KR20000010690A - 초박막 유기 블랙 매트릭스 - Google Patents

초박막 유기 블랙 매트릭스 Download PDF

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Publication number
KR20000010690A
KR20000010690A KR1019980708758A KR19980708758A KR20000010690A KR 20000010690 A KR20000010690 A KR 20000010690A KR 1019980708758 A KR1019980708758 A KR 1019980708758A KR 19980708758 A KR19980708758 A KR 19980708758A KR 20000010690 A KR20000010690 A KR 20000010690A
Authority
KR
South Korea
Prior art keywords
pigment
black
coating material
dye
black matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1019980708758A
Other languages
English (en)
Korean (ko)
Inventor
램 더블유. 사브니스
조나단 더블유. 마요
에디스 지. 헤이스
테리 엘. 브루어
마이클 디. 스트로더
아키라 야나기모토
야스히사 소네
요시타네 와타나베
기요미 에마
Original Assignee
도쿠시마 히데이치
닛산 가가쿠 고교 가부시키 가이샤
테리 엘. 브루어
브루어 사이언스 인코퍼레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿠시마 히데이치, 닛산 가가쿠 고교 가부시키 가이샤, 테리 엘. 브루어, 브루어 사이언스 인코퍼레이티드 filed Critical 도쿠시마 히데이치
Publication of KR20000010690A publication Critical patent/KR20000010690A/ko
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Paints Or Removers (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Structures Of Non-Positive Displacement Pumps (AREA)
KR1019980708758A 1996-09-27 1997-06-27 초박막 유기 블랙 매트릭스 Ceased KR20000010690A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/721,841 US5780201A (en) 1996-09-27 1996-09-27 Ultra thin photolithographically imageable organic black matrix coating material
US08/721,841 1996-09-27

Publications (1)

Publication Number Publication Date
KR20000010690A true KR20000010690A (ko) 2000-02-25

Family

ID=24899533

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980708758A Ceased KR20000010690A (ko) 1996-09-27 1997-06-27 초박막 유기 블랙 매트릭스

Country Status (8)

Country Link
US (1) US5780201A (enExample)
EP (1) EP0866994A1 (enExample)
JP (1) JP4206490B2 (enExample)
KR (1) KR20000010690A (enExample)
CN (1) CN1214129A (enExample)
CA (1) CA2269538A1 (enExample)
TW (1) TW432245B (enExample)
WO (1) WO1998013728A1 (enExample)

Cited By (1)

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KR101947129B1 (ko) * 2018-05-24 2019-02-12 한국화학연구원 절연성, 분산성 및 저항성이 향상된 안료 입자

