KR20000067910A - 자외선 흡수제로서의 폴리옥시알킬렌으로 치환 및 가교된 트리아 - Google Patents

자외선 흡수제로서의 폴리옥시알킬렌으로 치환 및 가교된 트리아 Download PDF

Info

Publication number
KR20000067910A
KR20000067910A KR1019997000367A KR19997000367A KR20000067910A KR 20000067910 A KR20000067910 A KR 20000067910A KR 1019997000367 A KR1019997000367 A KR 1019997000367A KR 19997000367 A KR19997000367 A KR 19997000367A KR 20000067910 A KR20000067910 A KR 20000067910A
Authority
KR
South Korea
Prior art keywords
formula
alkyl
hydrogen
phenyl
polyoxyalkylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019997000367A
Other languages
English (en)
Korean (ko)
Inventor
토안비엔반
팔레트안드레아스
하이요츠파스칼
Original Assignee
에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
시바 스페셜티 케미칼스 홀딩 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러, 시바 스페셜티 케미칼스 홀딩 인크. filed Critical 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러
Publication of KR20000067910A publication Critical patent/KR20000067910A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00—Cosmetics or similar toiletry preparations
    • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/49—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
    • A61K8/494—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds with more than one nitrogen as the only hetero atom
    • A61K8/4966—Triazines or their condensed derivatives
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
    • A61Q17/04—Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/235—Saturated compounds containing more than one carboxyl group
    • C07C59/305—Saturated compounds containing more than one carboxyl group containing ether groups, groups, groups, or groups
    • C07C59/315—Saturated compounds containing more than one carboxyl group containing ether groups, groups, groups, or groups containing halogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C08K5/132—Phenols containing keto groups, e.g. benzophenones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132—Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Birds (AREA)
  • Dermatology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Cosmetics (AREA)
  • Paper (AREA)
  • Ink Jet (AREA)
  • Printing Methods (AREA)
  • Polyethers (AREA)
  • Epoxy Compounds (AREA)
KR1019997000367A 1996-07-18 1997-07-07 자외선 흡수제로서의 폴리옥시알킬렌으로 치환 및 가교된 트리아 Withdrawn KR20000067910A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH1806/96 1996-07-18
CH180696 1996-07-18

Publications (1)

Publication Number Publication Date
KR20000067910A true KR20000067910A (ko) 2000-11-25

Family

ID=4219044

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019997000367A Withdrawn KR20000067910A (ko) 1996-07-18 1997-07-07 자외선 흡수제로서의 폴리옥시알킬렌으로 치환 및 가교된 트리아

Country Status (12)

Country Link
US (2) US6369267B1 (enExample)
EP (2) EP0912531B1 (enExample)
JP (1) JP2000515141A (enExample)
KR (1) KR20000067910A (enExample)
AU (1) AU3620497A (enExample)
BR (1) BR9710730A (enExample)
CA (1) CA2258523A1 (enExample)
CZ (1) CZ14299A3 (enExample)
DE (1) DE69719990T2 (enExample)
ES (1) ES2192688T3 (enExample)
TW (1) TW440564B (enExample)
WO (1) WO1998003489A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11809933B2 (en) 2018-11-13 2023-11-07 Ppg Industries Ohio, Inc. Method of detecting a concealed pattern
US11808833B2 (en) 2016-10-28 2023-11-07 Ppg Industries Ohio, Inc. Coatings for increasing near-infrared detection distances
US12001034B2 (en) 2019-01-07 2024-06-04 Ppg Industries Ohio, Inc. Near infrared control coating, articles formed therefrom, and methods of making the same

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5994431A (en) * 1996-05-03 1999-11-30 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyolefins
US6291586B2 (en) * 1996-05-03 2001-09-18 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyurethanes and polyureas
SI1042293T1 (sl) * 1997-12-19 2008-08-31 Amgen Inc Substituirane piridinske in piridazinske spojine in njihova farmacevtska uporaba
JP2002518489A (ja) * 1998-06-22 2002-06-25 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド ポリ(トリスアリール−1,3,5−トリアジン=カルバマート)紫外光吸収剤
ZA9810599B (en) * 1998-06-22 1999-07-30 Cytec Tech Corp Triazine UV absorber comprising amino resins.
AU1858801A (en) * 1999-11-29 2001-06-12 Ciba Specialty Chemicals Holding Inc. Dimeric light stabilizers for polyolefins and polyolefin copolymers
GB2384486B (en) * 2000-07-26 2004-04-21 Ciba Sc Holding Ag Hydroxyphenyltriazines
EP1375574B9 (en) * 2001-02-21 2007-12-26 Toray Industries, Inc. Polyphenylene sulfide member and its manufacturing method
US7214742B2 (en) * 2001-11-30 2007-05-08 Ciba Specialty Chemicals Corp. 2-hydroxyphenyl-s-triazine crosslinkers for polymer networks
JP2004347617A (ja) * 2003-04-11 2004-12-09 Clariant Internatl Ltd 感光性樹脂組成物用基板密着性向上剤及びそれを含有する感光性樹脂組成物
KR100532102B1 (ko) * 2003-05-27 2005-11-29 삼성전자주식회사 벤조페논계 화합물 및 이를 포함하는 잉크 조성물
ATE367382T1 (de) * 2003-12-25 2007-08-15 Council Scient Ind Res Antiozonant funktionalisierte benzotriazole uv absorber und ihre herstellungsverfahren
US7365108B2 (en) * 2004-07-14 2008-04-29 Hewlett-Packard Development Company, L.P. Pigmented ink-jet inks with improved print quality and reliability
US7381762B2 (en) * 2004-08-20 2008-06-03 Milliken & Company Ultraviolet light (UV) absorbing compounds and compositions containing UV absorbing compounds
JPWO2006112223A1 (ja) * 2005-03-31 2008-12-04 株式会社日本触媒 偏光子保護フィルム、偏光板、および画像表示装置
US7772393B2 (en) 2005-06-13 2010-08-10 Innovative Surface Technologies, Inc. Photochemical crosslinkers for polymer coatings and substrate tie-layer
US7989619B2 (en) 2005-07-14 2011-08-02 Innovative Surface Technoloiges, Inc. Nanotextured surfaces
US7868132B2 (en) * 2006-04-25 2011-01-11 E. I. Du Pont De Nemours And Company Method for preparing multi-arm poly (ethylene glycol) amines
JP2007169660A (ja) * 2007-03-15 2007-07-05 Dainichiseika Color & Chem Mfg Co Ltd 重合体結合紫外線吸収剤
WO2009002858A2 (en) 2007-06-22 2008-12-31 Innovative Surface Technologies, Inc. Stimuli responsive nanofibers
EP2160484A2 (en) 2007-06-22 2010-03-10 Innovative Surface Technologies, Inc. Nanofibers containing latent reactive groups
AU2009288009A1 (en) 2008-09-05 2010-03-11 Innovative Surface Technologies, Inc. Photoactivatable crosslinker compositions for surface modification
CA2734414A1 (en) 2008-09-19 2010-03-25 Innovative Surface Technologies, Inc. Drug eluting superhydrophobic coatings
EP2387600B1 (en) 2009-01-19 2014-04-02 Basf Se Organic black pigments and their preparation
JP5350013B2 (ja) * 2009-02-27 2013-11-27 ケミプロ化成株式会社 新規なトリアジン系化合物、その製造方法、それよりなる紫外線吸収剤およびそれを含む高分子組成物
US8691983B2 (en) 2009-03-03 2014-04-08 Innovative Surface Technologies, Inc. Brush polymer coating by in situ polymerization from photoreactive surface
CN107260744A (zh) 2010-09-14 2017-10-20 巴斯夫欧洲公司 特殊二(联苯基)三嗪衍生物及其混合物作为uv吸收剂的用途
ES2576702T3 (es) * 2012-01-09 2016-07-08 Adhesys Medical Gmbh Agentes de curado (a base de aspartato) modificados por ésteres de beta-aminoácido y su uso en adhesivos de tejido de poliurea
TWI447154B (zh) 2012-11-27 2014-08-01 Ind Tech Res Inst 聚氯乙烯製品與其表面處理方法
WO2016053662A1 (en) * 2014-09-30 2016-04-07 Transitions Optical, Inc. Ultraviolet light absorbers
JP6010714B1 (ja) * 2016-05-10 2016-10-19 株式会社Dnpファインケミカル インク組成物及びそれを用いたインクジェット記録方法
WO2017212816A1 (ja) 2016-06-09 2017-12-14 株式会社Adeka 樹脂組成物
US11773277B2 (en) 2018-04-04 2023-10-03 Basf Se Use of an ultraviolet radiation absorbing polymer composition (UVRAP) as an UV absorbing agent in a coating for non-living and non-keratinous materials
KR102745651B1 (ko) * 2018-04-04 2024-12-23 바스프 에스이 형상화 인공 중합체 물품에 대한 광 안정화제로서의 자외 방사선 흡수 조성물의 용도
EP3556748A1 (en) * 2018-04-20 2019-10-23 Basf Se Hydroxyphenyl-triazine uv absorbers
CN113299178B (zh) * 2021-04-26 2022-08-26 允昌特种印刷(深圳)有限公司 点光源识读激光加密纸质防伪标识及其制备方法
WO2023161023A1 (en) 2022-02-22 2023-08-31 Basf Se Ultraviolet absorber
CN114933552A (zh) * 2022-06-15 2022-08-23 襄阳金达成精细化工有限公司 一种含uv-9的水溶性紫外线吸收剂制备工艺
WO2025205821A1 (ja) * 2024-03-27 2025-10-02 日産化学株式会社 液晶配向剤、液晶配向膜、及び液晶表示素子
WO2025205807A1 (ja) * 2024-03-27 2025-10-02 日産化学株式会社 液晶配向剤、液晶配向膜、及び液晶表示素子
WO2026027355A1 (en) 2024-07-29 2026-02-05 Basf Se Process for decolorization of light stabilizers

