KR20040057250A - 기생 용량 편차가 최소화된 액정 표시 장치용 박막트랜지스터 - Google Patents
기생 용량 편차가 최소화된 액정 표시 장치용 박막트랜지스터 Download PDFInfo
- Publication number
- KR20040057250A KR20040057250A KR1020020083881A KR20020083881A KR20040057250A KR 20040057250 A KR20040057250 A KR 20040057250A KR 1020020083881 A KR1020020083881 A KR 1020020083881A KR 20020083881 A KR20020083881 A KR 20020083881A KR 20040057250 A KR20040057250 A KR 20040057250A
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- electrode
- drain
- active layer
- gate electrode
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 32
- 239000010409 thin film Substances 0.000 title claims abstract description 28
- 230000003071 parasitic effect Effects 0.000 title description 60
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000010410 layer Substances 0.000 claims description 57
- 239000010408 film Substances 0.000 claims description 18
- 239000011159 matrix material Substances 0.000 claims description 8
- 238000002161 passivation Methods 0.000 abstract description 8
- 244000045947 parasite Species 0.000 abstract 2
- 239000003990 capacitor Substances 0.000 description 35
- 239000011241 protective layer Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 5
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1296—Multistep manufacturing methods adapted to increase the uniformity of device parameters
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
Claims (7)
- 기판과;상기 기판 상부에 형성되는 게이트 전극과;상기 게이트 전극 상부에 형성되는 제 1 절연막과;상기 게이트 전극에 대응되며 상기 제 1 절연막 상부에 형성되는 활성층과;상기 활성층 상부에 상기 활성층의 가장자리와 중첩되도록 형성되는 소스 전극과;상기 활성층 상부에 섬모양으로 형성되며 상기 게이트 전극 안에 완전히 포함되는 드레인 전극과;상기 소스 및 드레인 전극 상부에 형성되며 상기 드레인 전극을 노출하는 콘택홀을 갖는 제 2 절연막과;상기 제 2 절연막 상부에 형성되며 드레인 전극과 연결되는 화소 전극을 포함하는 액정 표시 장치용 박막 트랜지스터.
- 제 1 항에 있어서,상기 화소 전극에서 연장되고 상기 드레인 전극을 덮는 화소 전극 연장부를 더욱 포함하는 것을 특징으로 하는 액정 표시 장치용 박막 트랜지스터.
- 제 2 항에 있어서,상기 화소 전극 연장부는 상기 콘택홀을 통하여 상기 드레인 전극에 연결됨을 특징으로 하는 액정 표시 장치용 박막 트랜지스터.
- 제 3 항에 있어서,상기 소스 전극은 개구부를 가지는 것을 특징으로 하는 액정 표시 장치용 박막 트랜지스터.
- 제 4 항에 있어서,상기 화소 전극 연장부는 상기 개구부에 형성됨을 특징으로 하는 액정 표시 장치용 박막 트랜지스터.
- 제 1 항에 있어서,상기 활성층과 소스 및 드레인 전극 사이에 오믹 콘택층을 더욱 포함하는 것을 특징으로 하는 액정 표시 장치용 박막 트랜지스터.
- 서로 대향하며 일정 간격 이격된 제 1 및 제 2 기판과;상기 제 1 기판의 안쪽 면에 형성되는 게이트 전극과;상기 게이트 전극 상부에 형성되는 제 1 절연막과;상기 게이트 전극에 대응되며 상기 제 1 절연막 상부에 형성되는 활성층과;상기 활성층 상부에 상기 활성층의 가장자리와 중첩되도록 형성되는 소스 전극과;상기 활성층 상부에 섬모양으로 형성되며 상기 게이트 전극 안에 완전히 포함되는 드레인 전극과;상기 소스 및 드레인 전극 상부에 형성되며 상기 드레인 전극을 노출하는 콘택홀을 갖는 제 2 절연막과;상기 제 2 절연막 상부에 형성되며 드레인 전극과 연결되는 화소 전극과;상기 제 2 기판의 안쪽 면에 형성되는 블랙 매트릭스와;상기 블랙 매트릭스 상부에 형성되는 컬러 필터와;상기 컬러 필터 상부에 형성되는 공통 전극과;상기 화소 전극과 공통 전극 사이에 삽입되어 있는 액정층을 포함하는 액정 표시 장치.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020083881A KR100887997B1 (ko) | 2002-12-26 | 2002-12-26 | 기생 용량 편차가 최소화된 액정 표시 장치용 박막트랜지스터 |
US10/737,925 US7268839B2 (en) | 2002-12-26 | 2003-12-18 | Array substrate comprising an island shaped drain electrode enclosed by the source electrode and liquid crystal display device including the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020020083881A KR100887997B1 (ko) | 2002-12-26 | 2002-12-26 | 기생 용량 편차가 최소화된 액정 표시 장치용 박막트랜지스터 |
Publications (2)
Publication Number | Publication Date |
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KR20040057250A true KR20040057250A (ko) | 2004-07-02 |
KR100887997B1 KR100887997B1 (ko) | 2009-03-09 |
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KR1020020083881A KR100887997B1 (ko) | 2002-12-26 | 2002-12-26 | 기생 용량 편차가 최소화된 액정 표시 장치용 박막트랜지스터 |
Country Status (2)
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US (1) | US7268839B2 (ko) |
KR (1) | KR100887997B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8884303B2 (en) | 2009-11-30 | 2014-11-11 | Samsung Display Co., Ltd. | TFT substrate including a data insulating layer with contact hole overlapping channel region |
CN107885000A (zh) * | 2016-09-30 | 2018-04-06 | 三星显示有限公司 | 液晶显示装置 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006154168A (ja) * | 2004-11-29 | 2006-06-15 | Seiko Epson Corp | アクティブマトリクス基板、電気光学装置、電子デバイス、及びアクティブマトリクス基板の製造方法 |
KR101137843B1 (ko) * | 2005-06-15 | 2012-04-20 | 엘지디스플레이 주식회사 | 백라이트 유닛과 이를 이용한 액정표시장치 |
KR101202530B1 (ko) * | 2005-12-27 | 2012-11-16 | 엘지디스플레이 주식회사 | 액정표시패널 및 그 제조방법 |
KR20090061112A (ko) * | 2007-12-11 | 2009-06-16 | 삼성전자주식회사 | 박막 트랜지스터 및 이를 구비하는 액정 표시 장치 |
KR101626899B1 (ko) * | 2009-04-21 | 2016-06-03 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 이의 제조 방법 |
KR101605467B1 (ko) | 2009-10-16 | 2016-04-04 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 |
JP2011175032A (ja) * | 2010-02-23 | 2011-09-08 | Hitachi Displays Ltd | 表示装置 |
KR101758783B1 (ko) * | 2010-12-27 | 2017-07-18 | 삼성디스플레이 주식회사 | 게이트 구동부, 이를 포함하는 표시 기판 및 이 표시 기판의 제조 방법 |
KR101987042B1 (ko) * | 2012-11-19 | 2019-06-10 | 엘지디스플레이 주식회사 | 박막 트랜지스터 기판 |
CN103178119B (zh) * | 2013-03-25 | 2015-07-29 | 京东方科技集团股份有限公司 | 阵列基板、阵列基板制备方法以及显示装置 |
CN104299972B (zh) * | 2014-09-12 | 2018-07-27 | 深圳市华星光电技术有限公司 | 薄膜晶体管阵列基板及其制造方法、液晶显示器 |
KR20160039725A (ko) * | 2014-10-01 | 2016-04-12 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 |
CN204406009U (zh) * | 2015-03-09 | 2015-06-17 | 京东方科技集团股份有限公司 | 阵列基板和显示装置 |
CN104716196B (zh) * | 2015-03-18 | 2017-08-08 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制作方法、阵列基板及显示装置 |
CN106684125B (zh) * | 2015-11-05 | 2020-05-08 | 群创光电股份有限公司 | 显示设备 |
CN205067935U (zh) * | 2015-11-05 | 2016-03-02 | 京东方科技集团股份有限公司 | 一种阵列基板及显示装置 |
CN109659314B (zh) * | 2018-11-20 | 2021-01-15 | 深圳市华星光电技术有限公司 | 阵列基板及其制作方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62166560A (ja) * | 1986-01-18 | 1987-07-23 | Sharp Corp | 薄膜トランジスタ |
JP2620240B2 (ja) * | 1987-06-10 | 1997-06-11 | 株式会社日立製作所 | 液晶表示装置 |
US5032883A (en) * | 1987-09-09 | 1991-07-16 | Casio Computer Co., Ltd. | Thin film transistor and method of manufacturing the same |
US5414283A (en) * | 1993-11-19 | 1995-05-09 | Ois Optical Imaging Systems, Inc. | TFT with reduced parasitic capacitance |
US5668649A (en) * | 1994-03-07 | 1997-09-16 | Hitachi, Ltd. | Structure of liquid crystal display device for antireflection |
TW344043B (en) * | 1994-10-21 | 1998-11-01 | Hitachi Ltd | Liquid crystal display device with reduced frame portion surrounding display area |
US5641974A (en) * | 1995-06-06 | 1997-06-24 | Ois Optical Imaging Systems, Inc. | LCD with bus lines overlapped by pixel electrodes and photo-imageable insulating layer therebetween |
TW373114B (en) * | 1996-08-05 | 1999-11-01 | Sharp Kk | Liquid crystal display device |
JP3233146B2 (ja) | 1996-08-23 | 2001-11-26 | セイコーエプソン株式会社 | 表示素子及びそれを用いた電子機器 |
JP3687384B2 (ja) | 1998-12-25 | 2005-08-24 | セイコーエプソン株式会社 | 液晶表示装置およびそれを用いた電子機器 |
JP3415602B2 (ja) * | 2000-06-26 | 2003-06-09 | 鹿児島日本電気株式会社 | パターン形成方法 |
JP4211250B2 (ja) * | 2000-10-12 | 2009-01-21 | セイコーエプソン株式会社 | トランジスタ及びそれを備える表示装置 |
KR20020042898A (ko) * | 2000-12-01 | 2002-06-08 | 구본준, 론 위라하디락사 | 액정표시장치용 어레이기판과 그 제조방법 |
KR20030057175A (ko) * | 2001-12-28 | 2003-07-04 | 동부전자 주식회사 | 웨이퍼의 후면 세정장치 |
-
2002
- 2002-12-26 KR KR1020020083881A patent/KR100887997B1/ko active IP Right Grant
-
2003
- 2003-12-18 US US10/737,925 patent/US7268839B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8884303B2 (en) | 2009-11-30 | 2014-11-11 | Samsung Display Co., Ltd. | TFT substrate including a data insulating layer with contact hole overlapping channel region |
CN107885000A (zh) * | 2016-09-30 | 2018-04-06 | 三星显示有限公司 | 液晶显示装置 |
CN107885000B (zh) * | 2016-09-30 | 2022-07-12 | 三星显示有限公司 | 液晶显示装置 |
Also Published As
Publication number | Publication date |
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US20040125262A1 (en) | 2004-07-01 |
KR100887997B1 (ko) | 2009-03-09 |
US7268839B2 (en) | 2007-09-11 |
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