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US6001533A (en) 1996-03-27 1999-12-14 Dai Nippon Printing Co., Ltd. Composition for forming non-conductive light-shielding layer, and non-conductive light-shielding layer containing same
CN1148600C (zh) * 1996-11-26 2004-05-05 三星电子株式会社 薄膜晶体管基片及其制造方法
US5998090A (en) * 1997-12-01 1999-12-07 Brewer Science, Inc. High optical density ultra thin organic black matrix system
US20030113640A1 (en) * 1998-07-14 2003-06-19 Sabnis Ram W. Photosensitive black matrix
JP2000129208A (ja) * 1998-10-23 2000-05-09 Toray Ind Inc 低温保存方法
US6441083B1 (en) 1999-06-11 2002-08-27 Nippon Shokubai Co., Ltd. Polyamidic acid-containing and fine particles-dispersed composition and production process therefor
US6639638B1 (en) 1999-08-27 2003-10-28 International Business Machines Corporation LCD cover optical structure and method
US6440207B1 (en) 2000-03-03 2002-08-27 Bayer Corporation Method for preparing organic pigments
TW499622B (en) * 2000-04-26 2002-08-21 Ritdisplay Corp Method for fabricating an anti-glare pixel-defining layer on an OLED panel
US6444407B1 (en) * 2000-06-26 2002-09-03 International Business Machines Corporation Plate for liquid crystal display, method and polymeric compositions
JP2002047423A (ja) * 2000-08-02 2002-02-12 Toray Ind Inc 黒色ペースト
US7008749B2 (en) * 2001-03-12 2006-03-07 The University Of North Carolina At Charlotte High resolution resists for next generation lithographies
KR100396070B1 (ko) * 2001-03-24 2003-08-27 (주)펨텍 유기 블랙매트릭스용 안료분산체 조성물 및 제조방법
JP2003004904A (ja) * 2001-06-25 2003-01-08 Dainippon Printing Co Ltd 高屈折率化した防眩層を有する反射防止フィルム及び低反射表示装置
US6536889B1 (en) 2001-10-31 2003-03-25 Xerox Corporation Systems and methods for ejecting or depositing substances containing multiple photointiators
US6561640B1 (en) 2001-10-31 2003-05-13 Xerox Corporation Systems and methods of printing with ultraviolet photosensitive resin-containing materials using light emitting devices
US7049044B2 (en) * 2002-12-19 2006-05-23 The University Of North Carolina At Charlotte Nanocomposite negative resists for next generation lithographies
US7776505B2 (en) * 2001-11-05 2010-08-17 The University Of North Carolina At Charlotte High resolution resists for next generation lithographies
DE602004024846D1 (de) * 2003-04-07 2010-02-11 Toray Industries Zusammensetzung von photoempfindlichem Harz des Positivtyps
JP2004334181A (ja) * 2003-04-18 2004-11-25 Fuji Photo Film Co Ltd 表示装置用遮光膜
WO2004099373A2 (en) * 2003-05-02 2004-11-18 University Of North Carolina At Charlotte Biocompatible resists
US20060083939A1 (en) * 2004-10-20 2006-04-20 Dunbar Meredith L Light activatable polyimide compositions for receiving selective metalization, and methods and compositions related thereto
US8323802B2 (en) * 2004-10-20 2012-12-04 E I Du Pont De Nemours And Company Light activatable polyimide compositions for receiving selective metalization, and methods and compositions related thereto
JP2006145602A (ja) * 2004-11-16 2006-06-08 Nec Lcd Technologies Ltd 液晶表示パネル及び液晶表示装置
US7571695B2 (en) 2006-11-06 2009-08-11 Temptime Corporation Freeze indicators, flexible freeze indicators and manufacturing methods
US8475924B2 (en) 2007-07-09 2013-07-02 E.I. Du Pont De Nemours And Company Compositions and methods for creating electronic circuitry
WO2009152276A2 (en) 2008-06-10 2009-12-17 University Of North Carolina At Charlotte Photoacid generators and lithographic resists comprising the same
US20100193950A1 (en) * 2009-01-30 2010-08-05 E.I.Du Pont De Nemours And Company Wafer level, chip scale semiconductor device packaging compositions, and methods relating thereto
JP4976587B2 (ja) * 2009-03-25 2012-07-18 シャープ株式会社 表示装置
US9631054B2 (en) 2010-07-23 2017-04-25 E I Du Pont De Nemours And Company Matte finish polyimide films and methods relating thereto
US11203192B2 (en) 2009-08-03 2021-12-21 E I Du Pont De Nemours And Company Matte finish polyimide films and methods relating thereto
US8541107B2 (en) * 2009-08-13 2013-09-24 E. I. Du Pont De Nemours And Company Pigmented polyimide films and methods relating thereto
US9926415B2 (en) 2010-08-05 2018-03-27 E I Du Pont De Nemours And Company Matte finish polyimide films and methods relating thereto
CN102260408A (zh) * 2010-05-27 2011-11-30 E.I.内穆尔杜邦公司 黑色聚酰亚胺薄膜及含所述薄膜的铜箔层合板
JP5539429B2 (ja) * 2012-03-19 2014-07-02 富士フイルム株式会社 着色感光性組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
KR20130113778A (ko) * 2012-04-06 2013-10-16 에스케이씨코오롱피아이 주식회사 블랙 폴리이미드 필름
KR20140031737A (ko) * 2012-09-05 2014-03-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 블랙 매트릭스의 형성 방법
WO2014129320A1 (ja) * 2013-02-19 2014-08-28 東レ株式会社 樹脂ブラックマトリクス基板およびタッチパネル
US9963578B2 (en) 2013-07-17 2018-05-08 Nexolve Corporation Black polyimides and synthesis thereof
CN103642041B (zh) * 2013-10-31 2016-04-06 西安航天三沃化学有限公司 一种消光型黑色聚酰亚胺树脂及其制备方法
DE102014218292A1 (de) 2014-09-12 2016-03-17 Evonik Degussa Gmbh Flüssige Beschichtungszusammensetzungen, Verfahren zu ihrer Herstellung und ihre Verwendung
KR102149158B1 (ko) * 2016-05-31 2020-08-28 후지필름 가부시키가이샤 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 장치 및 화상 표시 장치
CN109738364B (zh) * 2018-12-25 2022-03-29 山东东宏管业股份有限公司 一种检测炭黑分散性的方法
CN112111077A (zh) * 2020-08-25 2020-12-22 安徽国风塑业股份有限公司 一种高绝缘强度高黑度聚酰亚胺黑膜及其制备方法

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JPH0836257A (ja) * 1994-07-21 1996-02-06 Sekisui Chem Co Ltd 着色レジスト組成物
JPH0834923A (ja) * 1994-07-21 1996-02-06 Sekisui Chem Co Ltd 黒色感光性樹脂組成物及びブラックマトリクスの製造法
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101947129B1 (ko) * 2018-05-24 2019-02-12 한국화학연구원 절연성, 분산성 및 저항성이 향상된 안료 입자
WO2019225976A1 (ko) * 2018-05-24 2019-11-28 한국화학연구원 절연성, 분산성 및 저항성이 향상된 안료 입자

Also Published As

Publication number Publication date
WO1998013728A8 (en) 1999-08-05
EP0866994A1 (en) 1998-09-30
JPH10232302A (ja) 1998-09-02
CA2269538A1 (en) 1998-04-02
WO1998013728A1 (en) 1998-04-02
TW432245B (en) 2001-05-01
US5780201A (en) 1998-07-14
CN1214129A (zh) 1999-04-14
EP0866994A4 (enExample) 1998-09-30
JP4206490B2 (ja) 2009-01-14

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Patent event date: 19990731

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Patent event date: 20010528

Patent event code: PE09021S01D

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PE0601 Decision on rejection of patent

Patent event date: 20011129

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Patent event date: 20010528

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Patent event code: PE06011S01I