KR19990064058A - 투과성 구조에서 3차원내 결함위치결정방법. - Google Patents
투과성 구조에서 3차원내 결함위치결정방법. Download PDFInfo
- Publication number
- KR19990064058A KR19990064058A KR1019980702537A KR19980702537A KR19990064058A KR 19990064058 A KR19990064058 A KR 19990064058A KR 1019980702537 A KR1019980702537 A KR 1019980702537A KR 19980702537 A KR19980702537 A KR 19980702537A KR 19990064058 A KR19990064058 A KR 19990064058A
- Authority
- KR
- South Korea
- Prior art keywords
- image
- plate
- planar
- signal level
- bulk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 73
- 230000007547 defect Effects 0.000 title claims abstract description 34
- 230000004807 localization Effects 0.000 title 1
- 230000005856 abnormality Effects 0.000 claims abstract description 51
- 238000007689 inspection Methods 0.000 claims abstract description 44
- 238000005286 illumination Methods 0.000 claims abstract description 41
- 230000003287 optical effect Effects 0.000 claims abstract description 26
- 230000008878 coupling Effects 0.000 claims abstract description 23
- 238000010168 coupling process Methods 0.000 claims abstract description 23
- 238000005859 coupling reaction Methods 0.000 claims abstract description 23
- 239000002245 particle Substances 0.000 claims abstract description 16
- 230000001154 acute effect Effects 0.000 claims abstract description 5
- 239000011521 glass Substances 0.000 claims description 28
- 230000002159 abnormal effect Effects 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 239000013590 bulk material Substances 0.000 abstract description 2
- 239000000428 dust Substances 0.000 abstract description 2
- 238000009304 pastoral farming Methods 0.000 abstract description 2
- 239000000835 fiber Substances 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 10
- 238000005259 measurement Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000002419 bulk glass Substances 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007717 exclusion Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- -1 tungsten halogen Chemical class 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000013100 final test Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US505895P | 1995-10-06 | 1995-10-06 | |
| US60/005,058 | 1995-10-06 | ||
| US08/721,332 US5790247A (en) | 1995-10-06 | 1996-09-26 | Technique for determining defect positions in three dimensions in a transparent structure |
| US8/721,332 | 1996-09-26 | ||
| PCT/US1996/015907 WO1997013140A1 (en) | 1995-10-06 | 1996-10-04 | Technique for determining defect positions in three dimensions in a transparent structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR19990064058A true KR19990064058A (ko) | 1999-07-26 |
Family
ID=26673865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019980702537A Withdrawn KR19990064058A (ko) | 1995-10-06 | 1996-10-04 | 투과성 구조에서 3차원내 결함위치결정방법. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5790247A (https=) |
| JP (1) | JP3892906B2 (https=) |
| KR (1) | KR19990064058A (https=) |
| WO (1) | WO1997013140A1 (https=) |
Families Citing this family (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6392683B1 (en) * | 1997-09-26 | 2002-05-21 | Sumitomo Heavy Industries, Ltd. | Method for making marks in a transparent material by using a laser |
| US6297879B1 (en) * | 1998-02-27 | 2001-10-02 | Micron Technology, Inc. | Inspection method and apparatus for detecting defects on photomasks |
| DE19929118C2 (de) * | 1999-06-25 | 2001-05-10 | Basler Ag | Verfahren zum optischen Prüfen der Zwischenschicht eines wenigstens dreischichtigen flächigen Gegenstandes |
| JP2001118766A (ja) * | 1999-10-15 | 2001-04-27 | Canon Inc | Ｘ線マスク及びそれを用いたデバイスの製造方法 |
| US6862142B2 (en) * | 2000-03-10 | 2005-03-01 | Kla-Tencor Technologies Corporation | Multi-detector microscopic inspection system |
| US6404489B1 (en) * | 2000-03-29 | 2002-06-11 | Corning Incorporated | Inclusion detection |
| WO2002018980A2 (en) * | 2000-09-01 | 2002-03-07 | Applied Process Technologies | Optical system for imaging distortions in moving reflective sheets |
| US7349090B2 (en) | 2000-09-20 | 2008-03-25 | Kla-Tencor Technologies Corp. | Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography |
| US6946394B2 (en) * | 2000-09-20 | 2005-09-20 | Kla-Tencor Technologies | Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process |
| US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| US6965685B1 (en) * | 2001-09-04 | 2005-11-15 | Hewlett-Packard Development Company, Lp. | Biometric sensor |
| US6657714B2 (en) * | 2001-09-24 | 2003-12-02 | Applied Materials, Inc. | Defect detection with enhanced dynamic range |
| TWI264532B (en) * | 2001-11-05 | 2006-10-21 | Olympus Corp | Substrate inspection device |
| US7105848B2 (en) * | 2002-04-15 | 2006-09-12 | Wintriss Engineering Corporation | Dual level out-of-focus light source for amplification of defects on a surface |
| JP2004150971A (ja) * | 2002-10-31 | 2004-05-27 | Nitto Denko Corp | フィルムの検査方法および検査装置 |
| US20040196454A1 (en) * | 2003-04-03 | 2004-10-07 | Takayuki Ishiguro | Optical system, detector and method for detecting peripheral surface defect of translucent disk |
| DE10316707B4 (de) * | 2003-04-04 | 2006-04-27 | Schott Ag | Verfahren und Vorrichtung zur Erkennung von Fehlern in transparentem Material |
| IES20030443A2 (en) * | 2003-06-16 | 2004-12-01 | Fraudhalt Ltd | A method and apparatus for determining if an optical disk originated from a valid source |
| KR100541449B1 (ko) * | 2003-07-23 | 2006-01-11 | 삼성전자주식회사 | 패널검사장치 |
| US7511807B2 (en) * | 2003-12-30 | 2009-03-31 | Agency For Science, Technology And Research | Method and apparatus for detection of inclusion in glass |
| JP2005308725A (ja) * | 2004-03-26 | 2005-11-04 | Sumitomo Osaka Cement Co Ltd | 透明板欠陥検査装置 |
| WO2005116617A1 (en) * | 2004-05-21 | 2005-12-08 | Corning Incorporated | Apparatus and process for detecting inclusions |
| GB2415776B (en) * | 2004-06-28 | 2009-01-28 | Carglass Luxembourg Sarl Zug | Investigation of vehicle glazing panels |
| JP4480009B2 (ja) * | 2004-12-06 | 2010-06-16 | Ｈｏｙａ株式会社 | 欠陥検査装置及び方法、並びにフォトマスクの製造方法 |
| DK1947617T3 (en) * | 2005-01-25 | 2016-11-28 | Tomra Systems Asa | Polet system for installation in return slot |
| JP4688150B2 (ja) * | 2005-08-03 | 2011-05-25 | Ｈｏｙａ株式会社 | マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法、及び欠陥検査装置 |
| WO2010058759A1 (ja) * | 2008-11-20 | 2010-05-27 | 旭硝子株式会社 | 透明体検査装置 |
| CN102023164B (zh) * | 2009-09-23 | 2015-09-16 | 法国圣-戈班玻璃公司 | 用于检测透明平板的局部缺陷的装置和方法 |
| US9035673B2 (en) | 2010-01-25 | 2015-05-19 | Palo Alto Research Center Incorporated | Method of in-process intralayer yield detection, interlayer shunt detection and correction |
| US8875562B2 (en) | 2010-02-17 | 2014-11-04 | Dow Global Technologies Llc | Filter and membrane defect detection system |
| BR112013004675A2 (pt) | 2010-10-01 | 2016-07-26 | Dow Global Technologies Llc | sistema para determinar se um substrato tem um tamanho de poro ou uniformidade aceitavel,método e método para identificar se os poros de um substrato estão fora de uma faixa definida ou acima ou abaixo de um tamanho definido |
| US8866899B2 (en) * | 2011-06-07 | 2014-10-21 | Photon Dynamics Inc. | Systems and methods for defect detection using a whole raw image |
| ES2717882T3 (es) * | 2011-06-24 | 2019-06-26 | Tomra Systems Asa | Máquina de retorno de envases y método de detección de suciedad en una máquina de retorno de envases |
| DE102011111545B3 (de) * | 2011-08-24 | 2012-10-18 | Carl Zeiss Ag | Anordnung zur Inspektion von transparenten Proben |
