KR20020033173A - 용량성 압력 센서용 배플 - Google Patents

용량성 압력 센서용 배플 Download PDF

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Publication number
KR20020033173A
KR20020033173A KR1020027003157A KR20027003157A KR20020033173A KR 20020033173 A KR20020033173 A KR 20020033173A KR 1020027003157 A KR1020027003157 A KR 1020027003157A KR 20027003157 A KR20027003157 A KR 20027003157A KR 20020033173 A KR20020033173 A KR 20020033173A
Authority
KR
South Korea
Prior art keywords
baffle
sensor
diaphragm
inlet
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020027003157A
Other languages
English (en)
Korean (ko)
Inventor
폴린제임스
힌클루크디
그루지엔크리스피
Original Assignee
로버트 에프 오브리엔
엠케이에스 인스트루먼츠 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 로버트 에프 오브리엔, 엠케이에스 인스트루먼츠 인코포레이티드 filed Critical 로버트 에프 오브리엔
Publication of KR20020033173A publication Critical patent/KR20020033173A/ko
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/06Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/06Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
    • G01L19/0627Protection against aggressive medium in general
    • G01L19/0636Protection against aggressive medium in general using particle filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measuring Fluid Pressure (AREA)
KR1020027003157A 1999-09-10 2000-09-08 용량성 압력 센서용 배플 Ceased KR20020033173A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/394,804 1999-09-10
US09/394,804 US6443015B1 (en) 1999-09-10 1999-09-10 Baffle for a capacitive pressure sensor
PCT/US2000/024862 WO2001018516A1 (en) 1999-09-10 2000-09-08 Baffle for a capacitive pressure sensor

Publications (1)

Publication Number Publication Date
KR20020033173A true KR20020033173A (ko) 2002-05-04

Family

ID=23560493

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027003157A Ceased KR20020033173A (ko) 1999-09-10 2000-09-08 용량성 압력 센서용 배플

Country Status (7)

Country Link
US (1) US6443015B1 (enExample)
EP (2) EP1340971B1 (enExample)
JP (2) JP2003508780A (enExample)
KR (1) KR20020033173A (enExample)
DE (2) DE60017954T2 (enExample)
TW (1) TW463039B (enExample)
WO (1) WO2001018516A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101522105B1 (ko) * 2012-11-30 2015-05-20 아즈빌주식회사 정전 용량형 압력 센서
KR101529791B1 (ko) * 2012-12-27 2015-06-17 아즈빌주식회사 정전 용량형 압력 센서
KR101539177B1 (ko) * 2013-08-09 2015-07-23 아즈빌주식회사 정전 용량형 압력 센서

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040099061A1 (en) 1997-12-22 2004-05-27 Mks Instruments Pressure sensor for detecting small pressure differences and low pressures
US6901808B1 (en) * 2002-02-12 2005-06-07 Lam Research Corporation Capacitive manometer having reduced process drift
US7252011B2 (en) * 2002-03-11 2007-08-07 Mks Instruments, Inc. Surface area deposition trap
US6993973B2 (en) * 2003-05-16 2006-02-07 Mks Instruments, Inc. Contaminant deposition control baffle for a capacitive pressure transducer
JP4177294B2 (ja) * 2004-06-07 2008-11-05 三菱電機株式会社 圧力センサ装置
US7201057B2 (en) 2004-09-30 2007-04-10 Mks Instruments, Inc. High-temperature reduced size manometer
US7137301B2 (en) 2004-10-07 2006-11-21 Mks Instruments, Inc. Method and apparatus for forming a reference pressure within a chamber of a capacitance sensor
US7141447B2 (en) 2004-10-07 2006-11-28 Mks Instruments, Inc. Method of forming a seal between a housing and a diaphragm of a capacitance sensor
US7204150B2 (en) 2005-01-14 2007-04-17 Mks Instruments, Inc. Turbo sump for use with capacitive pressure sensor
DE102008025045A1 (de) * 2007-06-02 2008-12-04 Marquardt Gmbh Sensor
CN105758579B (zh) 2011-10-11 2019-06-11 Mks 仪器公司 压力传感器
US10107315B2 (en) * 2013-04-30 2018-10-23 Mks Instruments, Inc. MEMS pressure sensors with integrated baffles
US9430925B2 (en) * 2014-09-05 2016-08-30 Google Inc. Detector unit and sensing chamber therefor with matter retention member and method for making same
EP3109612A1 (en) 2015-06-26 2016-12-28 Nina Wojtas Mems deposition trap for vacuum transducer protection
JP6669553B2 (ja) * 2016-03-29 2020-03-18 ローム株式会社 電子部品
JP6815221B2 (ja) * 2017-02-17 2021-01-20 アズビル株式会社 静電容量型圧力センサ
JP6985071B2 (ja) * 2017-09-05 2021-12-22 アズビル株式会社 異常検知方法および異常検知装置
EP3737926B1 (de) * 2018-01-09 2022-11-16 Kistler Holding AG Schutzvorrichtung
JP7085898B2 (ja) * 2018-05-25 2022-06-17 東京エレクトロン株式会社 ラジカル失活部品及びこれを用いたプラズマ処理装置
JP2020030066A (ja) 2018-08-21 2020-02-27 アズビル株式会社 圧力センサ
JP2021025957A (ja) 2019-08-08 2021-02-22 アズビル株式会社 圧力センサ
JP7444628B2 (ja) 2020-02-19 2024-03-06 アズビル株式会社 圧力センサ
US11287342B2 (en) * 2020-03-20 2022-03-29 Mks Instruments, Inc. Capacitance manometer with improved baffle for improved detection accuracy
CN114264403A (zh) * 2021-12-03 2022-04-01 北京晨晶精仪电子有限公司 真空规颗粒阻挡结构
CN117928814A (zh) * 2024-01-24 2024-04-26 阿尔法仪器技术(深圳)有限公司 一种新型的微差压传感器芯体

