KR20020025859A - 유기 이엘소자 및 유기 이엘소자의 제조방법 - Google Patents
유기 이엘소자 및 유기 이엘소자의 제조방법 Download PDFInfo
- Publication number
- KR20020025859A KR20020025859A KR1020017011632A KR20017011632A KR20020025859A KR 20020025859 A KR20020025859 A KR 20020025859A KR 1020017011632 A KR1020017011632 A KR 1020017011632A KR 20017011632 A KR20017011632 A KR 20017011632A KR 20020025859 A KR20020025859 A KR 20020025859A
- Authority
- KR
- South Korea
- Prior art keywords
- organic
- light emitting
- hole injection
- ink composition
- transport layer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 238000002347 injection Methods 0.000 claims abstract description 59
- 239000007924 injection Substances 0.000 claims abstract description 59
- 239000000203 mixture Substances 0.000 claims abstract description 54
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000010408 film Substances 0.000 description 29
- 239000000463 material Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000009832 plasma treatment Methods 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 150000002220 fluorenes Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000002940 repellent Effects 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229920000285 Polydioctylfluorene Polymers 0.000 description 1
- 125000002490 anilino group Chemical class [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- -1 polyparaphenylene vinylene Chemical class 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
Abstract
Description
Claims (5)
- 잉크젯방식에 의해 적어도 2층 이상의 적층막을 형성하여 이루어지고, 정공주입/수송층 및 발광층을 포함하는 구조를 갖는 유기 이엘 소자에 있어서,해당 발광층의 제막영역이 해당 정공주입/수송층의 제막영역과 같거나 또는 그 이상인 것을 특징으로 하는 유기 이엘 소자(Organic Electro-Luminescence Device).
- 잉크젯방식에 의해 적어도 2층 이상의 적층막을 형성하여 이루어지고, 정공주입/수송층 및 발광층을 포함하는 구조를 갖는 유기 이엘 소자의 제조방법에 있어서,해당 정공주입/수송층을 형성할 때의 잉크 조성물의 토출량을 A, 해당 발광층을 형성할 때의 잉크 조성물의 토출량을 B로 한 경우, A≤B가 되는 관계를 만족시키는 것을 특징으로 하는 유기 이엘 소자의 제조방법.
- 제 2항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 유기 이엘 소자.
- 잉크젯방식에 의해 적어도 2층 이상의 적층막을 형성하여 이루어지고, 정공주입/수송층 및 발광층을 포함하는 구조를 갖는 유기 이엘 소자의 제조방법에 있어서,해당 정공주입/수송층을 형성할 때의 잉크 조성물의 토출량의 합계를 A, 해당 발광층을 형성할 때의 잉크 조성물의 토출량의 합계를 B로 한 경우, A≤B가 되는 관계를 만족시키는 것을 특징으로 하는 유기 이엘 소자의 제조방법.
