KR19990008147A - 정균 조성물 및 금속 가공 유체에서의 용도 - Google Patents

정균 조성물 및 금속 가공 유체에서의 용도 Download PDF

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KR19990008147A
KR19990008147A KR1019970707672A KR19970707672A KR19990008147A KR 19990008147 A KR19990008147 A KR 19990008147A KR 1019970707672 A KR1019970707672 A KR 1019970707672A KR 19970707672 A KR19970707672 A KR 19970707672A KR 19990008147 A KR19990008147 A KR 19990008147A
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bacteriostatic
formula
amine salts
composition
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하따나까도시후미
가와무라데쓰시
코펭앙리-쟝
요네꾸라아끼
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에꾸르 필립
엘프아토켐에스.에이.
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Abstract

본 발명은 헵타노산의 아미드 및 아민염 또는 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물으로 구성된 군에서 선택한 정균제를 함유하는 정균 조성물에 관한 것이다. 또한 금속 가공유체의 분야에서의 상기 조성물의 용도에 관한 것이다.

Description

정균 조성물 및 금속 가공 유체에서의 용도
본 발명은 금속의 절단 및 연마와 같은 금속 가공에서 사용하는 정균 조성물에 관한 것이다.
수성 금속가공유체는 유효성분으로서 유기 화합물을 함유하여 박테리아 또는 곰팡이에 의해 저하되거나 부패하게 된다는 것이 공지되어 있다. 사실, 가공유체에 들어간 미생물은 영양물질로서 가공유체내 유기 오일 화합물을 이용하고 서서히 번식하여, 오일 성분의 부패를 가져온다. 그러므로, 방부제를 가공유체에 첨가하여 이러한 부패를 방지한다. 가공유체의 성능을 향상시킬 뿐만아니라 항미생물형 금속 가공유체를 개발하는 것이 최근의 경향이다.
방부제의 예는 트리아진, 티아진, Keson (상표명) 과 같은 이소티아졸린 및 피리진과 같은 유기 질소 함유 화합물이다. 페놀형 화합물 및 붕소형 화합물도 또한 생각할 수 있다.
통상적으로, 수성 가공유체 또는 냉각제는 가공점에 붓고 재순환 시킨다. 그러나 수성 가공유체는 서서히 저하되어, 악취를 초래하고, 윤활 효율의 저하 뿐만아니라 부식을 야기하는 pH 의 저하를 초래한다. 가장 심각한 문제점은 점액(곰팡이) 의 발생에 의해 유발되는 배관의 막힘이다.
전술한 공지된 방부제가 문제점을 해소하는데 유용하다. 그러나, 이것은 완전하지 못하고, 부식, 분해, 악취, 기포 및 폐액의 문제점중의 하나이상의 문제점에서 몇몇의 문제점을 갖는다. 그러므로, 문제점들을 해결하고, 인체 및 환경에 덜 나쁜 영향을 끼치며 다루기 쉬운 생물활성형 수성 가공유체의 개발이 요구된다.
본 발명의 목적은 정균 조성물을 제공하는 것이다.
본 발명의 또 다른 목적은 정균성이 향상된 금속 가공용 상기 조성물의 용도이다.
문제점들을 해결하기 위해서, 본 발명자는, 헵타노산의 아미드 및 아민염 또는 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물로 이루어진 군에서 선택한 첨가제는 금속 가공유체에서 우수한 정균성을 갖음을 발견하였다.
따라서, 본 발명은 전술한 것과 같은 1 종이상의 화합물을 함유하는 금속가공용 정균 조성물을 제공하며, 이 조성물은 수성 또는 에멀션형 금속 가공유체에서 사용한다.
본 발명에 따른 첨가제는 헵타노산의 아미드 및 아민염 또는 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물로 구성된 군에서 선택한다.
헵타노산의 유도체는 하기것들중에서 선택한다 :
(a) 하기 화학식의 아미드 :
[식중, R1및 R2는 동일하거나 상이하고, H, C1-20알킬기 또는 친수성기를 갖는 C1-20알킬기를 나타낸다], 및
(b) 하기 화학식의 아민염 :
[식중, R3은 일차 또는 이차 알킬 또는 알칸올 아민염을 나타낸다].
운데실렌산의 유도체는 하기의 것들중에서 선택한다 :
