KR19990029238A - 석영글래스 및 그 제조방법 - Google Patents
석영글래스 및 그 제조방법 Download PDFInfo
- Publication number
- KR19990029238A KR19990029238A KR1019980026404A KR19980026404A KR19990029238A KR 19990029238 A KR19990029238 A KR 19990029238A KR 1019980026404 A KR1019980026404 A KR 1019980026404A KR 19980026404 A KR19980026404 A KR 19980026404A KR 19990029238 A KR19990029238 A KR 19990029238A
- Authority
- KR
- South Korea
- Prior art keywords
- quartz glass
- gas
- concentration
- refractive index
- range
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/12—Nozzle or orifice plates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/60—Relationship between burner and deposit, e.g. position
- C03B2207/66—Relative motion
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
- C03C2203/42—Gas-phase processes using silicon halides as starting materials
- C03C2203/46—Gas-phase processes using silicon halides as starting materials fluorine containing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Lenses (AREA)
Abstract
Description
실시예1 | 실시예2 | 실시예3 | 비교예1 | 비교예2 | 비교예3 | 비교예4 | |
유량(slm) | 1.50 | 2.64 | 3.00 | 1.32 | 3.95 | 4.50 | 5.27 |
분출속도(slm/cm2) | 9.4 | 16.6 | 18.9 | 8.3 | 24.8 | 28.3 | 33.1 |
강하속도(mm/hr) | 1.00 | 1.97 | 2.20 | - | 2.40 | 3.00 | 3.93 |
잉고트지름(mm) | 180 | 180 | 200 | - | 240 | 220 | 210 |
굴절율차△n | 4.3 x 10-6 | 5.3 x 10-6 | 5.8 x 10-6 | - | 1.5 x 10-5 | 3.0 x 10-5 | 5.0 x 10-5 |
F농도(ppm) | 150 | 160 | 190 | - | 500 | 750 | 1150 |
OH농도(ppm) | 980 | 1180 | 1020 | - | 900 | 1130 | 1000 |
초기내부흡수계수(cm-1) | 0.001이하 | 0.001이하 | 0.001이하 | - | 0.001이하 | 0.001이하 | 0.001이하 |
초기내부투과율% | 99.9%이하 | 99.9%이하 | 99.9%이하 | - | 99.9%이하 | 99.9%이하 | 99.9%이하 |
포화점내부흡수계수(cm-1) | 0.115 | 0.121 | 0.117 | - | 0.113 | 0.116 | 0.111 |
포화점투과율% | 81.0 | 80.6 | 80.8 | - | 81.2 | 80.9 | 81.3 |
실시예 1 | 실시예 2 | 실시예 3 | |
C1 농도(ppm) | 0.1 이하 | 0.1 이하 | 0.1 이하 |
Na 농도(ppb) | 1.0 이하 | 1.0 이하 | 1.0 이하 |
K 농도(ppb) | 50 이하 | 50 이하 | 50 이하 |
Mg 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Ca 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Sc 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Ti 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
V 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Cr 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Mn 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Fe 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Co 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Ni 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Cu 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Zn 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Al 농도(ppb) | 20 이하 | 20 이하 | 20 이하 |
Claims (8)
- 염소(Cl)를 실질적으로 포함하지 않는 석영 글래스에 있어서,그 석영 글래스중의 불소(F) 농도를 100 내지 450ppm의 범위내의 값으로 하고, 그 석영 글래스에 있어서 최대 굴절율과 최소 굴절율과의 차(△n)를 1.0 x 10-7내지 1.0 x 10-5의 범위내의 값으로 하는 것을 특징으로 하는 석영 글래스.
- 제 1항에 있어서,석영 글래스에 있어서, 상기 석영 글래스중의 수산(OH)기 농도를 600 내지 1300ppm의 범위내의 값으로 하는 것을 특징으로 하는 석영 글래스.
- 제 1항 또는 제 2항 중에 있어서,석영 글래스에 있어서, 상기 석영 글래스중에 Mg, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn 및 Al 중 한 금속 원소를 포함하는 경우에는, 해당하는 각 금속원소 농도를 각각 20ppb이하로 하는 것을 특징으로 하는 석영 글래스.
- 염소(Cl)을 실질적으로 포함하지 않는 석영 글래스의 제조방법에 있어서,석영 글래스제 버너로부터 사불화규소(SiF4) 가스와, 지연성 가스와, 가연성 가스를 각각 분출시키는 공정과,그 사불화규소 가스와 상기 지연성 가스 및 상기 가연성 가스의 반응생성물인 물을 반응시켜 석영 글래스미립자를 발생시키는 공정과,그 석영 글래스 미립자를 타겟상에 퇴적시키는 공정과,그 타겟상에 퇴적된 상기 석영 글래스 미립자를 용융·글래스화하여 석영 글래스로 하는 공정을 포함하고,또한, 상기 사불화규소 가스의 분출속도를 9 내지 20 slm/cm2의 범위내의 값으로 하는 것을 특징으로 하는 석영 글래스의 제조방법.
- 제 4항에 있어서,석영 글래스의 제조방법에 있어서,상기 사불화규소(SiF4) 가스 분출속도를, 매스 플로우 콘트롤러를 이용하여 제어하는 것을 특징으로 하는 석영 글래스의 제조방법.
