TWI922702B - 驅動裝置及其控制方法、光刻裝置和物品製造方法 - Google Patents

驅動裝置及其控制方法、光刻裝置和物品製造方法

Info

Publication number
TWI922702B
TWI922702B TW111123662A TW111123662A TWI922702B TW I922702 B TWI922702 B TW I922702B TW 111123662 A TW111123662 A TW 111123662A TW 111123662 A TW111123662 A TW 111123662A TW I922702 B TWI922702 B TW I922702B
Authority
TW
Taiwan
Prior art keywords
drive
coil
mover
stator
linear motor
Prior art date
Application number
TW111123662A
Other languages
English (en)
Chinese (zh)
Other versions
TW202304123A (zh
Inventor
星野勇人
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202304123A publication Critical patent/TW202304123A/zh
Application granted granted Critical
Publication of TWI922702B publication Critical patent/TWI922702B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H02P25/064—Linear motors of the synchronous type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/16—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the circuit arrangement or by the kind of wiring
    • H02P25/22—Multiple windings; Windings for more than three phases

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Linear Motors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Linear Motors (AREA)
TW111123662A 2021-07-07 2022-06-24 驅動裝置及其控制方法、光刻裝置和物品製造方法 TWI922702B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-113134 2021-07-07
JP2021113134A JP7759200B2 (ja) 2021-07-07 2021-07-07 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Publications (2)

Publication Number Publication Date
TW202304123A TW202304123A (zh) 2023-01-16
TWI922702B true TWI922702B (zh) 2026-04-21

Family

ID=82321546

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111123662A TWI922702B (zh) 2021-07-07 2022-06-24 驅動裝置及其控制方法、光刻裝置和物品製造方法

Country Status (6)

Country Link
US (3) US11754932B2 (cg-RX-API-DMAC7.html)
EP (1) EP4116773A1 (cg-RX-API-DMAC7.html)
JP (1) JP7759200B2 (cg-RX-API-DMAC7.html)
KR (2) KR102905060B1 (cg-RX-API-DMAC7.html)
CN (1) CN115598930A (cg-RX-API-DMAC7.html)
TW (1) TWI922702B (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法
CN121261504A (zh) * 2025-11-24 2026-01-02 沈阳工业大学 一种超瞬变冲量永磁直线电机

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020018195A1 (en) * 2000-06-23 2002-02-14 Kazunori Iwamoto Moving mechanism in exposure apparatus, and exposure apparatus having the same
TW200736859A (en) * 2006-03-30 2007-10-01 Nikon Corp Movable apparatus, exposure apparatus, exposure method and method of fabricating device
US20070279614A1 (en) * 2004-08-30 2007-12-06 Canon Kabushiki Kaisha Linear Motor and Exposure Apparatus Having the Same
CN107924138A (zh) * 2015-08-31 2018-04-17 佳能株式会社 驱动装置、定位装置、平版印刷装置和物品制造方法
CN112540511A (zh) * 2019-09-20 2021-03-23 佳能株式会社 载置台装置、光刻装置以及物品制造方法

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Publication number Priority date Publication date Assignee Title
JPH04308450A (ja) * 1991-04-03 1992-10-30 Ricoh Co Ltd リニア直流モータ
JP3613291B2 (ja) * 1995-03-08 2005-01-26 株式会社ニコン 露光装置
JP3501559B2 (ja) 1995-06-27 2004-03-02 キヤノン株式会社 リニア・モータ装置
US6590355B1 (en) * 1999-06-07 2003-07-08 Nikon Corporation Linear motor device, stage device, and exposure apparatus
CA2343830C (en) * 2000-05-12 2005-02-08 Seiko Epson Corporation Drive mechanism control device and method
JP3724338B2 (ja) 2000-06-09 2005-12-07 松下電工株式会社 扉開閉装置
JP4094799B2 (ja) * 2000-06-22 2008-06-04 日本トムソン株式会社 可動マグネット型リニアモータを内蔵したスライド装置
JP2008118729A (ja) 2006-10-31 2008-05-22 Nsk Ltd 電動パワーステアリング装置
JP2012108608A (ja) * 2010-11-15 2012-06-07 Smc Corp アクチュエータ用駆動制御装置及びアクチュエータの駆動制御方法
US9641117B2 (en) * 2015-02-08 2017-05-02 Hyperloop Technologies, Inc. Dynamic linear stator segment control
JP6653179B2 (ja) * 2016-01-14 2020-02-26 Thk株式会社 リニアモータの制御装置及び制御方法
US10734912B2 (en) * 2016-08-24 2020-08-04 Beckhoff Automation Gmbh Stator device for a linear motor, linear drive system, and method for operating a stator device
JP7025256B2 (ja) * 2018-03-16 2022-02-24 キヤノン株式会社 ステージ装置、リソグラフィ装置、および物品の製造方法
JP2021089963A (ja) * 2019-12-04 2021-06-10 キヤノン株式会社 搬送装置、露光装置及び物品の製造方法
JP7759200B2 (ja) * 2021-07-07 2025-10-23 キヤノン株式会社 駆動装置の制御方法、駆動装置、リソグラフィ装置、および物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020018195A1 (en) * 2000-06-23 2002-02-14 Kazunori Iwamoto Moving mechanism in exposure apparatus, and exposure apparatus having the same
US20070279614A1 (en) * 2004-08-30 2007-12-06 Canon Kabushiki Kaisha Linear Motor and Exposure Apparatus Having the Same
TW200736859A (en) * 2006-03-30 2007-10-01 Nikon Corp Movable apparatus, exposure apparatus, exposure method and method of fabricating device
CN107924138A (zh) * 2015-08-31 2018-04-17 佳能株式会社 驱动装置、定位装置、平版印刷装置和物品制造方法
CN112540511A (zh) * 2019-09-20 2021-03-23 佳能株式会社 载置台装置、光刻装置以及物品制造方法

Also Published As

Publication number Publication date
KR20230008607A (ko) 2023-01-16
US12130560B2 (en) 2024-10-29
TW202304123A (zh) 2023-01-16
JP2023009675A (ja) 2023-01-20
US20230375946A1 (en) 2023-11-23
EP4116773A1 (en) 2023-01-11
KR102905060B1 (ko) 2025-12-29
US20250021023A1 (en) 2025-01-16
CN115598930A (zh) 2023-01-13
US20230011753A1 (en) 2023-01-12
KR20260006527A (ko) 2026-01-13
JP7759200B2 (ja) 2025-10-23
US11754932B2 (en) 2023-09-12

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