- AJGXSBAHXMWPLV-UHFFFAOYSA-N [2-(methoxymethyl)phenyl]-dimethylbismuthane Chemical compound COCC1=CC=CC=C1[Bi](C)C AJGXSBAHXMWPLV-UHFFFAOYSA-N 0.000 description 12
- 239000000725 suspension Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- HGSWZAVUWGHYPR-UHFFFAOYSA-N [2-(methoxymethyl)phenyl]-diphenylbismuthane Chemical compound COCC1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 HGSWZAVUWGHYPR-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000012159 carrier gas Substances 0.000 description 6
- 230000004580 weight loss Effects 0.000 description 6
- 125000005919 1,2,2-trimethylpropyl group Chemical group 0.000 description 5
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000006176 2-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 5
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 5
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 125000005917 3-methylpentyl group Chemical group 0.000 description 5
- SXPIIACLEJJFKK-UHFFFAOYSA-N CN(C)CC1=C(C=CC=C1)[Bi] Chemical compound CN(C)CC1=C(C=CC=C1)[Bi] SXPIIACLEJJFKK-UHFFFAOYSA-N 0.000 description 5
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 5
- 125000004850 cyclobutylmethyl group Chemical group C1(CCC1)C* 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 5
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 5
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 description 5
- 238000001938 differential scanning calorimetry curve Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 5
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 5
- QIARFSSBMORGNV-UHFFFAOYSA-N 1-[2-bis(3-methylphenyl)bismuthanylphenyl]-n,n-dimethylmethanamine Chemical compound CN(C)CC1=CC=CC=C1[Bi](C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 QIARFSSBMORGNV-UHFFFAOYSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 229910004356 Ti Raw Inorganic materials 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 235000019270 ammonium chloride Nutrition 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 4
- 238000010790 dilution Methods 0.000 description 4
- 239000012895 dilution Substances 0.000 description 4
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 4
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000012495 reaction gas Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 4
- 125000005916 2-methylpentyl group Chemical group 0.000 description 3
- ZTGPKCCNUVBFTF-UHFFFAOYSA-N C(C)N(CC)CC1=C(C=CC=C1)[Bi] Chemical compound C(C)N(CC)CC1=C(C=CC=C1)[Bi] ZTGPKCCNUVBFTF-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000005587 bubbling Effects 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- AYDYYQHYLJDCDQ-UHFFFAOYSA-N trimethylbismuthane Chemical compound C[Bi](C)C AYDYYQHYLJDCDQ-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000005926 1,2-dimethylbutyloxy group Chemical group 0.000 description 2
- 125000005923 1,2-dimethylpropyloxy group Chemical group 0.000 description 2
- CXHTZILHGASYLV-UHFFFAOYSA-N 1-(2-dimethylbismuthanylphenyl)-n,n-dimethylethanamine Chemical compound CN(C)C(C)C1=CC=CC=C1[Bi](C)C CXHTZILHGASYLV-UHFFFAOYSA-N 0.000 description 2
- 125000004870 1-ethylpropylcarbonyl group Chemical group C(C)C(CC)C(=O)* 0.000 description 2
- 125000004679 1-methylbutylcarbonyl group Chemical group CC(CCC)C(=O)* 0.000 description 2
- 125000004678 1-methylpropylcarbonyl group Chemical group CC(CC)C(=O)* 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- XTIPSHSVPHHDAH-UHFFFAOYSA-N 2-(2-dimethylbismuthanylphenyl)-n,n-dimethylpropan-2-amine Chemical compound CN(C)C(C)(C)C1=CC=CC=C1[Bi](C)C XTIPSHSVPHHDAH-UHFFFAOYSA-N 0.000 description 2