- 제 4항에 기재된 방법에 의해 제조되는 것을 특징으로 하는 유기 이엘 소자.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000098160 | 2000-03-31 | ||
JPJP-P-2000-00098160 | 2000-03-31 | ||
PCT/JP2001/002794 WO2001074121A1 (fr) | 2000-03-31 | 2001-03-30 | Dispositif electroluminescent organique et procede de fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020025859A true KR20020025859A (ko) | 2002-04-04 |
KR100436303B1 KR100436303B1 (ko) | 2004-06-19 |
Family
ID=18612676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-7011632A KR100436303B1 (ko) | 2000-03-31 | 2001-03-30 | 유기 이엘소자 및 유기 이엘소자의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US6852994B2 (ko) |
KR (1) | KR100436303B1 (ko) |
CN (1) | CN100444698C (ko) |
TW (1) | TW512646B (ko) |
WO (1) | WO2001074121A1 (ko) |
Families Citing this family (37)
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SG143946A1 (en) | 2001-02-19 | 2008-07-29 | Semiconductor Energy Lab | Light emitting device and method of manufacturing the same |
JP2005135929A (ja) * | 2001-02-19 | 2005-05-26 | Semiconductor Energy Lab Co Ltd | 発光装置の作製方法 |
KR100507963B1 (ko) * | 2001-06-01 | 2005-08-18 | 세이코 엡슨 가부시키가이샤 | 컬러 필터 및 전기 광학 장치 |
JP2003249377A (ja) * | 2001-12-18 | 2003-09-05 | Seiko Epson Corp | 表示装置及び電子機器並びに表示装置の製造方法 |
JP3705264B2 (ja) | 2001-12-18 | 2005-10-12 | セイコーエプソン株式会社 | 表示装置及び電子機器 |
JP5304417B2 (ja) * | 2001-12-18 | 2013-10-02 | セイコーエプソン株式会社 | 表示装置 |
JP3823916B2 (ja) * | 2001-12-18 | 2006-09-20 | セイコーエプソン株式会社 | 表示装置及び電子機器並びに表示装置の製造方法 |
US6810919B2 (en) * | 2002-01-11 | 2004-11-02 | Seiko Epson Corporation | Manufacturing method for display device, display device, manufacturing method for electronic apparatus, and electronic apparatus |
JP4066661B2 (ja) * | 2002-01-23 | 2008-03-26 | セイコーエプソン株式会社 | 有機el装置の製造装置および液滴吐出装置 |
EP1343206B1 (en) | 2002-03-07 | 2016-10-26 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting apparatus, electronic apparatus, illuminating device and method of fabricating the light emitting apparatus |
JP4170700B2 (ja) * | 2002-07-31 | 2008-10-22 | 大日本印刷株式会社 | エレクトロルミネッセンス表示装置および製造方法 |
JP4425531B2 (ja) * | 2002-08-21 | 2010-03-03 | 富士通株式会社 | 有機el装置及びその製造方法 |
EP1553809B1 (en) * | 2002-09-24 | 2011-11-09 | Sharp Kabushiki Kaisha | Method and apparatus for manufacturing active-matrix organic el display, active-matrix organic el display, method for manufacturing liquid crystal array, liquid crystal array, method and apparatus for manufacturing color filter substrate, and color filter substrate |
US20040096570A1 (en) * | 2002-11-15 | 2004-05-20 | Michael Weaver | Structure and method of fabricating organic devices |
US6982179B2 (en) * | 2002-11-15 | 2006-01-03 | University Display Corporation | Structure and method of fabricating organic devices |
US6891326B2 (en) * | 2002-11-15 | 2005-05-10 | Universal Display Corporation | Structure and method of fabricating organic devices |
JP2005019955A (ja) * | 2003-05-30 | 2005-01-20 | Seiko Epson Corp | 薄膜パターンの形成方法及びデバイスの製造方法、電気光学装置及び電子機器 |
GB0320491D0 (en) * | 2003-09-02 | 2003-10-01 | Plastic Logic Ltd | Multi-level patterning |
JP4175273B2 (ja) | 2004-03-03 | 2008-11-05 | セイコーエプソン株式会社 | 積層型有機エレクトロルミネッセンス素子の製造方法及び表示装置 |
JP4168968B2 (ja) * | 2004-04-26 | 2008-10-22 | セイコーエプソン株式会社 | 有機el装置の製造方法 |
JP4312704B2 (ja) * | 2004-12-24 | 2009-08-12 | 株式会社半導体エネルギー研究所 | 発光装置 |
US20060214577A1 (en) * | 2005-03-26 | 2006-09-28 | Lorraine Byrne | Depositing of powdered luminescent material onto substrate of electroluminescent lamp |
JP2008192311A (ja) * | 2005-05-16 | 2008-08-21 | Sharp Corp | 有機エレクトロルミネッセンス素子の製造方法 |
JP4706845B2 (ja) * | 2006-02-15 | 2011-06-22 | 凸版印刷株式会社 | 有機el素子の製造方法 |
WO2007113935A1 (ja) * | 2006-04-05 | 2007-10-11 | Sharp Kabushiki Kaisha | 有機エレクトロルミネッセンス表示装置及びその製造方法 |
KR101325577B1 (ko) * | 2006-04-28 | 2013-11-06 | 삼성디스플레이 주식회사 | 유기전계 발광소자 및 그 제조방법 |
WO2009041158A1 (ja) * | 2007-09-28 | 2009-04-02 | Sharp Kabushiki Kaisha | 有機エレクトロルミネッセンス表示装置及びその製造方法 |
US20090130296A1 (en) * | 2007-11-15 | 2009-05-21 | Universal Display Corporation | Fabrication of Organic Electronic Devices by Ink-Jet Printing at Low Temperatures |
JP2010108674A (ja) * | 2008-10-29 | 2010-05-13 | Hitachi Displays Ltd | 有機エレクトロルミネッセンス表示装置及びその製造方法 |
JP5618524B2 (ja) | 2009-11-18 | 2014-11-05 | 公益財団法人九州先端科学技術研究所 | デバイス、薄膜トランジスタおよびその製造方法 |
US8288187B2 (en) * | 2010-01-20 | 2012-10-16 | Universal Display Corporation | Electroluminescent devices for lighting applications |
US9070905B2 (en) * | 2012-08-23 | 2015-06-30 | Joled Inc. | Organic electronic device manufacturing method and organic EL device manufacturing method |
KR102009357B1 (ko) * | 2012-11-26 | 2019-08-09 | 엘지디스플레이 주식회사 | 유기전계 발광소자 및 이의 제조 방법 |
KR20140127688A (ko) * | 2013-04-25 | 2014-11-04 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 이의 제조 방법 |
CN103474584B (zh) * | 2013-09-29 | 2016-01-06 | 京东方科技集团股份有限公司 | 有机电致发光器件及其制备方法、显示装置 |
KR102489836B1 (ko) * | 2015-06-30 | 2023-01-18 | 엘지디스플레이 주식회사 | 유기전계발광표시장치 |
KR20180077439A (ko) | 2016-12-29 | 2018-07-09 | 엘지디스플레이 주식회사 | 전계 발광 표시 장치 및 그 제조 방법 |
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US6013538A (en) * | 1997-11-24 | 2000-01-11 | The Trustees Of Princeton University | Method of fabricating and patterning OLEDs |
JP3812144B2 (ja) | 1998-05-26 | 2006-08-23 | セイコーエプソン株式会社 | 発光ディスプレイの製造方法 |
WO2000018193A1 (fr) | 1998-09-17 | 2000-03-30 | Seiko Epson Corporation | Procede de fabrication d'un dispositif a electroluminescence |
US6384529B2 (en) * | 1998-11-18 | 2002-05-07 | Eastman Kodak Company | Full color active matrix organic electroluminescent display panel having an integrated shadow mask |
US6114088A (en) * | 1999-01-15 | 2000-09-05 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
US6372154B1 (en) * | 1999-12-30 | 2002-04-16 | Canon Kabushiki Kaisha | Luminescent ink for printing of organic luminescent devices |
-
2001
- 2001-03-30 WO PCT/JP2001/002794 patent/WO2001074121A1/ja active IP Right Grant
- 2001-03-30 KR KR10-2001-7011632A patent/KR100436303B1/ko active IP Right Grant
- 2001-03-30 US US09/820,728 patent/US6852994B2/en not_active Expired - Lifetime
- 2001-03-30 CN CNB018007406A patent/CN100444698C/zh not_active Expired - Lifetime
- 2001-03-30 TW TW090107774A patent/TW512646B/zh not_active IP Right Cessation
-
2005
- 2005-01-06 US US11/029,359 patent/US7390693B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6852994B2 (en) | 2005-02-08 |
US20050118328A1 (en) | 2005-06-02 |
US20020067123A1 (en) | 2002-06-06 |
CN100444698C (zh) | 2008-12-17 |
WO2001074121A1 (fr) | 2001-10-04 |
KR100436303B1 (ko) | 2004-06-19 |
CN1366789A (zh) | 2002-08-28 |
US7390693B2 (en) | 2008-06-24 |
TW512646B (en) | 2002-12-01 |
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