KR19990013330A - 플라즈마 디스플레이 패널용 로울러 하아스형 연속 소성로 - Google Patents
플라즈마 디스플레이 패널용 로울러 하아스형 연속 소성로 Download PDFInfo
- Publication number
- KR19990013330A KR19990013330A KR1019980008655A KR19980008655A KR19990013330A KR 19990013330 A KR19990013330 A KR 19990013330A KR 1019980008655 A KR1019980008655 A KR 1019980008655A KR 19980008655 A KR19980008655 A KR 19980008655A KR 19990013330 A KR19990013330 A KR 19990013330A
- Authority
- KR
- South Korea
- Prior art keywords
- furnace
- plate
- ceiling
- hearth
- maple
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
- F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path
- F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path being carried by a conveyor
- F27B9/2407—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path being carried by a conveyor the conveyor being constituted by rollers (roller hearth furnace)
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
- F27B9/32—Casings
- F27B9/34—Arrangements of linings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
- F27B2009/305—Particular conformation of the furnace
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Tunnel Furnaces (AREA)
- Control Of Resistance Heating (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9175610A JPH1125854A (ja) | 1997-07-01 | 1997-07-01 | プラズマディスプレイパネル用ローラハース型連続焼成炉 |
| JP97-175610 | 1997-07-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR19990013330A true KR19990013330A (ko) | 1999-02-25 |
Family
ID=15999109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019980008655A Withdrawn KR19990013330A (ko) | 1997-07-01 | 1998-03-14 | 플라즈마 디스플레이 패널용 로울러 하아스형 연속 소성로 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH1125854A (enExample) |
| KR (1) | KR19990013330A (enExample) |
| TW (1) | TW370605B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100418030B1 (ko) * | 2001-05-11 | 2004-02-14 | 엘지전자 주식회사 | 플라즈마 표시 패널의 제조장치 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100551522B1 (ko) | 2002-12-11 | 2006-02-13 | 파이오니아 가부시키가이샤 | 플라즈마 디스플레이 패널의 소성로 및 플라즈마디스플레이 패널의 제조 방법 |
| JP4245177B2 (ja) | 2006-07-10 | 2009-03-25 | 日立プラズマディスプレイ株式会社 | 熱処理装置 |
-
1997
- 1997-07-01 JP JP9175610A patent/JPH1125854A/ja active Pending
-
1998
- 1998-03-11 TW TW087103561A patent/TW370605B/zh active
- 1998-03-14 KR KR1019980008655A patent/KR19990013330A/ko not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100418030B1 (ko) * | 2001-05-11 | 2004-02-14 | 엘지전자 주식회사 | 플라즈마 표시 패널의 제조장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW370605B (en) | 1999-09-21 |
| JPH1125854A (ja) | 1999-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19980314 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |