KR20010001596A - 웨이퍼로부터 반도체패키지용 반도체칩의 가공방법과 이를 이용한 반도체패키지 및 그 제조방법 - Google Patents
웨이퍼로부터 반도체패키지용 반도체칩의 가공방법과 이를 이용한 반도체패키지 및 그 제조방법 Download PDFInfo
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- KR20010001596A KR20010001596A KR1019990020937A KR19990020937A KR20010001596A KR 20010001596 A KR20010001596 A KR 20010001596A KR 1019990020937 A KR1019990020937 A KR 1019990020937A KR 19990020937 A KR19990020937 A KR 19990020937A KR 20010001596 A KR20010001596 A KR 20010001596A
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/27—Manufacturing methods
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83191—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (9)
- 일면에 패턴층이 형성된 다수의 반도체칩이 스트릿라인으로 구분되어 있는 웨이퍼를 제공하는 단계와;상기 웨이퍼의 패턴층이 형성되지 않은 면에 접착층을 접착하는 단계와;상기 웨이퍼의 접착층을 마운트테이프 상에 접착하는 단계와;상기 웨이퍼의 스트릿라인을 따라서 각각의 반도체칩을 통과하여 접착층까지 일체로 소잉하는 단계와;상기 접착층이 접착된 상태로 반도체칩을 픽업하는 단계를 포함하여 이루어진 것을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제1항에 있어서, 상기 접착층 접착 단계에서 이용된 접착층은 웨이퍼와 접하는 면의 반대면에 커버테이프가 더 접착된 것을 이용함을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제2항에 있어서, 상기 소잉 단계는 접착층에 부착된 커버테이프 일부 영역까지 소잉함을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제1항에 있어서, 상기 소잉 단계는 접착층에 부착된 마운트테이프 일부 영역까지 소잉함을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제2항 또는 제3항중 어느 한 항에 있어서, 마운트테이프와 커버테이프 사이의 접착 강도는 상기 커버테이프와 접착층 사이의 접착강도보다 큰 마운트테이프를 이용함을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제1항 또는 제4항중 어느 한 항에 있어서, 웨이퍼와 접착층 사이의 접착 강도는 상기 접착층과 마운트테이프와의 접착강도보다 큰 마운트테이프를 이용함을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 제1항에 있어서, 상기 웨이퍼 제공 단계 후,웨이퍼의 스트릿라인을 따라 패턴층의 두께보다 깊게 요홈을 형성하는 단계와;상기 웨이퍼의 패턴층이 형성된 면에 커버레이테이프를 접착하는 단계와;상기 웨이퍼의 패턴층이 형성되지 않은 면을 상기 요홈이 형성된 면까지 그라인딩하는 단계와;상기 웨이퍼의 그라인딩된 면에 접착층을 접착하는 단계와;상기 웨이퍼의 패턴층이 형성된 면에 접착된 커버레이테이프를 제거하는 단계를 더 포함하여 이루어진 것을 특징으로 하는 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법.
- 상면에 다수의 입출력패드를 갖는 제1반도체칩과;상기 제1반도체칩의 상면에 접착테이프에 의해 접착되며 상면에 다수의 입출력패드를 갖는 제2반도체칩과;상기 제1반도체칩의 저면에 접착제에 의해 접착되어 있으며, 수지층을 중심으로, 상,하면에는 본드핑거 및 볼랜드를 포함하는 도전성 회로패턴이 형성되어 있고, 상기 본드핑거 및 볼랜드가 개방되도록 커버코오트가 코팅된 인쇄회로기판과;상기 제1반도체칩 및 제2반도체칩의 입출력패드를 인쇄회로기판의 본드핑거에 전기적으로 접속하는 도전성와이어와;상기 제1반도체칩, 제2반도체칩, 도전성와이어 및 인쇄회로기판의 본드핑거 등을 외부 환경으로부터 보호하기 위해 그 상면을 봉지하는 봉지재와;상기 인쇄회로기판의 볼랜드에 융착되어 제1반도체칩 및 제2반도체칩의 신호를 외부로 입출력시키는 도전성볼을 포함하여 이루어진 반도체패키지.
- 수지층을 중심으로, 상,하면에는 본드핑거 및 볼랜드를 포함하는 도전성 회로패턴이 형성되어 있고, 상기 본드핑거 및 볼랜드가 개방되도록 커버코오트가 코팅된 인쇄회로기판을 제공하는 단계와;상기 인쇄회로기판의 상부 중앙에 접착제를 개재하여 다수의 입출력패드를 갖는 제1반도체칩을 접착하는 단계와;상기 제1반도체칩의 상면에, 미리 저면에 접착테이프가 접착되어 있으며 상면에는 다수의 입출력패드를 갖는 제2반도체칩을 접착하는 단계와;상기 제1반도체칩 및 제2반도체칩을 인쇄회로기판의 본드핑거에 도전성 와이어를 이용하여 전기적으로 접속하는 전기적 접속 단계와;상기 제1반도체칩, 제2반도체칩, 도전성 와이어 및 인쇄회로기판의 본드핑거 등을 외부 환경으로부터 보호하기 위해 봉지재로 봉지하는 단계와;상기 인쇄회로기판의 볼랜드에 도전성볼을 융착하여 최종 입출력단자를 형성하는 단계를 포함하여 이루어진 반도체패키지의 제조 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR10-1999-0020937A KR100384333B1 (ko) | 1999-06-07 | 1999-06-07 | 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법 |
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KR10-1999-0020937A KR100384333B1 (ko) | 1999-06-07 | 1999-06-07 | 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법 |
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KR20010001596A true KR20010001596A (ko) | 2001-01-05 |
KR100384333B1 KR100384333B1 (ko) | 2003-05-16 |
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KR10-1999-0020937A KR100384333B1 (ko) | 1999-06-07 | 1999-06-07 | 웨이퍼로부터 반도체패키지용 반도체칩의 가공 방법 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100475313B1 (ko) * | 2002-07-04 | 2005-03-10 | 에스티에스반도체통신 주식회사 | 접착테이프를 이용한 이중칩 반도체 패키지 조립방법 |
US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
US8129849B1 (en) | 2006-05-24 | 2012-03-06 | Amkor Technology, Inc. | Method of making semiconductor package with adhering portion |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06177323A (ja) * | 1992-12-02 | 1994-06-24 | Nippon Chemicon Corp | 半導体回路装置 |
JPH06275715A (ja) * | 1993-03-19 | 1994-09-30 | Toshiba Corp | 半導体ウェハおよび半導体装置の製造方法 |
JPH07263382A (ja) * | 1994-03-24 | 1995-10-13 | Kawasaki Steel Corp | ウェーハ固定用テープ |
JP2994555B2 (ja) * | 1994-06-02 | 1999-12-27 | 富士通株式会社 | 半導体実装構造 |
JPH1027880A (ja) * | 1996-07-09 | 1998-01-27 | Sumitomo Metal Mining Co Ltd | 半導体装置 |
JPH1167699A (ja) * | 1997-08-13 | 1999-03-09 | Texas Instr Japan Ltd | 半導体装置の製造方法 |
-
1999
- 1999-06-07 KR KR10-1999-0020937A patent/KR100384333B1/ko not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
US8143727B2 (en) | 2001-03-09 | 2012-03-27 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
KR100475313B1 (ko) * | 2002-07-04 | 2005-03-10 | 에스티에스반도체통신 주식회사 | 접착테이프를 이용한 이중칩 반도체 패키지 조립방법 |
US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
US8129849B1 (en) | 2006-05-24 | 2012-03-06 | Amkor Technology, Inc. | Method of making semiconductor package with adhering portion |
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KR100384333B1 (ko) | 2003-05-16 |
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