KR102905060B1 - 구동장치의 제어 방법, 구동장치, 리소그래피 장치, 및 물품의 제조 방법 - Google Patents

구동장치의 제어 방법, 구동장치, 리소그래피 장치, 및 물품의 제조 방법

Info

Publication number
KR102905060B1
KR102905060B1 KR1020220078578A KR20220078578A KR102905060B1 KR 102905060 B1 KR102905060 B1 KR 102905060B1 KR 1020220078578 A KR1020220078578 A KR 1020220078578A KR 20220078578 A KR20220078578 A KR 20220078578A KR 102905060 B1 KR102905060 B1 KR 102905060B1
Authority
KR
South Korea
Prior art keywords
driving
stator
linear motor
coils
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220078578A
Other languages
English (en)
Korean (ko)
Other versions
KR20230008607A (ko
Inventor
하야토 호시노
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230008607A publication Critical patent/KR20230008607A/ko
Priority to KR1020250207421A priority Critical patent/KR20260006527A/ko
Application granted granted Critical
Publication of KR102905060B1 publication Critical patent/KR102905060B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H02P25/064—Linear motors of the synchronous type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/16—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the circuit arrangement or by the kind of wiring
    • H02P25/22—Multiple windings; Windings for more than three phases

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Linear Motors (AREA)
KR1020220078578A 2021-07-07 2022-06-28 구동장치의 제어 방법, 구동장치, 리소그래피 장치, 및 물품의 제조 방법 Active KR102905060B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020250207421A KR20260006527A (ko) 2021-07-07 2025-12-23 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2021-113134 2021-07-07
JP2021113134A JP7759200B2 (ja) 2021-07-07 2021-07-07 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020250207421A Division KR20260006527A (ko) 2021-07-07 2025-12-23 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법

Publications (2)

Publication Number Publication Date
KR20230008607A KR20230008607A (ko) 2023-01-16
KR102905060B1 true KR102905060B1 (ko) 2025-12-29

Family

ID=82321546

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020220078578A Active KR102905060B1 (ko) 2021-07-07 2022-06-28 구동장치의 제어 방법, 구동장치, 리소그래피 장치, 및 물품의 제조 방법
KR1020250207421A Pending KR20260006527A (ko) 2021-07-07 2025-12-23 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020250207421A Pending KR20260006527A (ko) 2021-07-07 2025-12-23 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법

Country Status (6)

Country Link
US (3) US11754932B2 (cg-RX-API-DMAC7.html)
EP (1) EP4116773A1 (cg-RX-API-DMAC7.html)
JP (1) JP7759200B2 (cg-RX-API-DMAC7.html)
KR (2) KR102905060B1 (cg-RX-API-DMAC7.html)
CN (1) CN115598930A (cg-RX-API-DMAC7.html)
TW (1) TWI922702B (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法
CN121261504A (zh) * 2025-11-24 2026-01-02 沈阳工业大学 一种超瞬变冲量永磁直线电机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070279614A1 (en) * 2004-08-30 2007-12-06 Canon Kabushiki Kaisha Linear Motor and Exposure Apparatus Having the Same
US20180062535A1 (en) * 2016-08-24 2018-03-01 Beckhoff Automation Gmbh Stator device for a linear motor, linear drive system, and method for operating a stator device
US20190028042A1 (en) 2016-01-14 2019-01-24 Thk Co., Ltd. Control device and control method for linear motor

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04308450A (ja) * 1991-04-03 1992-10-30 Ricoh Co Ltd リニア直流モータ
JP3613291B2 (ja) * 1995-03-08 2005-01-26 株式会社ニコン 露光装置
JP3501559B2 (ja) 1995-06-27 2004-03-02 キヤノン株式会社 リニア・モータ装置
US6590355B1 (en) * 1999-06-07 2003-07-08 Nikon Corporation Linear motor device, stage device, and exposure apparatus
CA2343830C (en) * 2000-05-12 2005-02-08 Seiko Epson Corporation Drive mechanism control device and method
JP3724338B2 (ja) 2000-06-09 2005-12-07 松下電工株式会社 扉開閉装置
JP4094799B2 (ja) * 2000-06-22 2008-06-04 日本トムソン株式会社 可動マグネット型リニアモータを内蔵したスライド装置
JP4474020B2 (ja) * 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
JP2008118729A (ja) 2006-10-31 2008-05-22 Nsk Ltd 電動パワーステアリング装置
JP2012108608A (ja) * 2010-11-15 2012-06-07 Smc Corp アクチュエータ用駆動制御装置及びアクチュエータの駆動制御方法
US9641117B2 (en) * 2015-02-08 2017-05-02 Hyperloop Technologies, Inc. Dynamic linear stator segment control
JP6741525B2 (ja) * 2015-08-31 2020-08-19 キヤノン株式会社 駆動装置、位置決め装置、リソグラフィー装置、および、物品製造方法
JP7025256B2 (ja) * 2018-03-16 2022-02-24 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
JP7389597B2 (ja) * 2019-09-20 2023-11-30 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品製造方法
JP2021089963A (ja) * 2019-12-04 2021-06-10 キヤノン株式会社 搬送装置、露光装置及び物品の製造方法
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070279614A1 (en) * 2004-08-30 2007-12-06 Canon Kabushiki Kaisha Linear Motor and Exposure Apparatus Having the Same
US20190028042A1 (en) 2016-01-14 2019-01-24 Thk Co., Ltd. Control device and control method for linear motor
US20180062535A1 (en) * 2016-08-24 2018-03-01 Beckhoff Automation Gmbh Stator device for a linear motor, linear drive system, and method for operating a stator device

Also Published As

Publication number Publication date
KR20230008607A (ko) 2023-01-16
US12130560B2 (en) 2024-10-29
TW202304123A (zh) 2023-01-16
JP2023009675A (ja) 2023-01-20
US20230375946A1 (en) 2023-11-23
EP4116773A1 (en) 2023-01-11
TWI922702B (zh) 2026-04-21
US20250021023A1 (en) 2025-01-16
CN115598930A (zh) 2023-01-13
US20230011753A1 (en) 2023-01-12
KR20260006527A (ko) 2026-01-13
JP7759200B2 (ja) 2025-10-23
US11754932B2 (en) 2023-09-12

Similar Documents

Publication Publication Date Title
KR20260006527A (ko) 구동장치, 구동장치의 제어 방법, 리소그래피 장치, 및 물품의 제조 방법
TWI702786B (zh) 台驅動裝置、光刻裝置和物品製造方法
KR100242923B1 (ko) 스테이지장치 및 리니어모터와, 상기 스테이지장치를사용한 노광장치 및 디바이스생산방법
KR102794589B1 (ko) 스테이지 장치, 리소그래피 장치, 및 물품제조방법
KR20110134293A (ko) 변위 장치, 리소그래피 장치 및 위치설정 방법
KR101380702B1 (ko) 평면 모터 및 평면 모터를 포함하는 리소그래피 장치
US7602088B2 (en) Linear motor and exposure apparatus having the same
US10036965B2 (en) Stage apparatus, lithography apparatus, and device manufacturing method
US9804507B2 (en) Stage apparatus, lithography apparatus, and article manufacturing method
JP2023009675A5 (cg-RX-API-DMAC7.html)
US20050156473A1 (en) Polyphase linear motor and its drive method, and stage device, exposure system, and device manufacturing method using the polyphase linear motor
JP2000029530A (ja) ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
US20060139617A1 (en) Lithographic apparatus and actuator
JP7022527B2 (ja) ステージ装置、リソグラフィ装置、および物品製造方法
JP2007258356A (ja) ステージ装置
JPH1012538A (ja) 走査ステージ装置およびこれを用いた露光装置
JP2004350340A (ja) ムービングコイル型リニアモータの駆動方法及び駆動装置

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

D22 Grant of ip right intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

A16 Divisional, continuation or continuation in part application filed

Free format text: ST27 STATUS EVENT CODE: A-0-1-A10-A16-DIV-PA0107 (AS PROVIDED BY THE NATIONAL OFFICE)

F11 Ip right granted following substantive examination

Free format text: ST27 STATUS EVENT CODE: A-2-4-F10-F11-EXM-PR0701 (AS PROVIDED BY THE NATIONAL OFFICE)

PA0107 Divisional application

St.27 status event code: A-0-1-A10-A16-div-PA0107

PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-2-2-U10-U11-OTH-PR1002 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

Q13 Ip right document published

Free format text: ST27 STATUS EVENT CODE: A-4-4-Q10-Q13-NAP-PG1601 (AS PROVIDED BY THE NATIONAL OFFICE)