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3580927A (en) * 1967-11-24 1971-05-25 Minnesota Mining & Mfg Ultraviolet light inhibitors
CH533853A (de) 1970-03-23 1973-02-15 Ciba Geigy Ag Verwendung von 2'-Hydroxyphenyl-1,3,5-triazinen als Stabilisierungsmittel gegen Ultraviolettstrahlung in photographischem Material
US4853471A (en) * 1981-01-23 1989-08-01 Ciba-Geigy Corporation 2-(2-Hydroxyphenyl)-benztriazoles, their use as UV-absorbers and their preparation
ATE151097T1 (de) * 1989-12-05 1997-04-15 Ciba Geigy Stabilisiertes organisches material
EP0442847B2 (de) * 1990-02-16 2000-08-23 Ciba SC Holding AG Gegen Schädigung durch Licht, Wärme und Sauerstoff stabilisierte Ueberzugsmittel
US5278314A (en) 1991-02-12 1994-01-11 Ciba-Geigy Corporation 5-thio-substituted benzotriazole UV-absorbers
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
US5210195A (en) 1991-11-08 1993-05-11 Texaco Chemical Co. Bis(2,2',6,6'-tetramethyl-4-aminoethyleneamidopiperidyl) polyoxyalkylene
BE1006797A5 (fr) * 1992-12-03 1994-12-13 Ciba Geigy Ag Absorbeurs d'uv.
JPH0789895A (ja) * 1993-02-09 1995-04-04 Asahi Glass Co Ltd 含フッ素ベンゾフェノン誘導体およびその用途
JPH07109447A (ja) * 1993-10-13 1995-04-25 Asahi Glass Co Ltd 水溶性紫外線吸収剤
ES2179091T3 (es) * 1994-02-10 2003-01-16 Ciba Sc Holding Ag Barniz de proteccion para madera.
US5500332A (en) * 1995-04-26 1996-03-19 Eastman Kodak Company Benzotriazole based UV absorbers and photographic elements containing them
US5571924A (en) * 1995-07-12 1996-11-05 Ciba-Geigy Corporation Process for the preparation of benzotriazoles
US5977219A (en) * 1997-10-30 1999-11-02 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11808833B2 (en) 2016-10-28 2023-11-07 Ppg Industries Ohio, Inc. Coatings for increasing near-infrared detection distances
US11977154B2 (en) 2016-10-28 2024-05-07 Ppg Industries Ohio, Inc. Coatings for increasing near-infrared detection distances
US11809933B2 (en) 2018-11-13 2023-11-07 Ppg Industries Ohio, Inc. Method of detecting a concealed pattern
US12050950B2 (en) 2018-11-13 2024-07-30 Ppg Industries Ohio, Inc. Method of detecting a concealed pattern
US12380306B2 (en) 2018-11-13 2025-08-05 Ppg Industries Ohio, Inc. Method of detecting a concealed pattern
US12001034B2 (en) 2019-01-07 2024-06-04 Ppg Industries Ohio, Inc. Near infrared control coating, articles formed therefrom, and methods of making the same