(a) 하기 화학식의 아미드 :
[식중, R1및 R2는 동일하거나 상이하고, H, C1-20알킬기 또는 친수성기를 갖는 C1-20알킬기를 나타낸다],
(b) 하기 화학식의 아민염 :
[식중, R3은 일차 또는 이차 알킬 또는 알칸올 아민염을 나타낸다] 및,
(c)하기 화학식의 알킬렌옥시드 부가 화합물 :
[식중 X 는 H 또는 메틸기를 나타내고, n 은 정수 1 내지 50 을 나타낸다].
헵타노산 또는 운데실렌산의 아미드 및 아민염은 대응하는 산과 탄소수 1 내지 20 의 모노알킬아민 및 디알킬아민, 시클로헥실아민, 디시클로헥실 아민, 또는 모노에탄올 아민 또는 디에탄올 아민과 같은 알킬이 1 종이상의 친수성기를 갖는 아민을 반응시켜 용이하게 제조할 수 있다.
운데실렌산의 알킬렌옥시드 부가 화합물은 운데실렌산과 대응하는 알킬렌옥시드 화합물을 반응시켜 제조할 수 있다.
헵타노산의 아미드 및 아민염 및 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물로 구성된 군에서 둘이상의 화합물을 선택하여 혼합하는 경우, 이러한 헵타노산과 운데실렌산의 유도체의 비율은 특별히 제한되지 않으나 9:1 내지 1:9, 바람직하게는 8:2 내지 2:8 의 범위일 수 있다.
가공유체내 헵타노산의 아미드 및 아민염 또는 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물의 함량은 특별히 제한되지 않으나, 조성물의 총량의 0.01 내지 40 중량%, 바람직하게는 0.1 내지 20 중량%, 좀더 바람직하게는 0.5 내지 10 중량% 의 범위일 수 있다.
만일 헵타노산의 아미드 및 아민염 또는 운데실렌산의 아미드, 아민염 및 알킬렌옥시드 부가 화합물의 함량이 충분하지 않으면, 금속 가공유체내에서의 만족스러운 정균효과는 기대할 수 없다. 반대로, 이의 과량은 정균성을 향상시키지 않으며 비경제적이다.
또한 본 발명에 따른 조성물은 계면활성제, 부식방지제 및 극압 첨가제와 같은 기타의 임의의 첨가제를 정균 첨가제외에 함유할 수 있다. 이러한 첨가제의 비율은 특별히 제한되지 않으나 조성물의 총량의 10 중량% 미만, 바람직하게는 5 중량% 미만이다.
헵토산의 아미드 또는 아민염 또는 운데실렌산의 아미드, 아민염 또는 알킬렌옥시드 부가 화합물을 광유 또는 기계유와 혼합하여 수성 또는 에멀션형 금속가공유체를 제조한다.
본 발명은 금속가공유체용 무취 정균제 및 정균성의 금속 가공유체를 제공한다. 본 발명의 정균 첨가제는 천연생성물로부터 유래하기 때문에, 이로부터 수득한 금속 가공유체는 피부를 자극하지 않고 인간 및 환경에 온화하다.
본 발명은 실시예들에 의해 설명되나 이에만 한정되는 것은 아니다.
정균성 및 악취의 시험
정균제 2 중량부를 전형적 금속 가공유체의 100 중량부에 첨가하고 살아있는 곰팡이의 수 및 악취에서의 변화를 측정한다.
전형적 금속 가공유체는 하기의 조성을 갖는다 (중량부):
10 기계유 50
리시놀레산의 에틸렌옥시드 부가물 10
염소화 파라핀 16
물 24
평가방법
정균제 및 전형적 금속 가공유체를 함유하는 시료를 30℃ 로 유지되는 인큐베이터에 위치시키고 살아있는 곰팡이의 수를 유기체 카운터 (Sanai Biochecker TTC : 총곰팡이수 카운터형) 로 1,2,3,6 및10 일후 계수한다.
악취는 10 일후 사람의 후각에 의해 평가한다.
비교예에서, 정균제는 첨가하지 않는다.
실시예 1
운데실렌산의 모노에탄올아미드 2 중량부를 전형적 금속가공유체의 100 중량부에 첨가한다.
표 1 에 나타낸 결과는 살아있는 곰팡이의 수는 시간에 따라 증가하나 10 일후 104의 값으로 조절됨을 보여준다. 10 일후 악취는 관찰되지 않는다.
실시예 2
정균제는 헵타노산의 모노에탄올아미드/운데실렌산의 모노에탄올아미드 (1:1) 의 혼합물인 것만 제외하고, 실시예 1 의 절차를 반복한다. 결과를 표 1 에 나타내었다.
실시예 3
정균제는 운데실렌산의 에틸렌옥시드 부가물 (n=6) 인 것만 제외하고, 실시예 1 의 절차를 반복한다. 결과는 표 1 에 나타내었다.
실시예 첨가제 살아있는 곰팡이/ml 냄새
1일후 2 일후 3일후 6일후 10일후
1 C11모노에탄올아미드 101 102 103 104 104 없음
2 C7/C11모노에탄올아미드(1:1) 101 101 102 102 102 없음
3 C11에틸렌옥시드부가물(n=6) 101 102 102 103 103 없음
비교예 없음 102 104 107 108 108 악취
실시예 1,2 및 3 의 결과는 본 발명에 따른 정균제를 함유하는 조성물은 비교예와 비교하여 향상된 정균성을 보임을 보여준다.

Claims (5)

1 종이상의 헵타노산 유도체 및/또는 운데실렌산 유도체를 함유하는, 특히 금속 가공용 정균 조성물.
제 1 항에 있어서, 헵타노산 유도체는 하기의 군으로부터 선택하는 조성물:
(a) 하기 화학식의 아미드 :
[식중, R1및 R2는 동일하거나 상이하고, H, C1-20알킬기 또는 친수성기를 갖는 C1-20알킬기를 나타낸다] 및
(b) 하기 화학식의 아민염 :
[식중, R3은 일차 또는 이차 알킬 또는 알칸올 아민염을 나타낸다]
제 1 항에 있어서, 운데실렌산의 유도체는 하기군으로부터 선택하는 조성물 :
(a) 하기 화학식의 아미드 :
[식중, R1및 R2는 동일하거나 상이하고, H, C1-20알킬기 또는 친수성기를 갖는 C1-20알킬기를 나타낸다],
(b) 하기 화학식의 아민염 :
[식중, R3은 일차 또는 이차 알킬 또는 알칸올 아민염을 나타낸다] 및
(c)하기 화학식의 알킬렌옥시드 부가 화합물 :
[식중 X 는 H 또는 메틸기를 나타내고, n 은 정수 1 내지 50 을 나타낸다].
제 1 항 내지 제 3 항중 어느 한 항에 있어서, 헵타노산 또는 운데실렌산 유도체을 0.01 내지 40 중량% 함유하는 조성물.
금속 가공유체에서의 제 1 항 내지 제 4 항중 어느 한 항의 조성물의 용도.
KR1019970707672A 1995-05-10 1996-04-04 정균 조성물 및 금속 가공 유체에서의 용도 KR19990008147A (ko)

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JPH08302379A (ja) 1996-11-19
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US6153566A (en) 2000-11-28
DE69608961D1 (de) 2000-07-27
WO1996035767A1 (en) 1996-11-14
AU701305B2 (en) 1999-01-28
NO975084D0 (no) 1997-11-04
BR9608240A (pt) 1999-01-12
AU5399596A (en) 1996-11-29
EP0824578A1 (en) 1998-02-25
NO975084L (no) 1997-11-04
CA2217769A1 (en) 1996-11-14
DE69608961T2 (de) 2000-10-19
MX9708624A (es) 1998-02-28

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