- 제4항 또는 제5항에 있어서,석영 글래스의 제조방법에 있어서,상기 타겟을 0.5 내지 2.35mm/hr의 범위내의 속도로 인하하면서, 그 타겟상에 상기 석영 글래스 미립자를 퇴적시키는 것을 특징으로 하는 석영 글래스의 제조방법.
- 제 4항 내지 6항 중 어느 한 항에 있어서,석영 글래스의 제조방법에 있어서,상기 석영 글래스중의 불소(F) 농도를 100 내지 450ppm의 범위내의 값으로 하고,또한 그 석영 글래스에 있어서 최대굴절율과 최소 굴절율과의 차를 1.0 x 10-7내지 1.0 x 10-5의 범위내의 값으로 하는 것을 특징으로 하는 석영 글래스의 제조방법.
- 제4항 내지 7항중 어느 한 항에 있어서,석영 글래스의 제조방법에 있어서,상기 지연성 가스의 유량과 가연성 가스의 유량과의 비(지연성 가스 유량/ 가연성 가스 유량)을, 0.2 내지 0.5의 범위내의 값으로 하는 것을 특징으로 하는 석영 글래스의 제조방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24684197A JP3965734B2 (ja) | 1997-09-11 | 1997-09-11 | 石英ガラスおよびその製造方法 |
JP246841/1997 | 1997-09-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990029238A true KR19990029238A (ko) | 1999-04-26 |
KR100517360B1 KR100517360B1 (ko) | 2005-12-14 |
Family
ID=17154508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-1998-0026404A KR100517360B1 (ko) | 1997-09-11 | 1998-07-01 | 석영글래스및그제조방법 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0901989B1 (ko) |
JP (1) | JP3965734B2 (ko) |
KR (1) | KR100517360B1 (ko) |
CN (1) | CN1105088C (ko) |
DE (1) | DE69805254T2 (ko) |
TW (1) | TW515782B (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5050969B2 (ja) * | 1998-08-24 | 2012-10-17 | 旭硝子株式会社 | 合成石英ガラス光学部材とその製造方法 |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
US6782716B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6682859B2 (en) | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
JP2000264671A (ja) * | 1999-03-12 | 2000-09-26 | Shin Etsu Chem Co Ltd | 合成石英ガラス部材 |
DE19921059A1 (de) | 1999-05-07 | 2000-11-16 | Heraeus Quarzglas | Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung |
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
US6541168B2 (en) | 2000-04-28 | 2003-04-01 | Corning Incorporated | Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
JP4700787B2 (ja) * | 2000-06-27 | 2011-06-15 | 株式会社オハラ | 合成石英ガラスおよびその製造方法 |
JP4485031B2 (ja) * | 2000-08-08 | 2010-06-16 | 株式会社オハラ | 紫外線用石英ガラスおよびその製造方法 |
US6813907B2 (en) | 2001-11-30 | 2004-11-09 | Corning Incorporated | Fluorine doping a soot preform |
US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
US6910352B2 (en) | 2002-04-24 | 2005-06-28 | Corning Incorporated | Deposition of high fluorine content silica soot |
JP5367204B2 (ja) | 2003-04-03 | 2013-12-11 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびEUVリソグラフィ用光学部材 |
CN1323043C (zh) * | 2003-04-23 | 2007-06-27 | 中国建筑材料科学研究院 | 立式四氯化硅汽相沉积合成石英玻璃的方法 |
DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
JP5589744B2 (ja) * | 2009-10-15 | 2014-09-17 | 旭硝子株式会社 | 石英ガラス母材の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3206916B2 (ja) * | 1990-11-28 | 2001-09-10 | 住友電気工業株式会社 | 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス |
JP3520541B2 (ja) * | 1993-12-27 | 2004-04-19 | 株式会社ニコン | 石英ガラス製バーナー、これを用いて製造される石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法 |
JP3470983B2 (ja) * | 1994-04-28 | 2003-11-25 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
US5958809A (en) * | 1996-08-21 | 1999-09-28 | Nikon Corporation | Fluorine-containing silica glass |
-
1997
- 1997-09-11 JP JP24684197A patent/JP3965734B2/ja not_active Expired - Lifetime
-
1998
- 1998-06-26 TW TW087110342A patent/TW515782B/zh not_active IP Right Cessation
- 1998-07-01 KR KR10-1998-0026404A patent/KR100517360B1/ko not_active IP Right Cessation
- 1998-08-10 CN CN98116271A patent/CN1105088C/zh not_active Expired - Lifetime
- 1998-09-07 EP EP98116851A patent/EP0901989B1/en not_active Expired - Lifetime
- 1998-09-07 DE DE69805254T patent/DE69805254T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69805254T2 (de) | 2003-02-06 |
CN1212954A (zh) | 1999-04-07 |
KR100517360B1 (ko) | 2005-12-14 |
EP0901989A1 (en) | 1999-03-17 |
JP3965734B2 (ja) | 2007-08-29 |
TW515782B (en) | 2003-01-01 |
DE69805254D1 (de) | 2002-06-13 |
EP0901989B1 (en) | 2002-05-08 |
JPH1192153A (ja) | 1999-04-06 |
CN1105088C (zh) | 2003-04-09 |
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