Also Published As

Publication number Publication date
WO1998003489A1 (en) 1998-01-29
EP0912531A1 (en) 1999-05-06
CZ14299A3 (cs) 1999-04-14
EP1266889A3 (en) 2003-12-03
DE69719990D1 (de) 2003-04-24
EP0912531B1 (en) 2003-03-19
TW440564B (en) 2001-06-16
DE69719990T2 (de) 2003-09-11
US20020094320A1 (en) 2002-07-18
US6653484B2 (en) 2003-11-25
BR9710730A (pt) 1999-08-17
CA2258523A1 (en) 1998-01-29
JP2000515141A (ja) 2000-11-14
EP1266889A2 (en) 2002-12-18
AU3620497A (en) 1998-02-10
ES2192688T3 (es) 2003-10-16
US6369267B1 (en) 2002-04-09

Similar Documents

Publication Publication Date Title
US6369267B1 (en) Polyoxyalkylene substituted and bridged triazine, benzotriazole and benzophenone derivatives as UV absorbers
EP1213283B1 (en) Biphenyl-substituted triazines as light stabilisers
AU703934B2 (en) Stabilizer combination
KR20030048087A (ko) 비황변성인 오르토 디알킬 아릴 치환된 트리아진 자외선흡수제
JPH08337574A (ja) o−ヒドロキシフェニル−s−トリアジン
SK140294A3 (en) O-hydroxyphenyl-s-triazines, method of their preparation, organic polymers, stabilized with these triazines and cosmetic preparations containing these triazines
WO2002046136A2 (en) Bis(alkyleneoxybenzophenone) ultraviolet light absorbers
KR20010053097A (ko) 폴리-트리스아릴-1,3,5-트리아진 카바메이트 자외선 흡수제
EP1238003A1 (en) Mono- and bis- benzotriazolyldihydroxybiaryl uv absorbers
KR20010053123A (ko) 장애 페놀을 함유하는 트리스아릴-1,3,5-트리아진 자외선흡수제
EP1089987A1 (en) Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers
US20020115859A1 (en) Oxopiperazinyl derivatives and light stabilized compositions
ES2213923T3 (es) Aminotriazinas protegidas por morfolino con sustituyentes amino impedidos y su uso como estabilizadores de luz.
EP1351943A1 (en) Benzophenone uv-absorbers with heterocyclic substituents
KR100517489B1 (ko) 광안정화제로서의 아미노-및 하이드록시 치환된 트리페닐-s-트리아진
KR20030064813A (ko) 모르폴리논의 제조방법
MXPA00011724A (en) Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers
MXPA00011723A (en) Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 19990118

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid