KR20030036948A - 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물 - Google Patents

포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물 Download PDF

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Publication number
KR20030036948A
KR20030036948A KR1020010067898A KR20010067898A KR20030036948A KR 20030036948 A KR20030036948 A KR 20030036948A KR 1020010067898 A KR1020010067898 A KR 1020010067898A KR 20010067898 A KR20010067898 A KR 20010067898A KR 20030036948 A KR20030036948 A KR 20030036948A
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KR
South Korea
Prior art keywords
alkyl group
carbon atoms
formula
norbornene
linear
Prior art date
Application number
KR1020010067898A
Other languages
English (en)
Korean (ko)
Inventor
한은실
문봉석
신중한
한욱
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR1020010067898A priority Critical patent/KR20030036948A/ko
Priority to TW091104789A priority patent/TW593367B/zh
Priority to US10/246,474 priority patent/US6753127B2/en
Priority to JP2002307209A priority patent/JP2003183327A/ja
Publication of KR20030036948A publication Critical patent/KR20030036948A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/455—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation with carboxylic acids or their derivatives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/20—Unsaturated compounds containing keto groups bound to acyclic carbon atoms
    • C07C49/255—Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/527—Unsaturated compounds containing keto groups bound to rings other than six-membered aromatic rings
    • C07C49/553—Unsaturated compounds containing keto groups bound to rings other than six-membered aromatic rings polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/527—Unsaturated compounds containing keto groups bound to rings other than six-membered aromatic rings
    • C07C49/577—Unsaturated compounds containing keto groups bound to rings other than six-membered aromatic rings containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F32/08—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having two condensed rings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
KR1020010067898A 2001-11-01 2001-11-01 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물 KR20030036948A (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020010067898A KR20030036948A (ko) 2001-11-01 2001-11-01 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물
TW091104789A TW593367B (en) 2001-11-01 2002-03-13 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same
US10/246,474 US6753127B2 (en) 2001-11-01 2002-09-19 Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same
JP2002307209A JP2003183327A (ja) 2001-11-01 2002-10-22 フォトレジスト用ノルボルネン系共重合体およびその製造方法、並びにこれを含むフォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020010067898A KR20030036948A (ko) 2001-11-01 2001-11-01 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물

Publications (1)

Publication Number Publication Date
KR20030036948A true KR20030036948A (ko) 2003-05-12

Family

ID=19715611

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010067898A KR20030036948A (ko) 2001-11-01 2001-11-01 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물

Country Status (4)

Country Link
US (1) US6753127B2 (ja)
JP (1) JP2003183327A (ja)
KR (1) KR20030036948A (ja)
TW (1) TW593367B (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778405B1 (ko) * 2001-11-16 2007-11-27 삼성에스디아이 주식회사 화학증폭형 네가티브 포토레지스트용 단량체, 중합체 및포토레지스트 수지 조성물
KR101059778B1 (ko) * 2004-10-21 2011-08-26 재단법인서울대학교산학협력재단 유기 용매에 대한 용해도가 우수한 저유전성 노보넨계공중합체
US10047183B2 (en) 2013-09-30 2018-08-14 Lg Chem, Ltd. Photoreactive copolymer and alignment layer comprising the same

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3956089B2 (ja) * 2000-08-08 2007-08-08 信越化学工業株式会社 アセタール化合物及びその製造方法
KR100497091B1 (ko) * 2000-10-02 2005-06-27 신에쓰 가가꾸 고교 가부시끼가이샤 환상 아세탈 화합물, 고분자 화합물, 레지스트 재료 및패턴 형성 방법
KR20030036948A (ko) * 2001-11-01 2003-05-12 삼성전자주식회사 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물
JP5430066B2 (ja) * 2004-07-07 2014-02-26 プロメラス， エルエルシー 絶縁樹脂組成物及びその使用
KR100789247B1 (ko) * 2005-01-05 2008-01-02 주식회사 엘지화학 광반응성 중합체 및 이의 제조 방법
US7291689B1 (en) * 2006-05-01 2007-11-06 Seoul National University Industry Foundation Thermally stable low dielectric norbornene polymers with improved solubility and adhesion property
US9328179B2 (en) * 2013-05-23 2016-05-03 Promerus, Llc Water soluble norbornene-type polymers and photoimageable compositions thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW591329B (en) * 2001-04-21 2004-06-11 Samsung Electronics Co Ltd Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same
KR20030036948A (ko) * 2001-11-01 2003-05-12 삼성전자주식회사 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물
US6911293B2 (en) * 2002-04-11 2005-06-28 Clariant Finance (Bvi) Limited Photoresist compositions comprising acetals and ketals as solvents

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778405B1 (ko) * 2001-11-16 2007-11-27 삼성에스디아이 주식회사 화학증폭형 네가티브 포토레지스트용 단량체, 중합체 및포토레지스트 수지 조성물
KR101059778B1 (ko) * 2004-10-21 2011-08-26 재단법인서울대학교산학협력재단 유기 용매에 대한 용해도가 우수한 저유전성 노보넨계공중합체
US10047183B2 (en) 2013-09-30 2018-08-14 Lg Chem, Ltd. Photoreactive copolymer and alignment layer comprising the same

Also Published As

Publication number Publication date
US6753127B2 (en) 2004-06-22
TW593367B (en) 2004-06-21
US20030118933A1 (en) 2003-06-26
JP2003183327A (ja) 2003-07-03

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