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3675072A (en) * 1971-01-28 1972-07-04 Atomic Energy Commission Fast-closing valve system for cyclotrons
US4020674A (en) * 1976-05-19 1977-05-03 Harry Robert Fechter Pipeline leak detector with baffles
JPS58101155U (ja) * 1981-12-29 1983-07-09 株式会社大阪真空機器製作所 真空計用ダストトラツプ
JPH0812123B2 (ja) * 1987-11-27 1996-02-07 日本碍子株式会社 圧力センサ
JPH0311583A (ja) * 1989-06-08 1991-01-18 Showa Kogyo Kk 面状発熱体およびその製造法
US5271277A (en) * 1991-12-23 1993-12-21 The Boc Group, Inc. Capacitance pressure transducer
JP3011583U (ja) * 1994-11-25 1995-05-30 エヌテーシー工業株式会社 半導体圧力センサを用いた水位検出器
US5808206A (en) * 1996-01-16 1998-09-15 Mks Instruments, Inc. Heated pressure transducer assembly
US5811685A (en) * 1996-12-11 1998-09-22 Mks Instruments, Inc. Fluid pressure sensor with contaminant exclusion system
JPH11201847A (ja) * 1998-01-19 1999-07-30 Fuji Electric Co Ltd 静電容量式圧力センサ
US5948169A (en) 1998-03-11 1999-09-07 Vanguard International Semiconductor Corporation Apparatus for preventing particle deposition in a capacitance diaphragm gauge

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101522105B1 (ko) * 2012-11-30 2015-05-20 아즈빌주식회사 정전 용량형 압력 센서
KR101529791B1 (ko) * 2012-12-27 2015-06-17 아즈빌주식회사 정전 용량형 압력 센서
US9228913B2 (en) 2012-12-27 2016-01-05 Azbil Corporation Electrostatic pressure sensor
KR101539177B1 (ko) * 2013-08-09 2015-07-23 아즈빌주식회사 정전 용량형 압력 센서

Also Published As

Publication number Publication date
EP1340971B1 (en) 2005-02-02
EP1214573A1 (en) 2002-06-19
US6443015B1 (en) 2002-09-03
EP1214573B1 (en) 2004-01-21
JP2011149946A (ja) 2011-08-04
DE60007884T2 (de) 2004-12-16
WO2001018516A1 (en) 2001-03-15
DE60007884D1 (de) 2004-02-26
DE60017954D1 (de) 2005-03-10
JP2003508780A (ja) 2003-03-04
EP1340971A2 (en) 2003-09-03
TW463039B (en) 2001-11-11
DE60017954T2 (de) 2006-01-12
JP5453335B2 (ja) 2014-03-26
EP1340971A3 (en) 2003-10-01

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PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000