- 125000004680 2-methylbutylcarbonyl group Chemical group CC(CC(=O)*)CC 0.000 description 2
- 125000006607 3,3-dimethylbutyloxy group Chemical group 0.000 description 2
- 125000004681 3-methylbutylcarbonyl group Chemical group CC(CCC(=O)*)C 0.000 description 2
- 125000005925 3-methylpentyloxy group Chemical group 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- 125000000439 4-methylpentoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- BXIGMLLOLCVHFZ-UHFFFAOYSA-N C(C)N(C)CC1=C(C=CC(=C1)C)[Bi] Chemical compound C(C)N(C)CC1=C(C=CC(=C1)C)[Bi] BXIGMLLOLCVHFZ-UHFFFAOYSA-N 0.000 description 2
- GGFFECXEXFXDKQ-UHFFFAOYSA-N C(C)N(C)CC1=C(C=CC=C1)[Bi] Chemical compound C(C)N(C)CC1=C(C=CC=C1)[Bi] GGFFECXEXFXDKQ-UHFFFAOYSA-N 0.000 description 2
- QTPMQZVNYUUCQH-UHFFFAOYSA-N C(C)N(CC)CC1=C(C=CC(=C1)C)[Bi] Chemical compound C(C)N(CC)CC1=C(C=CC(=C1)C)[Bi] QTPMQZVNYUUCQH-UHFFFAOYSA-N 0.000 description 2
- UYXZLCOBDXSSSQ-UHFFFAOYSA-N CN(C)CC1=C(C=CC(=C1)C)[Bi] Chemical compound CN(C)CC1=C(C=CC(=C1)C)[Bi] UYXZLCOBDXSSSQ-UHFFFAOYSA-N 0.000 description 2
- QEQAAAOAUUURGK-UHFFFAOYSA-N COCC1=C(C=CC=C1)[Bi] Chemical compound COCC1=C(C=CC=C1)[Bi] QEQAAAOAUUURGK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- VALGRZOHENIONO-UHFFFAOYSA-N [2-(methoxymethyl)-4-methylphenyl]-bis(3-methylphenyl)bismuthane Chemical compound COCC1=CC(C)=CC=C1[Bi](C=1C=C(C)C=CC=1)C1=CC=CC(C)=C1 VALGRZOHENIONO-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 2
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- 238000002309 gasification Methods 0.000 description 2
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 2
- 125000005929 isobutyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])OC(*)=O 0.000 description 2
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 2
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
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- YCWSUKQGVSGXJO-NTUHNPAUSA-N nifuroxazide Chemical group C1=CC(O)=CC=C1C(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 YCWSUKQGVSGXJO-NTUHNPAUSA-N 0.000 description 2
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- RAMPWVPUGXQQIQ-UHFFFAOYSA-N n-[(2-diphenylbismuthanylphenyl)methyl]-n-methylethanamine Chemical compound CCN(C)CC1=CC=CC=C1[Bi](C=1C=CC=CC=1)C1=CC=CC=C1 RAMPWVPUGXQQIQ-UHFFFAOYSA-N 0.000 description 1
- ZIRALUOGOGKECI-UHFFFAOYSA-N n-[[2-bis(2-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-ethylethanamine Chemical compound CCN(CC)CC1=CC(C)=CC=C1[Bi](C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC ZIRALUOGOGKECI-UHFFFAOYSA-N 0.000 description 1
- TUJZUODNACAQMX-UHFFFAOYSA-N n-[[2-bis(2-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-methylethanamine Chemical compound CCN(C)CC1=CC(C)=CC=C1[Bi](C=1C(=CC=CC=1)CC)C1=CC=CC=C1CC TUJZUODNACAQMX-UHFFFAOYSA-N 0.000 description 1
- OXCZMZBQSGMHKK-UHFFFAOYSA-N n-[[2-bis(2-methylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-ethylethanamine Chemical compound CCN(CC)CC1=CC(C)=CC=C1[Bi](C=1C(=CC=CC=1)C)C1=CC=CC=C1C OXCZMZBQSGMHKK-UHFFFAOYSA-N 0.000 description 1
- CWGBTQOQNTYRID-UHFFFAOYSA-N n-[[2-bis(3-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-ethylethanamine Chemical compound CCN(CC)CC1=CC(C)=CC=C1[Bi](C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 CWGBTQOQNTYRID-UHFFFAOYSA-N 0.000 description 1
- FQRAIUJLFCWHDP-UHFFFAOYSA-N n-[[2-bis(3-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-methylethanamine Chemical compound CCN(C)CC1=CC(C)=CC=C1[Bi](C=1C=C(CC)C=CC=1)C1=CC=CC(CC)=C1 FQRAIUJLFCWHDP-UHFFFAOYSA-N 0.000 description 1
- CAOHFISTVBGIIU-UHFFFAOYSA-N n-[[2-bis(4-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-ethylethanamine Chemical compound CCN(CC)CC1=CC(C)=CC=C1[Bi](C=1C=CC(CC)=CC=1)C1=CC=C(CC)C=C1 CAOHFISTVBGIIU-UHFFFAOYSA-N 0.000 description 1
- MZVGGGWOXGNCCU-UHFFFAOYSA-N n-[[2-bis(4-ethylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-methylethanamine Chemical compound CCN(C)CC1=CC(C)=CC=C1[Bi](C=1C=CC(CC)=CC=1)C1=CC=C(CC)C=C1 MZVGGGWOXGNCCU-UHFFFAOYSA-N 0.000 description 1
- PGFVQIWPDNTXOZ-UHFFFAOYSA-N n-[[2-bis(4-methylphenyl)bismuthanyl-5-methylphenyl]methyl]-n-methylethanamine Chemical compound CCN(C)CC1=CC(C)=CC=C1[Bi](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 PGFVQIWPDNTXOZ-UHFFFAOYSA-N 0.000 description 1
- IEXRJMMXOAZXHD-UHFFFAOYSA-N n-[[2-di(propan-2-yl)bismuthanyl-5-propylphenyl]methyl]-n-ethylethanamine Chemical compound CCCC1=CC=C([Bi](C(C)C)C(C)C)C(CN(CC)CC)=C1 IEXRJMMXOAZXHD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- YREWUNQFLSJEEG-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]bismuthane Chemical compound CC(C)(C)O[Bi](OC(C)(C)C)OC(C)(C)C YREWUNQFLSJEEG-UHFFFAOYSA-N 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
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- B23Q5/00—Driving or feeding mechanisms; Control arrangements therefor
- B23Q5/22—Feeding members carrying tools or work
- B23Q5/34—Feeding other members supporting tools or work, e.g. saddles, tool-slides, through mechanical transmission
- B23Q5/36—Feeding other members supporting tools or work, e.g. saddles, tool-slides, through mechanical transmission in which a servomotor forms an essential element
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B25J9/00—Programme-controlled manipulators
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
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Abstract
Description
Claims (32)
- 화학식 1로 표시되는 것을 특징으로 하는 비스무트 화합물.(화학식 1)[화학식 1 중, R1은 저급알킬기를, R2는 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화 알킬기 또는 할로겐을, n1은 치환기 R2의 수 0~4를, R3~R6은 수소, 저급알킬기 또는 저급할로겐화 알킬기를 나타낸다.]
- 제 1 항에 있어서,R1은 메틸기, R2는 탄소수 1~2의 알킬기, R3및 R4는 수소 또는 탄소수 1~2의 알킬기, R5및 R6은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물.
- 제 2 항에 있어서,R1은 메틸기, R3및 R4는 수소, R5및 R6은 메틸기, n1=0인 것을 특징으로 하는 비스무트 화합물.
- 화학식 2로 표시되는 모노아릴디할로겐화 비스무트와, R1화 시약(R1은 저급알킬기를 나타낸다)을 반응시키는 것을 특징으로 하는, 제 1 항 내지 제 3 항 중 어느 한 항의 비스무트 화합물의 제조방법.(화학식 2)[화학식 2중, R2는 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, n1은 치환기 R2의 수 0~4를, R3~R6은 수소, 저급알킬기, 또는 저급할로겐화알킬기를, Z1은 할로겐을 나타낸다.]
- 화학식 3으로 표시되는 디알킬모노할로겐화 비스무트와, 화학식 4로 표시되는 아릴화 시약을 반응시키는 것을 특징으로 하는, 제 1 항 내지 제 3 항 중 어느 한 항의 비스무트 화합물의 제조방법.(화학식 3)[화학식 3중, R1은 저급알킬기를, Z1은 할로겐을 나타낸다.](화학식 4)[화학식 4중, R2는 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, n1은 치환기 R2의 수 0~4를, R3~R6은 수소, 저급알킬기 또는 저급할로겐화알킬기를, Q1은 리튬, 나트륨, 칼륨, MgCl, MgBr, MgI 중 어느 것을 나타낸다.]
- 제 4 항 또는 제 5 항에 있어서,R1은 메틸기, R2는 탄소수 1~2의 알킬기, R3및 R4는 수소 또는 탄소수 1~2의 알킬기, R5및 R6은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 4 항 또는 제 6 항에 있어서,화학식 2로 표시되는 모노아릴디할로겐화 비스무트가, 디클로로(2-(N,N-디메틸아미노메틸)페닐)비스무트인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 4 항, 제 6 항 또는 제 7 항 중 어느 한 항에 있어서,R1화 시약이 메틸 MgBr인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 1 항, 제 2 항 또는 제 3 항 중 어느 한 항의 비스무트 화합물을 원료로 하여, 기판 상에서, 비스무트 함유막을 화학기상성장시키는 것을 특징으로 하는 비스무트 함유막의 제조방법.
- 화학식 5로 표시되는 것을 특징으로 하는 비스무트 화합물.(화학식 5)[화학식 5중, R7은 저급알킬기를, R8은 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, n2는 치환기 R8의 수 0~4를, R9~R11은 수소, 저급 알킬기 또는 저급할로겐화 알킬기를 나타낸다.]
- 제 10 항에 있어서,R7은 메틸기, R8은 탄소수 1~2의 알킬기, R9및 R10은 수소 또는 탄소수 1~2의 알킬기, R11은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물.
- 제 11 항에 있어서,R7은 메틸기, R9및 R10은 수소, R11은 메틸기, n2=0인 것을 특징으로 하는 비스무트 화합물.
- 화학식 6으로 표시되는 모노아릴디할로겐화 비스무트와, R7화 시약(R7은 저급알킬기를 나타낸다)을 반응시키는 것을 특징으로 하는 제 10 항 내지 제 12 항 중 어느 한 항의 비스무트 화합물의 제조방법.(화학식 6)[화학식 6중, R8은 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, n2는 치환기 R8의 수 0~4를, R9~R11은 수소, 저급알킬기, 또는 저급할로겐화알킬기를, Z2는 할로겐을 나타낸다.]
- 화학식 7로 표시되는 디알킬모노할로겐화 비스무트와, 화학식 8로 표시되는 아릴화 시약을 반응시키는 것을 특징으로 하는, 제 10 항 내지 제 12 항 중 어느 한 항의 비스무트 화합물의 제조방법.(화학식 7)[화학식 7중, R7은 저급알킬기를, Z2는 할로겐을 나타낸다.](화학식 8)[화학식 8중, R8은 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, n2는 치환기 R8의 수 0~4를, R9~R11은수소, 저급알킬기 또는 저급할로겐화알킬기를, Q2는 리튬, 나트륨, 칼륨, MgCl, MgBr, MgI의 어느 것을 나타낸다.]
- 제 13 항 또는 제 14 항에 있어서,R7은 메틸기, R8은 탄소수 1~2의 알킬기, R9및 R10은 수소 또는 탄소수 1~2의 알킬기, R11은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 13 항 또는 제 15 항에 있어서,화학식 6으로 표시되는 모노아릴디할로겐화비스무트가, 디클로로(2-메톡시메틸페닐)비스무트인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 13 항, 제 15 항 또는 제 16 항 중 어느 한 항에 있어서,R7화 시약이 메틸 MgBr인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 10 항, 제 11 항 또는 제 12 항 중 어느 한 항의 비스무트 화합물을 원료로 하여, 기판 상에서, 비스무트 함유막을 화학기상성장시키는 것을 특징으로 하는 비스무트 함유막의 제조방법.
- 화학식 9로 표시되는 것을 특징으로 하는 비스무트 화합물(단, (i) X는 화학식 10, R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기 또는 4-클로로인 경우, 및 (ii) X는 화학식 10, m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).(화학식 9)[화학식 9중, R12및 R13은 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화 알킬기 또는 할로겐을, m은 치환기 R12의 수 0~5를, n3은 치환기 R13의 수 0~4를, R14및 R15는 수소, 저급알킬기, 또는 저급할로겐화 알킬기를, X는 화학식 10 또는 화학식 11(화학식 10)(화학식 11)[화학식 10 및 화학식 11 중, R16~R18은 수소, 저급알킬기 또는 저급할로겐화 알킬기를 나타낸다.]로 표시되는 치환기를 나타낸다.]
- 제 19 항에 있어서,R12및 R13은 탄소수 1~2의 알킬기 또는 탄소수 1~2의 할로겐화 알킬기, R14및 R15는 수소, 탄소수 1~2의 알킬기, 또는 탄소수 1~2의 할로겐화알킬기, R16~R18은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물(단, (i) X는 화학식 10, R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기, 또는 4-클로로인 경우, 및 (ii) X는 화학식 10, m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).
- 제 19 항 또는 제 20 항에 있어서,X가 화학식 10인 것을 특징으로 하는 비스무트 화합물(단, (i) R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기 또는 4-클로로인 경우, 및 (ii) X는 화학식 10, m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).
- 제 19 항 또는 제 20 항에 있어서,X가 화학식 11인 것을 특징으로 하는 비스무트 화합물.
- 제 21 항에 있어서,R12는 3-메틸기, R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0인 것을 특징으로 하는 비스무트 화합물.
- 제 22 항에 있어서,R14및 R15는 수소, R18은 메틸기, m=n3=0인 것을 특징으로 하는 비스무트 화합물.
- 제 19 항 내지 제 24 항 중 어느 한 항에 있어서,화학식 12로 표시되는 디아릴모노할로겐화 비스무트와, 화학식 13으로 표시되는 아릴화시약을 반응시키는 것을 특징으로 하는, 비스무트 화합물의 제조방법(단, (i) X는 화학식 10, R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기 또는 4-클로로인 경우, 및 (ii) X는 화학식 10, m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).(화학식 12)[화학식 중, R12는 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, m은 치환기 R12의 수 0~5를, Z3은 할로겐을 나타낸다.](화학식 13)[화학식 중, R13은 저급알킬기, 저급알콕시기, 저급아실기, 저급알콕시카르보닐기, 저급할로겐화알킬기 또는 할로겐을, R14및 R15는 수소, 저급알킬기 또는 저급할로겐화 알킬기를, n3은 치환기 R13의 수 0~4를, X는 화학식 10 또는 화학식 11(화학식 10)(화학식 11)[화학식 10 및 화학식 11 중, R16~R18은 수소, 저급알킬기 또는 저급할로겐화 알킬기를 나타낸다]를, Q3은 알칼리금속, MgCl, MgBr 또는 MgI를 나타낸다.]
- 제 25 항에 있어서,R12및 R13은 탄소수 1~2의 알킬기 또는 탄소수 1~2의 할로겐화알킬기, R14및 R15는 수소, 탄소수 1~2의 알킬기, 또는 탄소수 1~2의 할로겐화알킬기, R16~ R18은 탄소수 1~2의 알킬기인 것을 특징으로 하는 비스무트 화합물의 제조방법(단, (i) X는 화학식 10, R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기, 또는 4-클로로인 경우, 및 (ii) X는 화학식 10, m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).
- 제 25 항 또는 제 26 항에 있어서,X가 화학식 10인 것을 특징으로 하는 비스무트 화합물의 제조방법(단, (i) R14및 R15는 수소, R16및 R17은 메틸기, m=1, n3=0이고, 또한 R12는 4-메틸기, 4-메톡시기, 또는 4-클로로인 경우 및 (ii) m=n3=0, R15는 수소, R16및 R17은 메틸기이고, 또한 R14는 수소 또는 메틸기인 경우를 제외한다).
- 제 25 항 또는 제 26 항에 있어서,X가 화학식 11인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 25 항 내지 제 27 항 중 어느 한 항에 있어서,아릴화시약이 2-(N,N-디메틸아미노메틸)페닐리튬인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 25 항, 제 26 항 또는 제 28 항 중 어느 한 항에 있어서,아릴화 시약이 2-(메톡시메틸)페닐리튬인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 25 항 내지 제 27 항 중 어느 한 항에 있어서,디아릴모노할로겐화비스무트가 디(3-토릴)모노클로로비스무트, 아릴화시약이 2-(N,N-디메틸아미노메틸)페닐리튬인 것을 특징으로 하는 비스무트 화합물의 제조방법.
- 제 25 항, 제 26 항 또는 제 28 항 중 어느 한 항에 있어서,디아릴모노할로겐화 비스무트가 디페닐모노클로로비스무트, 아릴화시약이 2-(메톡시메틸)페닐리튬인 것을 특징으로 하는 비스무트 화합물의 제조방법.
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US20100279011A1 (en) * | 2007-10-31 | 2010-11-04 | Advanced Technology Materials, Inc. | Novel bismuth precursors for cvd/ald of thin films |
US8330136B2 (en) | 2008-12-05 | 2012-12-11 | Advanced Technology Materials, Inc. | High concentration nitrogen-containing germanium telluride based memory devices and processes of making |
US9012876B2 (en) | 2010-03-26 | 2015-04-21 | Entegris, Inc. | Germanium antimony telluride materials and devices incorporating same |
WO2011146913A2 (en) | 2010-05-21 | 2011-11-24 | Advanced Technology Materials, Inc. | Germanium antimony telluride materials and devices incorporating same |
US9640757B2 (en) | 2012-10-30 | 2017-05-02 | Entegris, Inc. | Double self-aligned phase change memory device structure |
WO2014124056A1 (en) | 2013-02-08 | 2014-08-14 | Advanced Technology Materials, Inc. | Ald processes for low leakage current and low equivalent oxide thickness bitao films |
US20220411449A1 (en) * | 2019-11-13 | 2022-12-29 | University Of Hawaii | Method for Preparing Heteroleptic Triarylbismuthanes and Compounds Produced by the Same |
CN112430084B (zh) * | 2020-12-03 | 2022-07-08 | 西南大学 | 一种高耐电场强度、高储能密度的nbt-bt基驰豫铁电陶瓷薄膜材料及其制备方法 |
WO2023122470A1 (en) | 2021-12-21 | 2023-06-29 | Versum Materials Us, Llc | Precursors for deposition of bismuth-containing films |
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