| WO2014055962A1 (en) * | 2012-10-05 | 2014-04-10 | Seagate Technology Llc | Imaging a transparent article |
| US9207190B2 (en) * | 2013-04-10 | 2015-12-08 | Technology Assessment & Transfer, Inc. | Method for nondestructive testing of optical discontinuities in monolithic transparent polycrystalline ceramic articles |
| DE102014005932A1 (de) * | 2014-04-25 | 2015-10-29 | Boraident Gmbh | Verfahren und Vorrichtung zur Selektion und Detektion von Nickelsulfid-Einschlüssen in Glas |
| KR102200691B1 (ko) * | 2014-06-02 | 2021-01-13 | 삼성디스플레이 주식회사 | 검사장치 |
| WO2016090311A1 (en) | 2014-12-05 | 2016-06-09 | Kla-Tencor Corporation | Apparatus, method and computer program product for defect detection in work pieces |
| CN106248684B (zh) | 2015-06-03 | 2019-12-17 | 法国圣戈班玻璃公司 | 用于检测透明基底的内部瑕疵的光学装置及方法 |
| CN105259181A (zh) * | 2015-10-26 | 2016-01-20 | 华为技术有限公司 | 显示屏的显示缺陷检测方法、装置及设备 |
| CN105866129A (zh) * | 2016-05-16 | 2016-08-17 | 天津工业大学 | 一种基于数字投影的产品表面质量在线检测方法 |
| DE102016112159A1 (de) * | 2016-07-04 | 2018-01-04 | Krones Aktiengesellschaft | Vorrichtung und Verfahren zum Inspizieren von Objekten mit Schutzglas |
| WO2019157271A2 (en) * | 2018-02-09 | 2019-08-15 | Massachusetts Institute Of Technology | Systems and methods for crack detection |
| CN114166864B (zh) * | 2021-12-08 | 2024-11-12 | 成都南方电子仪表有限公司 | 一种透明屏幕缺陷的定位检测系统和定位检测方法 |
| WO2024218763A1 (en) * | 2023-04-19 | 2024-10-24 | Lumus Ltd. | Systems and methods for testing optical plates |
| CN116156328B (zh) * | 2023-04-23 | 2023-07-04 | 湖南省迈德威视科技有限公司 | 一种应用于产品缺陷检测的工业相机 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3985454A (en) * | 1975-03-14 | 1976-10-12 | Nasa | Window defect planar mapping technique |
| JPS5444587A (en) * | 1977-09-14 | 1979-04-09 | Nec Corp | Flaw inspecting system of transparent objects |
| US4456374A (en) * | 1981-12-11 | 1984-06-26 | Johnson & Johnson | Detecting the presence or absence of a coating on a substrate |
| US4808813A (en) * | 1986-05-05 | 1989-02-28 | Hughes Aircraft Company | Self contained surface contamination sensor for detecting external particulates and surface discontinuities |
| JPH0760136B2 (ja) * | 1990-05-01 | 1995-06-28 | 三井金属鉱業株式会社 | 内部欠陥検査方法および装置 |
| JPH0776757B2 (ja) * | 1990-12-14 | 1995-08-16 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 光学的検査装置 |
| JP2948353B2 (ja) * | 1991-04-19 | 1999-09-13 | 日立電子エンジニアリング株式会社 | ガラス板の表面欠陥検査方法および検査装置 |
| US5177559A (en) * | 1991-05-17 | 1993-01-05 | International Business Machines Corporation | Dark field imaging defect inspection system for repetitive pattern integrated circuits |
| JPH0518900A (ja) * | 1991-07-12 | 1993-01-26 | Ricoh Co Ltd | レンズ欠陥検査方法及び検査装置 |
| US5196901A (en) * | 1991-08-22 | 1993-03-23 | Eos Technologies, Inc. | Discriminating surface contamination monitor |
| IL100443A (en) * | 1991-12-20 | 1995-03-30 | Dotan Gideon | Inspection system for detecting surface flaws |
| JPH06294749A (ja) * | 1993-04-09 | 1994-10-21 | Nippon Electric Glass Co Ltd | 板ガラスの欠点検査方法 |
| US5631733A (en) * | 1995-01-20 | 1997-05-20 | Photon Dynamics, Inc. | Large area defect monitor tool for manufacture of clean surfaces |
| US5515159A (en) * | 1995-02-10 | 1996-05-07 | Westinghouse Electric Corporation | Package seal inspection system |
-
1996
- 1996-09-26 US US08/721,332 patent/US5790247A/en not_active Expired - Lifetime
- 1996-10-04 JP JP51444197A patent/JP3892906B2/ja not_active Expired - Lifetime
- 1996-10-04 WO PCT/US1996/015907 patent/WO1997013140A1/en not_active Ceased
- 1996-10-04 KR KR1019980702537A patent/KR19990064058A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| US5790247A (en) | 1998-08-04 |
| JP3892906B2 (ja) | 2007-03-14 |
| JP2001519890A (ja) | 2001-10-23 |
| WO1997013140A1 (en) | 1997-04-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 19980406 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |